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The inflexion point of electron density and effective electron temperature curves versus radio-frequency (RF) bias voltage is observed in the H mode of inductively coupled plasmas (ICPs). The electron energy probability function (EEPF) evolves first from a Maxwellian to a Druyvesteyn-like distribution, and then to a Maxwellian distribution again as the RF bias voltage increases. This can be explained by the interaction of two distinct bias-induced mechanisms, that is: bias- induced electron heating and bias-induced ion acceleration loss and the decrease of the effective discharge volume due to the sheath expansion. Furthermore, the trend of electron density is verified by a fluid model combined with a sheath module.  相似文献   
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胡艳婷  张钰如  宋远红  王友年 《物理学报》2018,67(22):225203-225203
电非对称效应作为一种新兴技术,被广泛用于对离子能量和离子通量的独立调控.此外,在改善等离子体的径向均匀性方面,电非对称效应也发挥了重要作用.本文采用二维流体力学模型,并耦合麦克斯韦方程组,系统地研究了容性耦合氢等离子体中当放电由多谐波叠加驱动时,不同谐波阶数k下的电非对称效应,重点观察了相位角θn对自偏压以及等离子体径向均匀性的影响.模拟结果表明:在同一谐波阶数下,自偏压随相位角θn的变化趋势不尽相同,且当k增大(k>3)时,自偏压随最高频相位角θk的变化范围逐渐减小.此外,通过调节相位角θn,可以改变轴向功率密度和径向功率密度的相对关系,进而实现对等离子体径向均匀性的调节.研究结果对于利用电非对称效应优化等离子体工艺过程具有一定的指导意义.  相似文献   
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Yong-Xin Liu 《中国物理 B》2022,31(8):85202-085202
Two classic radio-frequency (RF) plasmas, i.e., the capacitively and the inductively coupled plasmas (CCP and ICP), are widely employed in material processing, e.g., etching and thin film deposition, etc. Since RF plasmas are usually operated in particular circumstances, e.g., low pressures (mTorr-Torr), high-frequency electric field (13.56 MHz-200 MHz), reactive feedstock gases, diverse reactor configurations, etc., a variety of physical phenomena, e.g., electron resonance heating, discharge mode transitions, striated structures, standing wave effects, etc., arise. These physical effects could significantly influence plasma-based material processing. Therefore, understanding the fundamental processes of RF plasma is not only of fundamental interest, but also of practical significance for the improvement of the performance of the plasma sources. In this article, we review the major progresses that have been achieved in the fundamental study on the RF plasmas, and the topics include 1) electron heating mechanism, 2) plasma operation mode, 3) pulse modulated plasma, and 4) electromagnetic effects. These topics cover the typical issues in RF plasma field, ranging from fundamental to application.  相似文献   
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Changes of the electron dynamics in hydrogen (H2) radio-frequency (RF) inductively coupled plasmas are investigated using a hairpin probe and an intensified charged coupled device (ICCD). The electron density, plasma emission intensity, and input current (voltage) are measured during the E to H mode transitions at different pressures. It is found that the electron density, plasma emission intensity, and input current jump up discontinuously, and the input voltage jumps down at the E to H mode transition points. And the threshold power of the E to H mode transition decreases with the increase of the pressure. Moreover, space and phase resolved optical emission spectroscopic measurements reveal that, in the E mode, the RF dynamics is characterized by one dominant excitation per RF cycle, while in the H mode, there are two excitation maxima within one cycle.  相似文献   
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利用自主开发的三维流体力学模型程序,对面向平板显示工艺和光伏工艺的大面积矩形感性耦合氩等离子体源进行了数值模拟.该模型自洽地求解了带电粒子以及中性粒子的流体方程和感应电场的波动方程.利用此模型,研究了气压、功率以及线圈形状对各种等离子体参数的三维空间分布和均匀性的影响.研究结果表明,当放电气压较低时(4 mTorr),电子密度的空间分布比较均匀,且电子密度的最大值出现在腔室的中心区域.感性沉积功率密度、激发态氩原子密度以及电子温度的最大值出现在线圈的下方.随着放电功率的增加,即从1000 W增加到4000 W,电子密度显著提高,但电子密度的空间分布变化不大.随着放电气压的升高,电子密度的均匀性明显下降,即电子密度的最大值主要局域在线圈下方.这是因为在较高的气压下,带电粒子与背景气体的碰撞增加,因此使得带电粒子的密度分布变得局域.此外,文章还研究了不同的线圈结构对于等离子体均匀性的影响.结果表明当气压较高(20 mTorr)时,使用圈,即通过改变线圈结构可以实现对等离子体均匀性的调控.文章的研究成果有助于加深对大面积矩形感性耦合等离子体放电特性的认知,这对于优化平板显示工艺以及光伏工艺至...  相似文献   
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