大功率微波加热设备的模拟信号传输系统设计

在复杂环境下,工业大功率微波加热设备中模拟信号传输系统的设计,对于设备的精确控制和安全运行至关重要;针对现有的模拟信号传输方案在复杂电磁环境下抗干扰能力低下的缺陷,提出一种基于光纤,并整合V/F转换器和FPGA组成的模拟信号传输解决方案;经过仿真分析和实验验证,该模拟信号传输系统抗复杂电磁干扰能力优于现有方案,同时传输精度高,连续传输误差小于0 .1%;该系统为复杂环境下工业大功率微波加热设备中模拟信号的传输提供了一个性能优良的解决方案。     

余热驱动热耦合多级自由活塞斯特林热电联供系统研究

我国工业余热资源丰富,尤其是中低温余热具有巨大的回收利用潜力。本文提出采用热耦合多级自由活塞斯特林发电机来构建余热回收利用系统,可有效拓宽余热利用温度范围,减小余热热源传热损失。首先基于热声理论,从声阻抗角度计算考察了单级自由活塞斯特林热电联供系统在变温和变充气压力等工况下的性能;然后对一台三级自由活塞斯特林热电联供系统进行解耦计算,分别考察了供水温度、单级加热量、工作压力等因素对系统性能的影响;最后开展了实验研究,在420/350/300℃热端温度及22/22/18 kW加热量下获得自由活塞斯特林热电联产系统净输出电功10.09 kW,供热量45.29 kW,对应总热电效率为16.27%,综合热利用率为89.32%,各级相对卡诺效率分别为30.90%、32.10%、36.08%,展现出重要的应用前景。     

云母1/4波片偏振干涉谱的研究

本文利用岛津UV301－PC分光光计，测定了云母1／4波片的偏振干波谱，该光谱和以往文献中的显著不同。本文对此进行了分析和解释，并由此得出了在考虑吸收的情况下的爱里方程表达形式。该将有助于测定某些晶体的吸光度。     

Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.     

Study on absorbance and laser damage threshold of HfO_2 films prepared by ion-assisted reaction deposition

Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different deposition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold.