Finite size effect on the Raman frequency of phonons in nano-semiconductors

A comprehensive study on Raman spectroscopy with different excitation wavelengths, sample sizes, and sample shapes for optic phonons (OPs) and acoustic phonons (APs) in polar and non-polar nano-semiconductors has been performed. The study affirms that the finite size effect does not appear in the OPs of polar nano-semiconductors, while it exists in all other types of phonons. The absence of the FSE is confirmed to originate from the long-range Fr¨ohlich interaction and the breaking of translation symmetry. The result indicates that the Raman spectra of OPs cannot be used as a method to characterize the scale and crystalline property of polar nano-semiconductors.     

多层纳米碳管膜的大面积可控制生长

文章介绍了利用化学气相沉积法在Si和石英基片上大面积生长多层碳纳米管膜的研究成果,通过调节生长参数,不仅可以获得高度取向的碳纳米纤维,还可获得不同直径,不同图案的高度取向的碳纳米管膜,取向碳纳米管膜的可控制制备,为研究碳纳米管的物理,化学性能,特别是为碳纳米管场发射平面图像显示器的应用研究,奠定了坚实的基础。     

超细氧化硅纳米线阵列的制备和发光特性

以液态金属Ca作为催化剂合成了大量的非晶SiO2纳米线阵列。这些纳米线具有高度取向性,直径分布均匀,平均约8nm,长度大于300μm。研究发现,载气的湿度对非晶SiO2纳米线阵列的生长有重大影响,提出了一种可能的生长模型,以解释这一与传统的VLS机制不同的生长过程。对样品的光致荧光(PL)谱的测量表明,非晶SiO2纳米线阵列在蓝光波段附近存在两个很强且稳定的发射峰,它们直接与样品中的缺陷和空位有关。首次发现了一个稳定的PL峰,存在于红外波段,作为光源,非晶SiO2纳米线阵列可能会在纳米光电子器件中得到应用。由于SiO2是传统的光纤材料,单根SiO2纳米线也有希望应用于近场光学扫描显微镜(SNOM)之中。     

Photoluminescence Characterization of Nanocrystalline ZnO Array

High-density and uniform well-aligned ZnO sub-micron rods are synthesized on the silicon substrate over a large area. The morphology and structure of the ZnO sub-micron rods are investigated by x-ray diffraction, transmission electron microscopy and Raman spectra. It is found that the ZnO sub-micron rods are of high crystal quality with the diameter in the range of 400-600 nm and the length of several micrometres long. The optical properties were studied by photoluminescence spectra. The results show that the intensity of the ultraviolet emission at 3.3eV is rather high, meanwhile the deep level transition centred at about 2.38eV is weak. The free exciton emission could a/so be observed at low temperature, which implies the high optical quality of the ZnO sub-micron rods.This growth technique provides one effective way to fabricate the high crystal quality ZnO nanowires array, which is very important for potential applications in the new-type optoelectronic nanodevices.     

纳米硅量子线的发现与研究

一维纳米材料是当今介观物理学研究的前沿领域．文章报道了一种利用脉冲激光成功地制备纯度高、直径分布均匀的纳米硅量子线（ＳｉＮＷｓ）的方法，介绍了纳米量子线的形貌、显微结构、生长机理和物理性能研究的最新结果．纳米硅量子线的发现具有重要的科学意义和潜在的应用前景．     

硅纳米线拉曼光谱的波长选择效应

我们用四种不同波长的激光作为激发源研究硅纳米线的拉曼谱 ,观察到一种反常的现象 ,即拉曼峰的频移、峰宽和非对称系数都依赖于激发光波长。考虑了量子限制效应 ,样品的尺寸分布和共振拉曼散射特性 ,对此反常现象提出了一个合理的解释     

一维硅纳米线的生长机制及其量子限制效应的研究 *

介绍一维硅纳米线的合成及控制硅纳米线直径的方法、生长机制和不同硅纳米线形态的生成机理以及硅纳米线的量子限制效应 .     

Large-Quantity Synthesis of Single-Crystalline Metal Indium Nano/Sub-Micron Wires

Large quantities of metal indium single-crystalline wires with diameters ranging from tens of nanometres to a few micrometres were synthesized on Si substrates. Unlike traditional methods for the fabrication of nanowires or nanorods, liquid indium was squeezed out of the pores and cracks from porous an InAlN layer to form the wires. Continuous pushing out of liquid metal indium under strength, lowering of liquid-solid interfaces and the confinement of the cracks all contribute to the growth of indium wires. Our experiments have shed some light on the possibility of synthesizing large quantities quasi-1D nano/sub-micron structures with specified cross-sectional geometry using the similar method.     

蓝宝石衬底上GaN/AlxGa1-xN超晶格插入层对AlxGa1-xN外延薄膜应变及缺陷密度的影响

室温300K下,由于Al_xGa_1-xN的带隙宽度可以从GaN的3.42eV到AlN的6.2eV之间变化,所以Al_xGa_1-xN是紫外光探测器和深紫外LED所必需的外延材料.高质量高铝组分Al_xGa_1-xN材料生长的一大困难就是Al_xGa_1-xN与常用的蓝宝石衬底之间大的晶格失配和热失配.因而采用MOCVD在GaN/蓝宝石上生长的Al_xGa_1-xN薄膜由于受张应力作用非常容易发生龟裂.GaN/Al_xGa_1-xN超晶格插入层技术是释放应力和减少Al_xGa_1-xN薄膜中缺陷的有效方法.研究了GaN/Al_xGa_1-xN超晶格插入层对GaN/蓝宝石上Al_xGa_1-xN外延薄膜应变状态和缺陷密度的影响.通过拉曼散射探测声子频率从而得到材料中的残余应力是一种简便常用的方法,Al_xGa_1-xN外延薄膜的应变状态可通过拉曼光谱测量得到.Al_xGa_1-xN外延薄膜的缺陷密度通过测量X射线衍射得到.对于具有相同阱垒厚度的超晶格,例如4nm/4nm,5nm/5nm,8nm/8nm的GaN/Al_0.3Ga_0.7N超晶格,研究发现随着超晶格周期厚度的增加Al_xGa_1-xN外延薄膜缺陷密度降低,Al_xGa_1-xN外延薄膜处于张应变状态,且5nm/5nmGaN/Al_0.3Ga_0.7N超晶格插入层Al_xGa_1-xN外延薄膜的张应变最小.在保持5nm阱宽不变的情况下,将垒宽增大到8nm,即十个周期的5nm/8nmGaN/Al_0.3Ga_0.7N超晶格插入层使Al_xGa_1-xN外延层应变状态由张应变变为压应变.由X射线衍射结果计算了Al_xGa_1-xN外延薄膜的刃型位错和螺型位错密度,结果表明超晶格插入层对螺型位错和刃型位错都有一定的抑制效果.透射电镜图像表明超晶格插入层使位错发生合并、转向或是使位错终止,且5nm/8nmGaN/Al_0.3Ga_0.7N超晶格插入层导致Al_xGa_1-xN外延薄膜中的刃型位错倾斜30°左右,释放一部分压应变.     

Topological transport in Dirac electronic systems:A concise review

Various novel physical properties have emerged in Dirac electronic systems, especially the topological characters protected by symmetry. Current studies on these systems have been greatly promoted by the intuitive concepts of Berry phase and Berry curvature, which provide precise definitions of the topological phases. In this topical review, transport properties of topological insulator(Bi2Se3), topological Dirac semimetal(Cd3As2), and topological insulator-graphene heterojunction are presented and discussed. Perspectives about transport properties of two-dimensional topological nontrivial systems,including topological edge transport, topological valley transport, and topological Weyl semimetals, are provided.