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1.
非晶氧化锆水合物红外研究   总被引:2,自引:0,他引:2       下载免费PDF全文
用红外吸收光谱(IR)结合X射线衍射(XRD)、差热(DTA)和理分析(TG)详细研究了氧化锆前驱物(溶胶凝胶法制得的非晶态氧化锆水合物)的结构,实验结果表明在非晶态氧化锆水合物中有三种不同的近程结构,它表现为不同条件下制得的非晶氧化锆水合物的红外吸收谱在1700~1200cm^-1水和羟基的弯曲振动吸收区出现1633、1551、1400和1340cm^-1四个不同的羟基吸收峰,这表明样品中有三种  相似文献
2.
GaN纳米柱发光特性   总被引:2,自引:2,他引:0       下载免费PDF全文
用自组装的Ni纳米岛做掩模通过ICP刻蚀得到GaN纳米柱,采用扫描电子显微镜(SEM)观测其形貌,室温下光致发光(PL)谱测量研究样品发光特性。结果表明,室温下GaN 纳米柱的发光强度是体材料的2.6倍。为了修复刻蚀损伤,用KOH对样品进行湿法处理,发现经KOH处理的纳米柱与处理前相比变得更直,且其发光较处理之前进一步增强。为了研究其原因,分别对KOH处理前后的样品进行变温PL谱的测量,发现湿法处理后发光增强是由于内量子效率的提高引起的。  相似文献
3.
Zn1-xNixO (x = 0.001, 0.01, 0.02, 0.05 and 0.20) powders are prepared by sol-gel method. An extended x-ray absorption fine structure technique (EXAFS) for the Ni K.edge is employed to probe the local structures around Ni atoms doped in ZnO powders by fluorescence mode. The near edge EXAFS of the samples does not change in the range of Ni concentration from x = 0.001 to 0.05, which is consistent with the results of x-ray diffraction of the samples. The simulation results for the first shell EXAFS signals indicated that Ni atoms are substituted in Zn sites.  相似文献
4.
根据GaN氢化物气相外延生长(HVPE)的原理,设计制作了双温区卧式HVPE系统.根据实际生长中出现的问题和CaN样品的测试情况,对系统进行了逐步的调试和改进.  相似文献
5.
研究了在刻有图形的GaN"衬底”上用HVPE方法侧向外延生长(ELO)GaN的结构特性.在SiO2衬底上侧向外延生长GaN已经实现,并得到了平面的ELO GaN薄膜.采用扫描电子显微镜、透射电微镜和原子力显微镜技术研究了这种ELO GaN材料的结构和表面形貌.原子力显微镜图像表明:在ELO范围中的4μm2面积上不存在明显的阶状形貌.透射电子显微镜的观测表明在ELO范围内位错密度很低.在接合的界面上没观察到有空隙存在.但观测到晶格的弯曲高达3.3°,这被归因为由GaN层下的"籽层”和接合界面处的水平倾料和猝灭所产生的螺旋位错的积聚.  相似文献
6.
A series of experiments were conducted to systematically study the effects of etching conditions on GaN by a con-venient photo-assisted chemical (PAC) etching method. The solution concentration has an evident influence on the surface morphology of GaN and the optimal solution concentrations for GaN hexagonal pyramids have been identified. GaN with hexagonal pyramids have higher crystal quality and tensile strain relaxation compared with as-grown GaN. A detailed anal- ysis about evolution of the size, density and optical property of GaN hexagonal pyramids is described as a function of light intensity. The intensity of photoluminescence spectra of GaN etched with hexagonal pyramids significantly increases compared to that of as-grown GaN due to multiple scattering events, high quality GaN with pyramids and the Bragg effect.  相似文献
7.
To understand the mechanism of Gallium nitride (GaN) film growth is of great importance for their potential applica- tions. In this paper, we investigate the growth behavior of the GaN film by combining computational fluid dynamics (CFD) and molecular dynamics (MD) simulations. Both of the simulations show that V/III mixture degree can have important impacts on the deposition behavior, and it is found that the more uniform the mixture is, the better the growth is. Besides, by using MD simulations, we illustrate the whole process of the GaN growth. Furthermore, we also find that the V/III ratio can affect the final roughness of the GaN film. When the V/III ratio is high, the surface of final GaN film is smooth. The present study provides insights into GaN growth from the macroscopic and microscopic views, which may provide some suggestions on better experimental GaN preparation.  相似文献
8.
The quest for higher modulation speed and lower energy consumption has inevitably promoted the rapid development of semiconductor-based solid lighting devices in recent years. GaN-based light-emitting diodes (LEDs) have emerged as promising candidates for achieving high efficiency and high intensity, and have received increasing attention among many researchers in this field. In this paper, we use a self-assembled array-patterned mask to fabricate InGaN/GaN multi- quantum well (MQW) LEDs with the intention of enhancing the light-emitting efficiency. By utilizing inductively coupled plasma etching with a self-assembled Ni cluster as the mask, nanopillar arrays are formed on the surface of the InGaN/GaN MQWs. We then observe the structure of the nanopillars and find that the V-defects on the surface of the conventional structure and the negative effects of threading dislocation are effectively reduced. Simultaneously, we make a comparison of the photoluminescence (PL) spectrum between the conventional structure and the nanopillar arrays, achieved under an experimental set-up with an excitation wavelength of 325 mm. The analysis demonstrates that MQW-LEDs with nanopillar arrays achieve a PL intensity 2.7 times that of conventional LEDs. In response to the PL spectrum, some reasons are proposed for the enhancement in the light-emitting efficiency as follows: 1) the improvement in crystal quality, namely the reduction in V-defects; 2) the roughened surface effect on the expansion of the critical angle and the attenuated total reflection; and 3) the enhancement of the light-extraction efficiency due to forward scattering by surface plasmon polariton modes in Ni particles deposited above the p-type GaN layer at the top of the nanopillars.  相似文献
9.
李明  张荣  刘斌  傅德颐  赵传阵  谢自力  修向前  郑有炓 《物理学报》2012,61(2):27103-027103
首先把本征值方程投影到导带的子空间中, 进而得到AlGaN/GaN量子阱中第一、二子带的Rashba自旋劈裂系数(α 1, α 2)和子带间自旋-轨道耦合系数η12. 然后自恰求解薛定谔方程和泊松方程计算了不同栅压的量子阱中的α 1, α 2η12, 并分别讨论了量子阱阱层、左右异质结界面和垒层对它们的贡献. 结果表明可以通过栅压来调节自旋-轨道耦合系数, 子带间自旋轨道耦合系数η12比Rashba自旋劈裂系数α 1, α 2小, 但基本在同一数量级.  相似文献
10.
谢自力  李弋  刘斌  张荣  修向前  陈鹏  郑有炓 《中国物理 B》2011,20(10):106801-106801
The non-polar a-plane GaN is grown on an r-plane sapphire substrate directly without a buffer layer by metal-organic chemical vapour deposition and the effects of V/III ratio growth conditions are investigated. Atomic force microscopy results show that triangular pits are formed at a relatively high V/III ratio, while a relatively low V/III ratio can enhance the lateral growth rate along the c-axis direction. The higher V/III ratio leads to a high density of pits in comparison with the lower V/III ratio. The surface morphology is improved greatly by using a low V/III ratio of 500 and the roughness mean square of the surface is only 3.9 nm. The high resolution X-ray diffraction characterized crystal structural results show that the rocking curve full width at half maximum along the m axis decreases from 0.757° to 0.720°, while along the c axis increases from 0.220° to 0.251° with the V/III increasing from 500 μmol/min to 2000 μmol/min, which indicates that a relatively low V/III ratio is conducible to the c-axis growth of a-plane GaN.  相似文献
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