米碳管增强铜基复合材料的滑动磨损特性研究

以纳米碳管作为增强体制备了铜基复合材料,采用MM-220型环-块摩擦磨损试验机考察了该复合材料的滑动磨损行为,并观察分析了复合材料的组织结构、磨损表面形貌及磨屑组成.结果表明,其磨损过程存在跑合和稳态磨损2个阶段,在稳态磨损阶段主要发生氧化磨损,同时也存在磨粒磨损.工作环境影响复合材料的耐磨性.纳米碳管体积分数在12%～15%时,可以较好地发挥其润滑和阻止基体氧化的作用.     

纳米碳管增强铜基复合材料的滑动磨损特性研究

以纳米碳管作为增强体制备了铜基复合材料,采用ＭＭ－２２０型环－块摩擦磨损试验机考察了该复合材料的滑动磨损行为,并观察分析了复合材料的组织结构、磨损表面形貌及磨屑组成．结果表明,其磨损过程存在跑合和稳态磨损２个阶段,在稳态磨损阶段主要发生氧化磨损,同时也存在磨粒磨损．工作环境影响复合材料的耐磨性．纳米碳管体积分数在１２％～１５％时,可以较好地发挥其润滑和阻止基体氧化的作用．     

Modelling and Optimization for Deposition of SiOxNy Films by Radio-Frequency Reactive Sputtering

SiOxNy films are deposited by reactive sputtering from a Si target in Ar/O2/N2 atmospheres. In order to achieve the control of film composition and to keep a high deposition rate at the same time, a new sputtering model based on Berg＇s work is provided for the condition of double reactive gases. Analysis based on this model shows that the deposition process can easily enter the target-poisoning mode when the preset gas flow （N2 in this work） is too high, and the film composition will change from nitrogen-rich to SiO2-like with the increase of oxygen supply while keeping the N2 supply constant. The modelling results are confirmed in the deposition process of SiOxNy. Target self-bias voltages during sputtering are measured to characterize the different sputtering modes. FTIR-spectra and dielectric measurements are used to testify the model prediction of composition. Finally, an optimized sputtering condition is selected with the O2/N2 flow ratio varying from 0 to I and N2 supply fixed at I sccm. Average deposition rate of 17nm/min is obtained under this selected condition, which has suggested the model validity and potential for industry applications.