排序方式: 共有23条查询结果,搜索用时 31 毫秒
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为获得与GaN薄膜晶格失配小的衬底材料,报道了利用气相传输平衡技术(VTE)在(100)-βGa2O3单晶衬底上制备高度[001]取向LiGaO2薄膜的方法。经过X射线衍射分析表明得到的薄膜是由单相LiGaO2组成。利用扫描电镜(SEM)观察表面形貌,发现经气相传输平衡技术处理得到的薄膜表面形貌主要受温度的影响,表面晶粒尺寸随温度上升而增大。而X射线衍射测试表明随着温度上升,所得到的薄膜也从多晶向单晶化转变。在经过退火处理后,通过观察吸收谱发现LiGaO2薄膜中产生色心,并且色心的种类与温度有关。表明可以通过气相传输平衡技术技术,在远低于LiGaO2熔点的温度制备外延GaN用(001)LiGaO2∥(100)β-Ga2O3复合衬底。 相似文献
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The absorption spectra, fluorescence spectra, and lifetimes of as-grown and annealed Cr,Yb:YAG crystal grown by Czochralski technique have been measured. The broad absorption bands in the visible region increase in intensity and shift to long wavelength after annealing, and the additional absorption around 482 nm may be possibly due to new octahedral Cr4+ center in the crystal, and the increase in the infrared (IR) region is due to the increase of Cra+. The increase of Cr4+ also results in the groud state absorption and the concentration quenching of Ybs+ in Cr,Yb:YAG crystal after annealing, the fluorescence intensity is reduced to 75% and the emission lifetime is shortened from 1.40 to 0.44 ms. 相似文献
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采用离子注入法制备了不同剂量的β-Ga2O3:Eu3+样品,并在空气中进行了退火处理,成功实现了Eu3+的光学激活。通过拉曼和X射线衍射表征了β-Ga2O3晶体随Eu3+注入剂量的应力变化趋势,发现随着Eu3+剂量的增加,晶格应力先增加后减少,并对其内在机理进行了分析。利用阴极荧光光谱对晶体的发光性质进行了表征,主要观察到峰值位于380 nm附近、宽的缺陷发光峰以及峰值位于591 nm、597 nm和613 nm的Eu3+发光峰。通过高斯拟合发现,该380 nm发光峰主要由360 nm、398 nm和442 nm三个子峰构成,分别与自陷激子和施主-受主对有关。此外,Eu3+发光峰位置与强度受到基质局域晶体场的影响。 相似文献
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The absorption spectra, fluorescence spectra, and lifetimes of as-grown and annealed Cr,Yb:YAG crystal grown by Czochralski technique have been measured. The broad absorption bands in the visible region increase in intensity and shift to long wavelength after annealing, and the additional absorption around 482 nm may be possibly due to new octahedral Cr4+ center in the crystal, and the increase in the infrared (IR) region is due to the increase of Cr4+. The increase of Cr4+ also results in the groud state absorption and the concentration quenching of Yb3+ in Cr,Yb:YAG crystal after annealing, the fluorescence intensity is reduced to 75% and the emission lifetime is shortened from 1.40 to 0.44 ms. 相似文献
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