Revisiting the S-Au(111) interaction: static or dynamic?

The Au-S interaction is probably the most intensively studied interaction of Au surfaces with nonmetals, as, for example, it plays an important role in Au ore formation(1) and controls the structure and dynamics of thiol-based self-assembled monolayers (SAMs). Various S-induced surface structures on Au(111) were recently reported for different conditions and predominantly interpreted in terms of a static Au surface. Here, we demonstrate that the Au(111) surface exhibits a very dynamic character upon interaction with adsorbed sulfur: large-scale surface restructuring and incorporation of Au atoms into a growing 2D AuS phase were observed in situ. These results provide new insight into the Au-S surface chemistry.     

Solution-processed anodes from layer-structure materials for high-efficiency polymer light-emitting diodes

The development of low-cost, large-area electronic applications requires the deposition of active materials in simple and inexpensive techniques at room temperature, properties usually associated with polymer films. In this study, we demonstrate the integration of solution-processed inorganic films in light-emitting diodes. The layered transition metal dichalcogenide (LTMDC) films are deposited through Li intercalation and exfoliation in aqueous solution and partially oxidized in an oxygen plasma generator. The chemical composition and thickness of the LTMDC and corresponding transition metal oxide (TMO) films are investigated by X-ray photoelectron spectroscopy. The morphology and topography of the films are studied by atomic force microscopy. X-ray powder diffraction is used to determine the orientation of the LTMDC film. Finally, the LTMDC and their corresponding oxides are utilized as hole-injecting and electron-blocking materials in polymer light-emitting diodes with the general structure ITO/LTMDC/TMO/polyfluorene/Ca/Al. Efficient hole injection and electron blocking by the inorganic layers result in outstanding device performance and high efficiency.     

Synthesis of TiO2 nanoparticles on the Au(111) surface

The growth of titanium oxide nanoparticles on reconstructed Au(111) was investigated by scanning tunneling microscopy and x-ray photoelectron spectroscopy. Ti was deposited by physical-vapor deposition at 300 K. Regular arrays of titanium nanoparticles form by preferential nucleation of Ti at the elbow sites of the herringbone reconstruction. The titanium oxide nanoclusters were synthesized by subsequent exposure to O(2) at 300 K. Two-and three-dimensional titanium oxide nanocrystallites form during annealing in the temperature range from 600 to 900 K. At the same time, the Au(111) surface assumes a serrated 110-oriented step-edge morphology suggesting step-edge pinning by titanium oxide nanoparticles. The oxidation state of the titanium oxide nanoparticles varies with annealing temperature. Specifically, annealing to 900 K results in the formation of stoichiometric TiO(2) nanocrystals as judged by the Ti(2p) binding energies measured in the x-ray photoelectron data. The nanodispersed TiO(2) on Au(111) is an ideal system to test the various models proposed for the enhanced catalytic reactivity of supported Au nanoparticles.     

Sensitivity of methyl thiolate desulfurization selectivity to reaction temperature and hydroxyl coverage

The adsorption and reaction of methanethiol (CH3SH) and dimethyl disulfide (CH3SSCH3) on Mo(110)-(1 x 6)-O have been studied using temperature-programmed reaction spectroscopy and reflection-absorption infrared spectroscopy over the temperature range of 110-550 K. The S-H bond is broken upon adsorption to form adsorbed OH, water, and methyl thiolate (CH3S-) at low temperature. Water is evolved at 210 and 310 K via molecular desorption and disproportionation of OH, respectively. Some hydroxyl remains on the surface up to 350 K. Methyl thiolate is also formed from CH3SSCH3 on Mo(110)-(1 x 6)-O. Methyl thiolate undergoes C-S cleavage above 300 K, yielding methane and methyl radicals. There is also a minor amount of nonselective decomposition leading to the formation of carbon and hydrogen. Methane production is promoted by adsorbed hydroxyl. As the hydroxyl coverage increases, the yield of methyl radicals relative to methane diminishes. Accordingly, there is more methane produced from methanethiol reaction than from dimethyl disulfide, since S-H dissociation in CH3SH produces OH. The maximum coverage of the thiolate is approximately 0.5 monolayers, based on the amount of sulfur remaining after reaction measured by Auger electron spectroscopy. In contrast to cyclopropylmethanethiol (c-C3H5CH2SH), for which alkyl transfer from sulfur to oxygen is observed, there is no evidence for transfer of the methyl group of methyl thiolate to oxygen on the surface. Specifically, there is no evidence for methoxy (CH3O-) in infrared spectroscopy or temperature-programmed reaction experiments.     

Viscoelastic flow in a two-dimensional collapsible channel

We compute the flow of three viscoelastic fluids (Oldroyd-B, FENE-P, and Owens blood model) in a two-dimensional channel partly bounded by a tensioned membrane, a benchmark geometry for fluid–structure interactions. The predicted flow patterns are compared to those of a Newtonian liquid. We find that computations fail beyond a limiting Weissenberg number. Flow fields and membrane shape differ significantly because of the different degree of shear thinning and molecular extensibility underlying the three different microstructural models.     

Electrical conductivity in HMTSF-TNAP under pressure

The resistivity of the organic conductor HMTSF-TNAP has been measured at pressures up to 25 kbar and at temperatures down to 1.2 K. Under pressure the increase in the stacking axis resistivity of HMTSF-TNAP (Δ^2,2 -Bi(4,5-trimethylene-1,3-diselenole)-11,11′,12,12′-tetracyano-2m6- naphtoquinodimethane) below 47 K is reduced, although the transition temperature T_p falls at only 0.7 K kbar^?1. This weak pressure dependence compared to that of HMTSF-TCNQ correlates with the larger resistivity anisotropy in the TNAP salt.     

Promotion of formaldehyde production from adsorbed methoxy by oxidation of Mo(110) with NO2

The reaction of methoxy (OCH3) in the presence of NO2 is studied on a thin-film oxide of Mo(110) for its relevance to the alkane-assisted reduction of NO(x). Temperature-programmed reaction indicates that oxygen deposited by NO2 dissociation promotes formaldehyde evolution. This pathway is not observed in any appreciable amount for methoxy on the thin-film oxide of Mo(110), nor for the reaction of methoxy in the presence of NO or O2. No new intermediates, in particular those containing C-N bonds, are detected after NO2 is exposed to the surface containing methoxy. Furthermore, infrared spectra provide evidence that the presence of NO2 does not significantly perturb the methoxy intermediate. These results indicate that surface oxidation rather than intermolecular complexation is the most likely mechanism by which NO2 promotes the evolution of oxygenates. In addition, the presence of methoxy decreases the capacity of the Mo surface to reduce NO2. No N2 is produced, and molecular desorption predominates. There are also no NO(x) species present after heating to 500 K when NO2 reacts in the presence of methoxy, whereas monomeric NO and dinitrosyl are present when NO2 reacts alone. These results are discussed in the context of CH4-assisted NO(x) reduction.