排序方式: 共有15条查询结果,搜索用时 17 毫秒
1.
2.
分子结构对硫脲类化合物在铜表面自组装能力的影响 总被引:2,自引:0,他引:2
利用电化学阻抗谱和极化曲线研究了硫脲、烯丙基硫脲、苯基硫脲在金属铜表面上的自组装膜的质量和缓蚀效率, 并通过量子化学计算进一步研究了各种分子和金属铜的相互作用. 结果表明硫脲类分子在金属铜表面上的成膜能力顺序为: 苯基硫脲>烯丙基硫脲>硫脲, 并揭示了分子结构对硫脲类化合物在金属铜表面自组装影响的本质, 为进一步寻找和制备优良的缓蚀功能自组装膜提供理论依据. 相似文献
3.
4.
5.
6.
7.
8.
烯丙基硫脲和十二烷基硫醇对铜的缓蚀作用 总被引:14,自引:2,他引:12
用自组装技术在铜电极表面上制备了纯烯丙基硫服自组装膜,并以十二烷基硫 醇进一步修饰得到混合自组装膜。最后,将混合膜覆盖的铜电极浸入NaCl溶液中, 进行交流电处理,电化学交流阻抗谱和极化曲线测定表明,经过交流电处理后,在 0.5mol·dm^-3 NaCl溶液中,电荷传递电阻增大,腐蚀电流密度下降,膜的最大 覆盖度为98.6%,对金属铜腐蚀的续蚀效率为98.5%。而且,不论交流电处理与 否,混合自组装膜在较宽的电极电位范围内均表现出很强的稳定性。 相似文献
9.
10.
Anodic polarization behaviors of iron in pure H2SO4 and three mixed acidic solutions, H2SO4 NaCl,H2SO4 NaNO3 and H2SO4 NaCl NaNO3, were investigated. The potentiodynamie sweep curves showed that the current densities rose and dropped irregularly in H2SO4 NaCl solution at the more anodic potentials since the iron surface suffered pitting attack in the solution, but the pitting corrosion was inhibited effectively in the presence of nitrate ions. The surface morphological measurements indicated that pits appeared on the iron surface in H2SO4 NaCl solution and only a few unobvious corrosion spots were observed in H2SO4 NaCl NaNO3 sointian after the iron electrode was potentiostatically polarized at 1.3 V. The oscillatory properties of iron are associated with the susceptlbility of the iron to pitting. In H2SO4 NaCl solution, the regular potentiostatic current oscillations gradually evolved into the irreg-niar current fluctuations due to occurrence of the pitting; whereas in H2SO4 NaCl NaNO3 solution, the current oscillations took place regularly, like the oscillatory behavior in the pure H2SO4 solution. Thus, when the higher the oscillatory fre-quency, the more irregular oscillatory process and the more sensitive to pitting iron occurred. 相似文献