Nonuniform self-imaging of achromatic Talbot lithography

Achromatic Talbot lithography(ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with ~50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions(45° rotated) and different intensity distributions,results in the final nonuniform pattern distribution.     

上海光源硬X射线相干衍射成像实验方法初探

相干X射线衍射成像方法是一种先进的成像技术,分辨率可达纳米量级.国际上大多数的同步辐射装置和自由电子激光装置都建立了该成像方法,并有将其作为主要成像技术的趋势.上海光源作为目前国内唯一的一台第三代同步辐射光源,尚未建立基于硬X射线的相干衍射成像实验平台.随着一批以波荡器为光源的光束线站投入使用,使得该方法的建立成为了可能.本文基于上海光源BL19U2生物小角散射线站,通过有效的光路设计,搭建了相干衍射实验平台,在12 keV和13.5 keV能量点均获得了硬X射线相干光束,并基于小孔衍射测量了入射光束的空间相干长度.该平台支持常规和扫描相干衍射实验模式,对小孔衍射图样及波带片扫描衍射图样实现了正确的相位重建,证明了该平台初步具备开展硬X射线相干衍射成像实验的能力.硬X射线相干衍射成像实验平台为国内首次建立,将为国内该实验方法的发展和应用提供有效的软硬件支持.