Resonance enhancement of diffuse scattering of x-rays in a waveguide heterostructure

The diffuse scattering of x rays in a four-layer waveguide-type heterostructure is investigated. The dynamic enhancement of diffuse scattering is detected experimentally in regions corresponding to the excitation of waveguide modes for both the incident and scattered waves. Pis’ma Zh. éksp. Teor. Fiz. 66, No. 4, 219–223 (25 August 1997)     

Multilayer optics for XUV spectral region: technology fabrication and applications

We present research investigations in the field of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scientific instrumentation. We discuss normal incidence multilayer optics in the spectral region of “water window”, multilayer optics for collimation and focusing of hard X-ray, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography (ψ-13nm) and short period multilayer optics.     

Microfocus X-Ray Tubes with a Silicon Autoemission Nanocathode as an X-Ray Source

To develop nanostructures with extremely low spatial resolution (to 10 nm and below), a new concept of the use of arrays of microfocus X-ray tubes based on field emission silicon nanocathodes is proposed. A new λ-tunable microfocus source of X-ray radiation, based on a thinfilm transmission target with field emission nanocathode with tunable wavelength, is proposed. The possibility of decreasing the exposed area size to 20 nm and smaller by varying the tube blocking voltage is shown. The use of these X-ray sources opens a new way of developing maskless X-ray lithography.     

Mo-based EUV multilayer filters with enhanced thermal stability

New Mo-based multilayer structures are proposed, and sample free-standing filters 160 mm in diameter with a transparency of 71% at a wavelength of λ = 13.5 nm are described. The enhanced thermo-oxidative stability of filters with Mo layers is demonstrated as opposed to Zr-based films. It is shown in particular that Mo-based filters can withstand vacuum heat annealing at 800°C for three hours without any optical and structural changes.     

Design of the aspheric Schwarzschild lens for a nanolithographer with the operating wavelength λ = 13.5 nm

The design of an aspheric Schwarzschild lens applicable to a nanolithographic test bench with an operating wavelength of 13.5 nm is discussed. Lenses with numerical apertures of 0.3 and 0.4 are examined. The influence of lens aberrations and deviations of optical scheme parameters from rated values on the image quality is analyzed.     

Measurement of the profile and curvature of cylindrical multilayer mirrors irradiated by a divergent X-ray beam

Two techniques for determining the local period and curvature of the surfaces of cylindrical multilayer mirrors are discussed. These techniques make it possible to measure the mentioned parameters of mirrors in a divergent X-ray beam with the wavelength λ = 0.154 nm and differ in the boundary conditions selected.     

Particulars of studying the roughness of substrates for multilayer X-ray optics using small-angle X-ray reflectometry,atomic-force,and interference microscopy

The abilities of standard methods for rough surface investigation are analyzed in case of supersmooth substrates for multilayered X-ray optics. The X-ray specular reflection technique is shown to be the most adequate one. X-ray diffuse scattering and AFM can be applied only in a case of PSD-function calculation and approximation over the entire spectrum range of spatial frequencies.     

Multilayer X-ray mirrors based on La/B<Subscript>4</Subscript>C and La/B<Subscript>9</Subscript>C

Multilayer X-ray mirrors that are based on La/B₄C and La/B₉C and intended for the reflection of X-ray radiation in the spectral region near λ = 6.7 nm are prepared and studied. Reflection coefficients at a level of 40–60% are achieved for mirrors with various periods. The difference in the interlayer roughnesses reconstructed from the data measured in the hard and soft X-ray spectral regions is explained using a structural model with an asymmetric permittivity profile in a mirror period. A proximate technique is developed to estimate the permittivity profile in a multilayer-structure period using reflectometry data. The effect of antidiffusion Sn, Cr, and Mo barriers on the reflection coefficient of multilayer La/B₄C structures is studied experimentally     

Componentry of reflection optics for application in the tesis X-ray astrophysics experiment

Reflection characteristics of multilayer structures for the CORONAS-FOTON optical schemes are described. Mo/Si, Al/Zr, Cr/Mg, Si/Mg, and Mg/B₄C material combinations were studied. Multilayer X-ray mirrors based on these combinations and used at wavelengths 13.2, 17.1, and 30.4 nm were designed.