Flexible electrically pumped random lasing from ZnO nanowires based on metal–insulator–semiconductor structure

Flexible electrically pumped random laser(RL) based on ZnO nanowires is demonstrated for the first time to our knowledge. The ZnO nanowires each with a length of 5 μm and an average diameter of 180 nm are synthesized on flexible substrate(ITO/PET) by a simple hydrothermal method. No obvious visible defect-related-emission band is observed in the photoluminescence(PL) spectrum, indicating that the ZnO nanowires grown on the flexible ITO/PET substrate have few defects. In order to achieve electrically pumped random lasing with a lower threshold, the metal–insulator–semiconductor(MIS) structure of Au/SiO_2/ZnO on ITO/PET substrate is fabricated by low temperature process. With sufficient forward bias, the as-fabricated flexible device exhibits random lasing, and a low threshold current of ～ 11.5 m A and high luminous intensity are obtained from the ZnO-based random laser. It is believed that this work offers a case study for developing the flexible electrically pumped random lasing from ZnO nanowires.     

Impact of oxygen in electrical properties and hot-carrier stress-induced degradation of GaN high electron mobility transistors

The role of the oxygen in AlGaN/GaN high electron mobility transistors (HEMTs) before and after semi-on state stress was discussed. Comparing with the electrical characteristics of the devices in vacuum, air, and oxygen atmosphere, it is revealed that the oxygen has significant influence on the electric characteristics and the hot-carrier-stress-induced degradation of the device. Comparing with the situation in vacuum, the gate leakage increased an order of magnitude in oxygen and air atmosphere. Double gate structure was used to separate the barrier leakage and surface leakage of AlGaN/GaN HEMT it is found that surface leakage is the major influencing factor in gate leakage of SiN-passivated devices before and after semi-on state stress. During semi-on state stress in the oxygen atmosphere, the electric-field-driven oxidation process promoted the oxidation of the nitride layer, and the oxidation layer in the SiN/AlGaN interface leads to the decreasing of the surface leakage.