Measurement and analysis of the surface roughness of Ag film used in plasmonic lithography

The silver(Ag)/photoresist(PR)/Ag structure, widely used in plasmonic photolithography, is fabricated on silicon substrate. The surface roughness of the top Ag film is measured and analyzed systematically. In particular, combined with template stripping technology, the lower side of the top Ag film is imaged by an atomic force microscope. The topographies show that the lower side surface is rougher than the initial surface of the subjacent PR film, which is mainly attributable to the deformation caused by particle collisions during the deposition of the Ag film. Additionally, further measurements show that the Ag film deposited on the PR exhibits a flatter upper side morphology than that directly deposited on the silicon substrate. This is explained by the different growth modes of Ag films on different substrates. This work will be beneficial to morphology analysis and performance evaluation for the films in optical and plasmonic devices.     

基于多层膜结构的亚波长光栅研究

利用表面等离子体共振效应理论及金属-介质复合膜的特殊纳米光学效应对平面多层膜超分辨光刻技术进行了研究. 在曝光光源为365 nm的情况下,实现周期230 nm,线宽100 nm的超分辨光刻成像. 讨论了均匀金属-介质多层膜的结构参数选择,并通过数值仿真得到有效的光强度和对比度, 然后用等离子体纳米光刻进行试验验证,通过最优化选择,最终得到了亚波长结构多层膜的大区域范围超分辨成像.     

深亚波长约束的表面等离子体纳米激光器研究

本文提出了一种新颖的基于半导体纳米线/空气间隙/金属薄膜 复合结构的表面等离子体纳米激光器, 并给出了理论研究和仿真分析. 这种结构通过金属界面的表面等离子体模式与高增益介质纳米线波导模式耦合, 从而使场增强效应得到显著提高. 同时通过数值仿真研究, 得到该混合波导结构的模式特性和增益阈值随空气槽宽度、纳米线半径的变化规律, 表明它可以实现对输出光场的深亚波长约束, 同时保持低损耗传输和高场强限制能力. 通过最优化选择, 最终得到纳米等离子体激光器的最优结构尺寸. 关键词： 表面等离子体 混合等离子体波导 纳米激光器