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Preparation of patterned boron nanowire films with different widths of unit-cell and their field emission properties 下载免费PDF全文
Large-area patterned films of boron nanowires(BNWs) are fabricated at various densities by chemical vapor deposition(CVD). Different widths of unit-cell of Mo masks are used as templates. The widths of unit-cell of Mo masks are100 μm, 150 μm, and 200 μm, respectively. The distance between unit cells is 50 μm. The BNWs have an average diameter of about 20 nm and lengths of 10 μm–20 μm. High-resolution transmission electron microscopy analysis shows that each nanowire has a β-tetragonal structure with good crystallization. Field emission measurements of the BNW films show that their turn-on electric fields decrease with width of unit-cell increasing. 相似文献
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Preparation of few-layer graphene-capped boron nanowires and their field emission properties 下载免费PDF全文
Large-area boron nanowire(BNW) films were fabricated on the Si(111) substrate by chemical vapor deposition(CVD). The average diameter of the BNWs is about 20 nm, with lengths of 5–10 μm. Then, graphene-capped boron nanowires(GC-BNWs) were obtained by microwave plasma chemical vapor deposition(MPCVD). Characterization by scanning electron microscopy indicates that few-layer graphene covers the surface of the boron nanowires. Field emission measurements of the BNWs and GC-BNW films show that the GC-BNW films have a lower turn-on electric field than the BNW films. 相似文献
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