PHOTOLYSIS OF SUBSTITUTED NAPHTHALENES ON SiO2 AND Al2O3

Abstract— Photolysis of naphthalene on the surface of SiO₂ under an atmosphere of air produces phthalic acid as the only major photoproduct, accounting for 49%o of the consumed naphthalene. Photolysis on Al₂O₃ also produces phthalic acid, in 31% yield. Photolysis of 1 -methylnaphthalene on SiO₂ proceeds under similar conditions to produce 2-acetylbenzoic acid (35%) as the major photoproduct with the production of a small amount of I-naphthaldchyde (6%). 1-Cyanonaphthalene does not photooxidize under similar conditions. The presence of oxygen is necessary for the photodecomposition of naphthalene and 1-methylnaphthalene to proceed. Superoxide formed from the photolysis of naphthalene at the SiO₂/air interface is readily observed by electron paramagnetic resonance spectroscopy. In the absence of naphthalene no superoxide is observed. A mechanism involving electron transfer from the S₁ state of the naphthalene to O₂ is proposed on the basis of these observations and related literature precedent.