聚多巴胺-纳米金修饰玻碳电极检测芦丁

采用一锅法制备聚多巴胺-纳米金修饰玻碳电极(PDA-AuNPs/GCE),用扫描电子显微镜(SEM)对修饰电极进行表面形貌分析,并研究芦丁在该修饰电极上的电化学行为。实验表明,PDA-AuNPs/GCE对芦丁有较好的电催化氧化性能,芦丁的氧化峰电流与其浓度在1.0×10-6～1.0×10-4mol·L-1范围内成线性关系,检测下限为2.3×10-7mol·L-1(S/N=3)。该修饰电极可用于复方芦丁片中芦丁含量的检测,效果良好。     

Application of Polyether Amines in Copper Barrier Chemical Mechanical Polishing Slurry北大核心CSCD

The low-k dielectric materials with their low mechanical strength and high porosity for advanced IC processes pose great challenges in barrier CMP slurries, requiring favorable advantages in high removal rate, adjustability, lower surface defects and improved edge over erosion （EOE）. In this paper, the effects of polyether amines on the removal rate and defects toward low-k materials are studied. The results show that the removal rate of low-k material decreases by 68%~85%, the number of residual particles on the surface of low-k material decreases by 80%, and EOE decreases by 2/3, which meets the requirements of advanced technology for barrier CMP slurries. © 2022, Science Press (China). All rights reserved.