面内双轴应力作用下单层黑磷能带性质研究

通过第一性原理对平面内双轴应力作用下的单层黑磷能带结构进行了计算.双轴拉伸应力作用下单层黑磷始终保持直接带隙性质,双轴压缩应力作用下的单层黑磷则发生了直接带隙转变为间接带隙的现象,当双轴压缩应力增加到7%时单层黑磷带隙闭合.     

AlGaN合金中局域态和极化电场的竞争机制

通过MOVPE方法生长了不同Al组分的3块Al_xGa_1-xN样品,利用稳态光谱和时间分辨光谱对其样品的光学特性进行了分析。鉴于影响氮化物发光性质的极化电场或局域态的单一机制不能充分解释我们的实验现象,提出了局域态-内部极化电场竞争的机制。通过对实验数据的分析,得出如下重要结论：样品PL峰位蓝移的温度起点基本对应于局域态和极化电场起作用的交替点,PL峰位发生蓝移的温度起点与光强-温度曲线的斜率出现明显变化的温度点一致;随着温度的升高,若AlGaN合金样品中PL峰位存在二次蓝移,则说明样品中电场分布不均匀。     

Effects of interface roughness on photoluminescence full width at half maximum in GaN/AlGaN quantum wells

Low temperature photoluminescence(PL) measurements have been performed for a set of GaN/AlxGa1-xN quantum wells(QWs). The experimental results show that the optical full width at half maximum(FWHM) increases relatively rapidly with increasing Al composition in the AlxGa1-xN barrier, and increases only slightly with increasing GaN well width. A model considering the interface roughness is used to interpret the experimental results. In the model, the FWHM’s broadening caused by the interface roughness is calculated based on the triangle potential well approximation. We find that the calculated results accord with the experimental results well.     

Effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition

The effect of high-temperature annealing on AlN thin film grown by metalorganic chemical vapor deposition was investigated using atomic force microscopy, Raman spectroscopy, and deep ultra-violet photoluminescence(PL) with the excitation wavelength as short as ～ 177 nm. Annealing experiments were carried out in either N2 or vacuum atmosphere with the annealing temperature ranging from 1200℃ to 1600℃. It is found that surface roughness reduced and compressive strain increased with the annealing temperature increasing in both annealing atmospheres. As to optical properties,a band-edge emission peak at 6.036 eV and a very broad emission band peaking at about 4.7 eV were observed in the photoluminescence spectrum of the as-grown sample. After annealing, the intensity of the band-edge emission peak varied with the annealing temperature and atmosphere. It is also found that a much stronger emission band ranging from 2.5 eV to 4.2 eV is superimposed on the original spectra by annealing in either N2 or vacuum atmosphere. We attribute these deep-level emission peaks to the VAL–ONcomplex in the AlN material.     

Analysis of the decrease of two-dimensional electron gas concentration in GaN-based HEMT caused by proton irradiation

Gallium nitride(Ga N)-based high electron mobility transistors(HEMTs)that work in aerospace are exposed to particles radiation,which can cause the degradation in electrical performance.We investigate the effect of proton irradiation on the concentration of two-dimensional electron gas(2 DEG)in Ga N-based HEMTs.Coupled Schr¨odinger’s and Poisson’s equations are solved to calculate the band structure and the concentration of 2 DEG by the self-consistency method,in which the vacancies caused by proton irradiation are taken into account.Proton irradiation simulation for Ga N-based HEMT is carried out using the stopping and range of ions in matter(SRIM)simulation software,after which a theoretical model is established to analyze how proton irradiation affects the concentration of 2 DEG.Irradiated by protons with high fluence and low energy,a large number of Ga vacancies appear inside the device.The results indicate that the ionized Ga vacancies in the Ga N cap layer and the Al Ga N layer will affect the Fermi level,while the Ga vacancies in the Ga N layer will trap the two-dimensional electrons in the potential well.Proton irradiation significantly reduced the concentration of 2 DEG by the combined effect of these two mechanisms.     

Electron mobility limited by surface and interface roughness scattering in AlxGa1-xN/GaN quantum wells

The electron mobility limited by the interface and surface roughness scatterings of the two-dimensional electron gas in AlxGa1-xN/GaN quantum wells is studied. The newly proposed surface roughness scattering in the AlGaN/GaN quantum wells becomes effective when an electric field exists in the AlxGa1-xN barrier. For the AlGaN/GaN potential well, the ground subband energy is governed by the spontaneous and the piezoelectric polarization fields which are determined by the barrier and the well thicknesses. The thickness fluctuation of the AlGaN barrier and the GaN well due to the roughnesses cause the local fluctuation of the ground subband energy, which will reduce the 2DEG mobility.     

Spacer layer thickness fluctuation scattering in a modulation-doped AlxGa1-xAs/GaAs/AlxGa1-xAs quantum well

We theoretically study the influence of spacer layer thickness fluctuation（SLTF） on the mobility of a twodimensional electron gas（2DEG） in the modulation-doped Al x Ga 1 x As/GaAs/Al x Ga 1 x As quantum well.The dependence of the mobility limited by SLTF scattering on spacer layer thickness and donor density are obtained.The results show that SLTF scattering is an important scattering mechanism for the quantum well structure with a thick well layer.     

Mobility limited by cluster scattering in ternary alloy quantum wires

The mobility limited by cluster scattering in ternary alloy semiconductor quantum wire(QWR) is theoretically investigated under Born approximation. We calculate the screened mobility due to clusters(high indium composition InGaN) scattering in the InxGa1 xN QWR structure. The characteristics of the cluster scattering mechanism are discussed in terms of the indium composition of clusters, the one-dimensional electron gas(1DEG) concentration, and the radius of QWR. We find that the density, breadth of cluster, and the correlation length have a strong effect on the electron mobility due to cluster scattering. Finally, a comparison of the cluster scattering is made with the alloy-disorder scattering. It is found that the cluster scattering acts as a significant scattering event to impact the resultant electron mobility in ternary alloy QWR.     

锁相放大器的研究进展

锁相放大器可同时在时间与幅度两个维度实现高精度信号测量,是精密系统测控的关键部件.本文以锁相放大器的概念、技术与应用的概貌作为导引,先以模拟、数字以及虚拟锁相放大器的主要关系与区分方法说明锁相放大器的发展演变,继而按照锁相环的阶与型从数学角度对锁相放大器进行分类.随后介绍锁相放大器的幅度、频率与相位噪声等主要性能的测试流程与计量标定进展,讨论相位噪声、时域抖动、阿伦方差等关键指标之间的换算关系以及和幅度噪声之间的耦合关联.最后,列举锁相放大器在光谱增强、阻抗分析、磁性测量、显微成像、空间探测领域的应用形式与效果,通过一些新型应用展望它通过智能计算、精准物联等途径从科学仪器走向工业甚至民品的前景.     

Spacer layer thickness fluctuation scattering in a modulation-doped Al_xGa_1-xAs/GaAs/Al_xGa_1-xAs quantum well

We theoretically study the influence of spacer layer thickness fluctuation(SLTF) on the mobility of a twodimensional electron gas(2DEG) in the modulation-doped Al x Ga 1 x As/GaAs/Al x Ga 1 x As quantum well.The dependence of the mobility limited by SLTF scattering on spacer layer thickness and donor density are obtained.The results show that SLTF scattering is an important scattering mechanism for the quantum well structure with a thick well layer.