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Atom Lithography with a Chromium Atomic Beam   总被引:1,自引:0,他引:1       下载免费PDF全文
张文涛  李同保 《中国物理快报》2006,23(11):2952-2955
Direct write atom lithography is a new technique in which resonant light is used to pattern an atomic beam and the nanostructures are formed when the atoms deposit on the substrate. We design an experiment setup to fabricate chromium nanolines by depositing an atomic beam of ^52Cr through an off-resonant laser standing wave with the wavelength of 425.55 nm onto a silicon substrate. The resulting nanolines exhibit a period of 215±3 nm with height of I nm.  相似文献
2.
本文在论述影响硅光电二极管外量子效率诸因素的基础上,着重讨论了器件的收集效率,给出了确定器件外量子效率的一般公式和简化公式。对三个器件进行了自校准实验,确定外量子效率的不确定度在±0.05%,三个器件测量激光束功率的一致性在±0.05%,与现有的绝对辐射计测量结果符合在0.2%。  相似文献
3.
Based on the semi-classical model, we analyse the motion equation of chromium atoms in the laser standing wave field under the condition of low intensity light field using fourth-order Adams-Moulton algorithm. The trajectory of the atoms is obtained in the standing wave field by analytical simulation. The image distortion coming from aberrations is analysed and the effects on focal beam features are also discussed. Besides these influences, we also discuss the effects on contrast as well as the feature width of the atomic beam due to laser power and laser beam waist. The simulation results have shown that source imperfection, especially the transverse velocity spread, plays a critical role in broadening the feature width. Based on these analyse, we present some suggestions to minimize these influences.  相似文献
4.
A dimensional artifact is developed, which is a chromium (Cr) deposition grating fabricated by a laser-focused atomic deposition technique. The mean pitch of the grating is measured by using a metrological atomic force microscope with a large range, where a series of reference signs have been performed to locate the deposition area. Cosine error of the measurement result is analyzed and eliminated by the iterative angle calibration. The measurement result shows that the mean pitch of the grating is 212.66 ±0.02nm, which is very close to half of the standing laser wavelength (λ = 425.55 nm). This means that the grating has traceability with high accuracy and can substitute the laser interference technology for instrument calibration. Moreover, using the Cr deposition grating as a nano standard can shorten the traceability chain and improve the practical application.  相似文献
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