Preparation of high performance thin-film polarizers

<正>The optical performance of thin film polarizers is highly sensitive to the layer thicknesses of thin film.The thicknesses of the sensitive layers are optimized in order to gain broader polarizing zone in such case when the total layer thickness does not increase.An automatic layer thickness control system is established,and errors caused by different monitoring methods are analyzed.With this thickness control system,thin-film polarizers with T_p higher than 98%and T_p/T_s higher than 200:1(T_p and T_s are transmissions for p- and s-polarizations,respectively) with the bandwidth of 11 nm are prepared.Using the system allows for optimum repeatability of three successive runs.     

Nd:YAG激光器光栅式扫描预处理的计算模拟与优化分析

 采用计算模拟的方法，研究了光栅式扫描预处理的扫描方式以及脉冲能量波动、定位误差对预处理效率的影响。研究发现，脉冲能量波动及其定位误差使预处理效率降低，同时其影响与扫描方式之间存在相互调制作用，因此可以通过选择合适的扫描方式以及扫描间隔来优化预处理流程,提高预处理效率。此外发现,光斑呈等边三角形排列时的预处理效率优于正方形。     

热舟蒸发LaF3薄膜的紫外性能研究

研究了沉积温度对热舟蒸发氟化镧薄膜结构和光学性能的影响，沉积温度从200℃上升到350℃，间隔为50℃.采用分光光度计测量了样品的透射率和反射率光谱曲线，并在此基础上进行了光学损耗、光学常数以及带隙和截止波长的计算.采用表面轮廓仪进行了表面形貌和表面粗糙度的标定，采用X射线衍射(XRD)方法测量了不同沉积温度下样品的微结构.发现在短波长波段，随着沉积温度的升高，光学损耗增加，晶粒尺寸增大，表面粗糙度略有增加.不过散射损耗在光学损耗中所占比例均很小，光学损耗的增加主要由吸收损耗引起.随着沉积温度的升高，折射 关键词： 光学薄膜 沉积温度 3')" href="#">LaF₃ 光学损耗     

Influence of Different Substrates on Laser Induced Damage Thresholds at 1064nm of Ta2O5 Films

Ta2O5 films are prepared on Si, BK7, fused silica, antireflection （AR） and high reflector （HR） substrates by electron beam evaporation method, respectively. Both the optical property and laser induced damage thresholds （LIDTs） at 1064 nm of Ta2O5 films on different substrates are investigated before and after annealing at 673 K for 12 h. It is shown that annealing increases the refractive index and decreases the extinction index, and improves the O/Ta ratio of the Ta2O5 films from 2.42 to 2.50. Moreover, the results show that the LIDTs of the Ta2O5 films are mainly correlated with three parameters： substrate property, substoichiometry defect in the films and impurity defect at the interface between the substrate and the films. Details of the laser induced damage models in different cases are discussed.     

Influences of SiO2 laser-induced protective layers and damage threshold of annealing on the Ta2O5 films

Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition. The effects of SiO2 protective layers and annealing on the laser-induced damage threshold （LIDT） of the films are investigated. The results show that SiO2 protective layers exert little influence on the electric field intensity （EFI） distribution, microstructure and microdefect density but increase the absorption slightly. Annealing is effective on decreasing the microdefect density and the absorption of the films. Both SiO2 protective layers and annealing are beneficial to the damage resistance of the films and the latter is more effective to improve the LIDT. Moreover, the maximal LIDT of Ta2O5 films is achieved by the combination of SiO2 protective layers and annealing.     

反射型导模共振滤波器设计

导模共振滤波器由于其高峰值反射率，低旁带反射，窄带以及带宽可控等优良特性引起了人们极大的关注，采用亚波长光栅的导模共振效应可以实现传统基于高低折射率介质的多层膜滤波器所无法实现的特殊功能，在弱调制模式下，其共振带宽可以被压缩到零点几纳米，但是由于介质表面和空气层的菲涅耳反射，使得偏离或者远离共振区时的反射率偏高，根据等效介质理论，亚波长光栅在远离共振区可以被看为均匀的薄膜，本文通过对导模共振光栅进行单层、双层以及三层抗反射设计，有效的降低了导模共振光栅的旁带反射率，从而在可见光波段获得了性能优良的共振滤波 关键词： 导模共振 平面波导 傅里叶模式理论 窄带滤波     

表面热透镜技术探测光学薄膜的微弱吸收

对表面热透镜技术测量光学薄膜的微弱吸收进行了理论分析,并以此建立了薄膜微弱吸收测量实验装置,对几种典型薄膜的吸收进行了测试,证实了这种方法的可行性。     

1064 nm窄带干涉滤光片激光破坏研究

干涉滤光片由于内部谐振场共振吸收特性,其激光破坏过程有别于全反膜而具有特殊的性质。本文从谐振场及湿度场理论出发,计算得出了ZnS/MgF2为主材料的滤光片的谐振场及温度场分布规律。在此规律指导下,对相同膜系结构的一系列滤光片的激光破坏阈值、吸收及破坏形貌进行了测量与分析,结合实验结果对干涉滤光片独具特色的破坏发展过程作出了描述,并给出了一定的解释。     

溅射气压对X射线多层膜反射率的影响

本文在不同的溅射气压的情况下制备了具有相同结构参量的Mo/Si多层膜,测出了其对应的小角度X衍射曲线,在北京同步辐射实验室测量了多层膜的软X射线反射率.小角X射线衍射谱表明:随着溅射气压升高,多层膜的小角X射线衍射曲线的高次峰的峰高急剧变小,半峰宽变大.反射率测量结果也表明:多层膜的X射线反射率随溅射气压的升高而急剧降低.     

Newly designed multilayer thin film mirror for dispersion compensation in Ti:sapphire femtosecond lasers

There are two different effects to generate group delay dispersion by multilayer thin film mirrors: chirper effect and Gires-Tournois effect. Both effects are employed to introduce desired dispersion in the designed mirror. Thus the designed mirror provides large dispersion throughout broad waveband. Such mirror can be used for dispersion compensation in Ti:sapphire femtosecond lasers. Most group delay dispersion of a 5-mm Ti:sapphire crystal can be compensated perfectly with only four bounces of the designed mirror.