Measurement of absolute phase Shift on reflection of thin films using white-light spectral interferometry

A novel method to measure the absolute phase shift on reflection of thin film is presented utilizing a white-light interferometer in spectral domain. By applying Fourier transformation to the recorded spectral interference signal, we retrieve the spectral phase function Ф, which is induced by three parts： the path length difference in air L, the effective thickness of slightly dispersive cube beam splitter Teff and the nonlinear phase function due to multi-reflection of the thin film structure. We utilize the fact that the overall optical path difference （OPD） is linearly dependent on the refractive index of the beam splitter to determine both L and Teff. The spectral phase shift on reflection of thin film structure can be obtained by subtracting these two parts from Ф. We show theoretically and experimentally that our new method can provide a simple and fast solution in calculating the absolute spectral phase function of optical thin films, while still maintaining high accuracy.     

铁电SBN薄膜电光系数的测量及其在波导中的应用

利用溶胶-凝胶法在MgO(001)衬底上获得C轴择优取向的铁电铌酸锶钡(SBN)薄膜，主要介绍MgO(001)衬底上SBN60薄膜及掺入的K离子与Nb离子摩尔比例为1：3的SBN60薄膜横向电光系数r51的测量，实验测得不掺K的SBN60薄膜r51值为37．6pm／V，掺K的r51值为58．5pm／V。并由此设计一种基于MgO(001)衬底上的马赫一曾德尔型SBN60薄膜波导调制器，计算出在633nm时，掺K比例为1：3的此种波导调制器半波调制电压值为10V，不掺K的半波电压值为16V，结果说明掺入K离子能增加薄膜的横向电光系数并有效的减少波导的半波调制电压。     

Design of dispersive multilayer with particle swarm optimization method

<正>We present a new and efficient method for the design of dispersive multilayer by employing a particle swarm optimization(PSO) technique.Its mathematical background is given and an adaptive PSO is realized with computer code.Two practical designing tasks are solved with this method,and the obtained results are competitive compared with other published structures.The adaptive PSO method demonstrates its merits of fast convergence and powerful global search ability,and could be used as a valuable tool for the optical thin film design.     

基于原子层沉积技术的石英管表面减反射膜的制备

采用原子层沉积(ALD)技术在石英管表面制备了薄膜,研究了该薄膜的均匀性,以及石英管的内径、外径、长度对沉积薄膜均匀性的影响。以单波长减反射膜为研究对象,实验测试的反射光谱与仿真结果一致,石英管表面最低反射率可降至0.17%。忽略夹具影响,石英管外壁与内壁的减反射薄膜的非均匀性基本一致,在±1.69%范围内,内外壁表面减反射薄膜的厚度和中心波长相同,且石英管尺寸对内外壁薄膜均匀性无明显影响。利用ALD技术可在大曲率元件的内外表面沉积厚度偏差小且均匀性分布相似的减反射薄膜。     

宽波段波状多层膜结构偏振分束器的设计与优化

本文基于二维光子晶体波状多层膜结构,提出了叠加两种不同膜厚的周期膜堆来拓宽偏振分束器有效带宽的方法.采用粒子群优化算法,建立偏振分束特性的评价函数,优化结构和薄膜厚度等参数,获得了中心波长565 nm,带宽220 nm,平均消光比大于30 dB的宽波段偏振分束器.采用时域有限差分方法分析了膜层顶角的角度敏感性和波状结构的电场分布.结果表明,两个周期膜堆组合的结构解决了禁带不连续的情况,而粒子群优化算法的使用加快了结果收敛,有效地扩展了偏振分束带宽.     

基于亚波长二维光栅的入射角不敏感颜色滤光片研究

提出了一种基于二维亚波长光栅的具有非偏振光入射下入射角不敏感特性的反射式颜色滤光片. 采用严格耦合波分析方法详细分析了光栅周期、光栅层厚度以及固定光栅占空比下光栅的结构尺寸对反射率峰值、反射带位置及带宽的影响. 结合入射角不敏感特性, 经过优化设计得到了光栅的最终结构参数, 获得了中心波长424 nm, 峰值反射率56%, 带宽45 nm的反射滤光片.模拟结果表明, 在非偏振光入射下, 此滤光片的反射光谱表现出显著的入射角不敏感特性. 当入射角高达60°时反射带的中心波长偏移6 nm 反射率下降6%带宽增加8 nm 其参数没有较大变化通过调整光栅的结构参数可在400–520 nm范围内调节滤光片的中心波长以获得不同颜色的入射角不敏感滤光片. 关键词： 反射式滤光片 二维亚波长光栅 入射角不敏感 严格耦合波分析     

一种新型的低角度效应的滤波器

低角度效应的滤波器由高折射率的介质膜和金属膜交替的奇数层膜组成.这种滤波器使用于斜入射光和大光锥角照明时，不仅中心波长移动显著减少，而且特性仍能保持良好.理论和实验表明, 这种新型滤波器能突破现用滤波器对入射角和光锥角的限制.实现低角度效应的主要原理是高折射率材料的使用及其诱导透射的实现. 关键词： 光学薄膜 新型滤波器 低角度效应     

磁控反应溅射SiNx薄膜的研究

用磁控反应溅射(RF)的方法制备了SiN_x薄膜. 分析了以硅为靶材, 用N₂/Ar做溅射气体条件下不同的气流比率、总气压以及沉积速率对薄膜光学常数和表面结构形态的影响, 得出较低总气压下气流比率对薄膜光学常数的影响是最关键的, 而总气压较大的时候, 水汽影响增大, 气流比率的影响反而不明显. 最后提出了合适的工艺条件来制备符合要求的SiN_x薄膜.     

Optical properties of highly photosensitive hybrid sol-gel films

<正>A new organic-inorganic hybrid material,which shows photo-induced reduction of refractive index as well as volume contraction,is prepared using a sol-gel method.This material is coated on a Si substrate by spin-coating to manufacture film.After irradiated by ultraviolet(UV) light with a deuterium lamp for 5 h, the thickness of film decreases largely by 55%,and the refractive index of film changes from 1.484 to 1.445 at 550 nm.The film's optical thickness exhibits an exponential change with the increasing irradiation time.Futhermore.the photo-patternning of the organic-inorganic hybrid film without any further process (wet etching and thermal curing) is performed utilizing the volume contraction on UV-light irradiation. This film has potential applications for fabrication of patterned filter array and apodizing filter by direct light writing,and also demonstrates good temperature stability and immunity to visible light exposure.