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1.
The multilayer Laue lens (MLL) is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current (DC) magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35-41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility (SSRF). One-dimensional (1D) focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.  相似文献   
2.
Aperiodic molybdenum/silicon (Mo/Si) multilayer designed as a broadband reflective mirror with mean reflectivity of 10% over a wide wavelength range of 12.5-28.5 nm at incidence angle of 5° is developed using a numerical optimized method. The multilayer is prepared using direct current magnetron sputtering technology. The reflectivity is measured using synchrotron radiation. The measured mean reflectivity is 7.0% in the design wavelength range of 12.5-28.5 nm. This multilayer broadband reflective mirror can be used in extreme ultraviolet measurements and will greatly simplify the experimental arrangements.  相似文献   
3.
基于多层膜技术的劳厄(Laue)透镜能实现硬X射线纳米级聚焦,在X射线微纳分析领域具有重要的应用前景.基于衍射动力学理论,分析了X射线在多层膜劳厄透镜中的传播,计算了不同结构的多层膜劳厄透镜对8 keVX射线的聚焦性能.结果表明,最外层厚度为5 nm的倾斜多层膜劳厄透镜可获得5.7 nm的聚焦光斑和26%的平均衍射效率...  相似文献   
4.
基于多层膜技术的硬X射线Laue透镜衍射效率的理论研究   总被引:1,自引:0,他引:1  
采用耦合波理论分析了X射线在多层膜Laue透镜中的传播,选择Cu的Kα线作X射线光源,计算了多层膜Laue透镜的衍射效率.材料为WSi2/Si,最外层宽度为10 nm,深度为8 500 nm的多层膜Laue透镜,倾斜情况下外层区域局部光栅的衍射效率可达59%,理论上证明了多层膜Laue透镜是实现X射线聚焦的有效手段.  相似文献   
5.
采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜.利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值.结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力.WSi2单层...  相似文献   
6.
 研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想,运用遗传方法优化设计了在19.5 nm处高反,在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜,利用X射线衍射仪测试了多层膜的结构,在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明:制备出的双功能膜性能与设计相符,在入射角13°,19.5 nm处的反射率达到33.3%,接近传统的19.5 nm周期高反膜的反射率,并且在30.4 nm附近将反射率由1.1%降到9.6×10-4。  相似文献   
7.
采用磁控溅射方法制备了周期数分别为10,30,50和75的Ni/Ti多层膜,利用X射线掠入射反射测量了多层膜表面和界面的状态,并用原子力显微镜测量了多层膜的表面粗糙度,研究了不同周期数的Ni/Ti多层膜表面粗糙度的变化规律。结果表明:Ni/Ti多层膜表面粗糙度随着膜层数增加而增加,当Ni/Ti多层膜的周期数从10变化到75时,其表面粗糙度由0.80 nm增大到1.69 nm。实验数据拟合表明:Ni/Ti多层膜表面粗糙度与周期数成3次方关系;但在周期数较小时,粗糙度与周期数成线性关系。  相似文献   
8.
To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi 2 /Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23-25 μm. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.  相似文献   
9.
We report on the optical performance, structure and thermal stability of periodic multilayer films con- taining Zr and Al(lwt.-%Si) or Al(pure) layers designed for the use as extreme ultraviolet (EUV) high reflective mirrors in the range of 1~19 am. The comparison of A1/Zr (Al(lwt.-%Si)/Zr and Al(pure)/Zr) multilayers fabricated by direct-current magnetron sputtering shows that the optical and structural per- formances of two systems have much difference because of Si doped in A1. From the results of grazing incidence X-ray reflection (GIXR), X-ray diffraction (XRD), and EUV, the Si can disfavor the crystalliza- tion of AI and smooth the interface, consequently increase the reflectance of EUV in the Al(lwt.-%Si)/Zr systems. For the thermal stability of two systems, the first significant structural changes appear at 250 ~C. The interlayers are transformed from symmetrical to asymmetrical, where the Zr-on-A1 interlayers are thicker than Al-on-Zr interlayers. At 295 ~C for Al(pure)/Zr and 298 ~C for Al(lwt.-%Si)/Zr, the interfaces consist of amorphous Al-Zr alloy transform to polycrystalline Al-Zr alloy which can decrease the surface roughness and smooth the interfaces. Above 300 ~C, the interdiffusion becomes larger, which can enlarge the differences between Zr-on-Al and Al-on-Zr interlayers. Based on the analyses, the Si doped in Al cannot only influence the optical and structural performances of Al/Zr systems, but also impact the reaction temperatures in the annealing process.  相似文献   
10.
准确地划分玉米杂种优势群,可有效地指导种质的改良、杂种优势模式的构建和新品种的选育.目前主要利用系谱法、配合力测定、同工酶和分子标记等进行玉米杂种优势类群的划分,这些划分方法成本高,操作复杂,甚至有的方法还需破坏种子.本文探索了利用近红外光谱技术(NIRS)快速、无损地划分玉米杂种优势群的可行性.使用MPA型傅里叶变换近红外光谱仪漫反射模式采集整粒玉米种子的光谱,用滑动平均窗口平滑、一阶差分导数、矢量归一化对光谱进行预处理.将光谱用主成分分析方法降维到低维空间,使用层次聚类法对A组6个中国的骨干自交系和B组的6个优良自选系共12个材料进行杂种优势群划分,结果将A组6个自交系划分为3类,A1(郑58)和A2(掖478)为一类,A3(昌7-2)和A4(黄早四)为一类,A5(Mo17)和A6(四F1)为一类,这与系谱法分析结果高度吻合.对B组6个自选系,将B1和B2,B3和B4,B5和B6分别划分为一类,与SSR标记的类群划分结果一致.由此可见,利用NIRS划分玉米杂种优势类群是简便、快速、高效、可行的方法.  相似文献   
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