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Properties of Diamond-Like Carbon Films Synthesized by Dual-Target Unbalanced Magnetron Sputtering 下载免费PDF全文
Smooth, dense and uniform diamond-like carbon films (DLC films) for industrial applications have successfully been prepared by dual-target unbalanced magnetron sputtering and the DLC characteristics of the films are confirmed by Raman spectra. It is found that the sputtering current of target plays an important role in the DLC film deposition. Deposition rate of 3.5 μm/h is obtained by using the sputtering current of 30 A. The friction coefficient of the films is 0.2-0.225 measured by using a pin-on-disc microtribometer. The structure of the films tends to have a growth of sp^3 bonds content at high sputtering current. The compressive residual stress in the films increases with the increasing sputtering current of the target. 相似文献
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采用N++Cr+多元离子束增强沉积合成(TiCr)N膜层,对膜层进行了AES、TEM和XRD分析.测试了膜基体系的力学性能和电化学性能.与普通物理气相沉积相比,多元离子束增强沉积显示了开发新型薄膜材料的较强潜力. Multicomponent ion beam enhanced deposition was used to synthesize (TiCr)N films. The films were characterized by AES,TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition. 相似文献
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离子束溅射沉积Ti-Ni薄膜及其电化学性能的研究 总被引:1,自引:0,他引:1
利用离子束溅射沉积的方法在不同基片温度条件下制备了不同成分的Ti-Ni贮氢薄膜,研究了其电化学贮氢性能。结果表明:用离子束溅射沉积制备的Ti-Ni薄膜的结构为非晶状,薄膜对基片的附着力较强,在冲放电循环50次后仍为非晶态;在基片温度为350℃时制备的薄膜的结构为晶态,在多次放电循环后呈现非晶化趋势;Ti-Ni薄膜具有较高的电化学活性,晶化薄膜比晶态薄膜的最大放电容量高,但晶化薄膜的循环稳定性差。 相似文献
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