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Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography 总被引:1,自引:0,他引:1 下载免费PDF全文
Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved. 相似文献
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计算电容是复现电学阻抗单位的基准装置, 利用计算电容值和量子霍尔电阻值可以准确计算出精细结构常数α. 计算电容的本质是通过高准确度地测量屏蔽电极的位移, 实现对电容量值的测量. 因此, 基于Fabry-Perot干涉仪的精密电极位移测量系统是计算电容装置中最为核心和关键的部分. 在Fabry-Perot干涉仪测位移过程中, 由于高斯激光束存在轴向Gouy相位, 该附加相位将会引起相邻干涉条纹对应位移的变化(大于或者小于λ/2), 导致位移的测量值与实际值存在偏差. 本文阐述了高斯激光场的传播特性, 利用高斯激光束在自由空间和透过薄透镜复振幅的变换关系, 建立了计算电容装置中Fabry-Perot干涉仪透射光束的传输模型; 通过对不同腔长的Fabry-Perot干涉仪透射光场相位的分析, 获得了高斯激光束轴向Gouy相位修正与传输距离的关系. 结果表明, 当腔长从111.3 mm移动至316.3 mm时, 在接收距离为560 mm的情况下, 高斯光束轴向Gouy 相位引起的位移修正的绝对值最小为0.7 nm, 其相对相位修正量|δL|/|ΔL| = 3.4×10-9. 相似文献
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Analysis of Cr atom focusing deposition properties in the double half Gaussian standing wave field 下载免费PDF全文
The use of the dipole force on atoms is a new technology that is used to build nanostructures. In this way, a high quality standard nano-grating can be obtained. Based on the semi-classical model, the motion equation is investigated and the trajectories of atoms in double half Gaussian standing wave field are simulated. Compared with the Gaussian standing wave field, the double half Gaussian standing wave can well focus the Cr atoms. In order to obtain this kind of beam, a prism is designed and the experimental result shows that the beam is well generated. 相似文献
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This paper presents the experimental progress of laser-focused Cr atomic deposition and the experimental condition.The result is an accurate array of lines with a periodicity of 212.8±0.2 nm and mean full-width at half maximum as approximately 95 nm.Surface growth in laser-focused Cr atomic deposition is modeled and studied by kinetic Monte Carlo simulation including two events:the one is that atom trajectories in laser standing wave are simulated with the semiclassical equations of motion to obtain the deposition position;the other is that adatom diffuses by considering two major diffusion processes,namely,terrace diffusion and step-edge descending.Comparing with experimental results(Anderson W R,Bradley C C,McClelland J J and Celotta R J 1999 Phys.Rev.A 59 2476),it finds that the simulated trend of dependence on feature width is in agreement with the power of standing wave,the other two simulated trends are the same in the initial stage.These results demonstrate that some surface diffusion processes play important role in feature width broadening.Numerical result also shows that high incoming beam flux of atoms deposited redounds to decrease the distance between adatoms which can diffuse to minimize the feature width and enhance the contrast. 相似文献
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为了说明原子光刻(Atom Lithography)在纳米计量及传递作用中的特殊地位,首先对纳米计量标准及其现状进行了简要介绍,提出纳米计量中原子光刻的基本概念和优势,结合原子光刻实验装置对原子光刻技术的工作机理进行了分析。结果表明,可以通过原子光刻技术得到纳米量级刻印条纹,为纳米计量及标准传递提供更加精确的手段。最后对常见的2种原子光刻技术——沉积型原子光刻和虚狭缝型原子光刻进行了阐述,指出2者的不同之处,为不同条件下原子光刻提供了一定的借鉴。 相似文献
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激光功率对铬原子束一维沉积的影响 总被引:1,自引:0,他引:1
以粒子光学方法为基础,利用适当步长的四阶Runge-Kutta算法模拟研究了准直铬原子束经过波长为425.55 nm,功率分别为3.93mW和40 mW的一维高斯激光驻波场汇聚作用后所沉积的一维条纹情况.在以上两种激光功率下,沉积条纹沿ox方向的结构质量的周期性相同,而沿着oy方向的结构质量却存在很大的差异:在3.93 mW时,每一根沉积条纹在oy方向上都非常清晰,并且半高宽在[-0.5,0.5](以激光束腰半径为单位)的区域内具有较好的一致性,对比度在[-0.2,0.2]区域内有较好一致性;在40mW时,每一根沉积条纹呈现出较为复杂的结构,在激光束的中轴区域附近[-1.08, 1.08]内,原本在3.93 mW时的一根条纹分裂成三根.另外,3.93 mW时y=0的平面内条纹情况和40 mW时y=±1.08平面内情况对应性很好,即平均间距为212.78nm,半高宽为21.65 nm,对比度为24.78.分析结果表明,较好地沉积条纹与适当激光功率有关. 相似文献
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