ECR微波等离子体离子输运的数值模拟

建立了ECR微波等离子体源离子输运的平板和圆柱模型,对离子历经的空间区域的输运过程进行了数值研究。采用Monte Carlo(M-C)方法模拟了存在外磁场情况下,离子离开开放电室后历经中性区、鞘层区、最后被加负偏压的工作表面吸收的全过程,考虑了离子与中性粒子的电荷交换碰撞玫弱性散性,统一处理了中性区和鞘层区电势的衔接,采用曲线拟合,电势自洽迭代方法把中性区和鞘层区衔接起来,得到了光滑自治的电势分布曲线和鞘层区不同位置处的速度分布、能量分布及角分布。     

C20离子团簇在氧化物中穿行时库仑爆炸过程的理论研究

研究了C20团簇在几种金属氧化物(Al2O3,SiO2)中穿行时发生的库仑爆炸过程.采用线性介电响应理论,并结合Mermin形式的介电函数,得到了团簇中各组成离子的空间感应势,其中组成团簇中各组成离子的电荷分布情况由Brandt-Kitagawa有效电荷理论模型来描述.通过求解运动方程得到离子团结构随时间的演化过程,并采用Monte Carlo方法模拟了爆炸过程中的多重散射现象.我们发现,尾流效应使团簇的空间结构和电荷分布呈现非对称性.     

Effect of Parallel-Plate Geometry on Mode Transition Behavior in Argon Microplasmas: Two-Dimensional Simulation

A two-dimensional self-consistent fluid model is employed to investigate radio-frequency process parameters on the plasma properties in Ar microdischarges. The neutral gas density and temperature balance equations are taken into account. We mainly investigate the effect of the electrode gap on the spatial distribution of the electron density and electron temperature profiles, due to a mode transition from the regime(secondary electrons emission is responsible for the significant ionization) to the regime(sheath oscillations and bulk electrons are responsible for sustaining discharge) induced by a sudden decrease of electron density and electron temperature.The pressure, radio-frequency sources frequency and voltage effects on the electron density are also elaborately investigated.     

The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2 plasmas: Two-dimensional simulations

A two-dimensional (2D) fluid model is presented to study the behavior of silicon plasma mixed with SiH4 , N2 , and NH3 in a radio-frequency capacitively coupled plasma (CCP) reactor. The plasma-wall interaction (including the deposition) is modeled by using surface reaction coefficients. In the present paper we try to identify, by numerical simulations, the effect of variations of the process parameters on the plasma properties. It is found from our simulations that by increasing the gas pressure and the discharge gap, the electron density profile shape changes continuously from an edge-high to a center-high, thus the thin films become more uniform. Moreover, as the N2 /NH3 ratio increases from 6/13 to 10/9, the hydrogen content can be significantly decreased, without decreasing the electron density significantly.     

Influence of Incident Velocity on the Penetration for C20 Clusters Moving through Oxides

A theoretical model is established to simulate the penetration process of C20 clusters in oxides （Al2O3, SiO2） at different incident velocities. The induced spatial potential by the incident clusters is described by the dielectric response formalism, in which the Mermin-type dielectric function is adopted to provide a realistic evaluation of the electronic properties of the oxides. The charge distribution of individual ions is derived by using the Brandt-Kitagawa effective charge model, also under the consideration of the asymmetric influence from the wake potential. The stopping power of the clusters and the Coulomb explosion processes are derived by solving the motion equation of the individual ions, when taking into account the multiple scattering effect simulated by using the Monte Carlo method. It is found that the dynamical interaction potential between ions leads to a spatial asymmetry to the cluster structure and the charge distribution for high velocity clusters, and will not be in effect as the incident velocities decrease.     

One-Dimensional Fluid Model for Dust Particles in Dual-Frequency Capacitively Coupled Silane Discharges

A self-consistent fluid model, which incorporates density and flux balances of electrons, ions, neutrals and nanoparticles, electron energy balance, and Poisson＇s equation, is employed to investigate the capacitively coupled silane discharge modulated by dual-frequency electric sources. In this discharge process, nanoparticles are formed by a successive chemical reactions of anion with silane. The density distributions of the precursors in the dust particle formation are put forward, and the charging, transport and growth of nanoparticles are simulated. In this work, we focus our main attention on the influences of the high-frequency and low-frequency voltage on nanoparticle densities, nanoparticle charge distributions in both the bulk plasma and sheath region.     

相位角对容性耦合电非对称放电特性的影响

电非对称效应作为一种新兴技术，被广泛用于对离子能量和离子通量的独立调控.此外，在改善等离子体的径向均匀性方面，电非对称效应也发挥了重要作用.本文采用二维流体力学模型，并耦合麦克斯韦方程组，系统地研究了容性耦合氢等离子体中当放电由多谐波叠加驱动时，不同谐波阶数k下的电非对称效应，重点观察了相位角θ_n对自偏压以及等离子体径向均匀性的影响.模拟结果表明：在同一谐波阶数下，自偏压随相位角θ_n的变化趋势不尽相同，且当k增大（k>3）时，自偏压随最高频相位角θ_k的变化范围逐渐减小.此外，通过调节相位角θ_n，可以改变轴向功率密度和径向功率密度的相对关系，进而实现对等离子体径向均匀性的调节.研究结果对于利用电非对称效应优化等离子体工艺过程具有一定的指导意义.     

Driving frequency effects on the mode transition in capacitively coupled argon discharges

A one-dimensional fluid model is employed to investigate the discharge sustaining mechanisms in the capacitively coupled argon plasmas, by modulating the driving frequency in the range of 40 kHz-60 MHz. The model incorporates the density and flux balance of electron and ion, electron energy balance, as well as Poisson’s equation. In our simulation, the discharge experiences mode transition as the driving frequency increases, from the γ regime in which the discharge is maintained by the secondary electrons emitted from the electrodes under ion bombardment, to the α regime in which sheath oscillation is responsible for most of the electron heating in the discharge sustaining. The electron density and electron temperature at the centre of the discharge, as well as the ion flux on the electrode are figured out as a function of the driving frequency, to confirm the two regimes and transition between them. The effects of gas pressure, secondary electron emission coefficient and applied voltage on the discharge are also discussed.     

C20离子团簇在氧化物中穿行时库仑爆炸过程的理论研究

本文研究了C20团簇在几种金属氧化物（Al2O3，SiO2）中穿行时发生的库仑爆炸过程，采用线性介电响应理论，并结合Memfin形式的介电函数，得到了团簇中各组成离子的空间感应势，其中组成团簇中各组成离子的电荷分布情况由Brandt-Kitagawa有效电荷理论模型来描述。通过求解运动方程得到离子团结构随时间的演化过程，并采用Monte Carlo方法模拟了爆炸过程中的多重散射现象。我们发现，尾流效应使团簇的空间结构和电荷分布呈现非对称性。     

Fundamental study towards a better understanding of low pressure radio-frequency plasmas for industrial applications

Two classic radio-frequency (RF) plasmas, i.e., the capacitively and the inductively coupled plasmas (CCP and ICP), are widely employed in material processing, e.g., etching and thin film deposition, etc. Since RF plasmas are usually operated in particular circumstances, e.g., low pressures (mTorr-Torr), high-frequency electric field (13.56 MHz-200 MHz), reactive feedstock gases, diverse reactor configurations, etc., a variety of physical phenomena, e.g., electron resonance heating, discharge mode transitions, striated structures, standing wave effects, etc., arise. These physical effects could significantly influence plasma-based material processing. Therefore, understanding the fundamental processes of RF plasma is not only of fundamental interest, but also of practical significance for the improvement of the performance of the plasma sources. In this article, we review the major progresses that have been achieved in the fundamental study on the RF plasmas, and the topics include 1) electron heating mechanism, 2) plasma operation mode, 3) pulse modulated plasma, and 4) electromagnetic effects. These topics cover the typical issues in RF plasma field, ranging from fundamental to application.