氯醇盐溶胶-凝胶法纳米结构氧化钨薄膜的光谱学特性

由非离子型Gemini表面活性剂TMDD(HO(EO)xC14(EO)yOH)为结构导向模板, 改进EISA(挥发诱导自组装)镀膜工艺经300 ℃焙烧制得具有连续、均一和光学透明特点的蠕虫介孔纳米晶孔壁氧化钨薄膜. 采用SEM、TEM和Raman光谱对此种薄膜的介孔纳米结构进行了表征, 通过光谱电化学、XPS和椭偏谱等方法, 研究了该薄膜在电解质溶液中的电致变色行为. 结果表明, 所制备的纳米结构氧化钨薄膜在633 nm波长处的循环可逆透过率调制幅度可达75%以上, 并且其电致变色机理具有显著的双注入吸收调制特性.     

固相反应法制备Co掺杂ZnO的磁性和光学性能研究

研究了以固相反应法制备Co掺杂ZnO粉体的磁性和光学性能，测试结果表明对于均匀掺杂的Zn_0.95Co_0.05O粉体，Co²⁺随机取代Zn²⁺的位置进入ZnO晶格.Co²⁺之间的3d自旋电子耦合交换作用使得近邻的Co²⁺自旋反平行，Zn_0.95Co_0.05O粉体在3—300K表现为顺磁性，而非铁磁性. 关键词： ZnO 固相反应 稀磁半导体 顺磁性     

高温处理对CNx薄膜晶化的影响

利用直流磁控溅射制得非晶态氮化碳膜,然后在高温下、常压N气氛中进行热处理,利用DTA,XRD和Auger研究晶化前后氮化碳成分、结构以及键态的变化.实验结果表明:在1186℃附近出现了晶化现象,高温晶化处理可以促进无定形氮化碳向晶态转变,在XRD图谱上出现α-C3N4衍射峰.Auger实验结果表明膜中出现富C,Si,N的区域.     

Magnetic properties of Mn-doped ZnO diluted magnetic semiconductors

A series of Mn-doped ZnO films have been prepared in different sputtering plasmas by using the inductively coupled plasma enhanced physical vapour deposition. The films show paramagnetic behaviour when they are deposited in an argon plasma. The Hall measurement indicates that ferromagnetism cannot be realized by increasing the electron concentration. However, the room-temperature ferromagnetism is obtained when the films are deposited in a mixed argon-nitrogen plasma. The first-principles calculations reveal that antiferromagnetic ordering is favoured in the case of the substitution of Mn^2＋ for Zn^2＋ without additional acceptor doping. The substitution of N for O （NO^-） is necessary to induce ferromagnetic couplings in the Zn-Mn-O system. The hybridization between N 2p and Mn 3d provides an empty orbit around the Fermi level. The hopping of Mn 3d electrons through the empty orbit can induce the ferromagnetic coupling. The ferromagnetism in the N-doped Zn-Mn-O system possibly originates from the charge transfer between Mn^2＋ and Mn^3＋ via NO^-, The key factor is the empty orbit provided by substituting N for O, rather than the conductivity type or the carrier concentration.     

玻璃空间电离辐照着色损伤考核方法

针对空间电离辐照的复杂性,在玻璃空间电离辐照着色损伤动力学研究基础上,讨论了玻璃空间电离辐照着色损伤考核面临的问题,提出了一种动力学的考核方法。基于该方法,以K9-HL玻璃为研究对象,研究了特定轨道(近地点350km,远地点425km,轨道倾角51.6°)下玻璃空间电离辐照着色损伤过程,分析了特定轨道下玻璃空间电离辐照着色损伤特征,结果显示:K9-HL玻璃特征轨道在轨20年后蓝光区域透过率降低严重导致其必然呈现淡黄色,严重影响了其作为高性能无色光学材料的使用。此外,对玻璃空间电离辐照着色损伤~(60)Co-γ射线辐照考核方法的适用性进行了分析讨论,结果表明,采用~(60)Co-γ射线作为辐照源分析玻璃空间电离辐照着色损伤可能引入较大误差,造成该现象的原因是~(60)Co-γ射线在玻璃中的作用深度极大及考核方法未考虑色心弛豫消失。     

磁约束电感耦合等离子体增强溅射沉积Co掺杂ZnO薄膜及其光学特性

采用磁约束电感耦合等离子体增强溅射法(ICP-PVD)在Si(100)和石英玻璃衬底上沉积了Zn_0.95Co_0.05O薄膜。XRD谱显示薄膜具有较强的(002)衍射峰,表明Zn_0.95Co_0.05O薄膜为c轴择优取向生长;透过光谱显示Zn_0.95Co_0.05O薄膜具有良好的透过性,其在可见光和红外波段的平均透过率大于80%,吸收光谱表明Co²⁺取代了Zn²⁺处于四配位晶体场中;喇曼光谱证明Zn_0.95Co_0.05O薄膜具有良好的六方纤锌矿结构;室温PL谱测量发现在可见光的蓝光波段和绿光波段存在较宽的发光带,却没有发现本征的近紫外光发射,这是由于Co掺杂后引入较多的缺陷导致的。     

微等离子体氧化Al2O3陶瓷膜的组织结构与形成过程

The alumina ceramic coatings were prepared on aluminum alloy using micro-plasma oxidation. The structure and morphologies of ceramic coatings were studied by X-ray diffraction (XRD) and scanning electron microscope (SEM), and then its formation process was investigated. The results of XRD reveal that with increasing oxidation time the content of γ-Al₂O₃in the ceramic coatings decreases, and in which the content of α-Al₂O₃increases. The results of SEM show that many crater-mouth like traces formed by the plasma discharge are observed on the coatings surface, it indicates when the plasma is discharging, a plasma thermal chemical reaction occurs between the aluminum from the substrate and the oxygen and other ions from the electrolyte. The reaction products then are propelled away from the inner-wall of the discharging channels. Finally, these products agglomerate in the inner-wall of the discharging channels and on the surface near the discharging channels to produce the ceramic coatings. The change of ceramic coatings thickness with increasing oxidation time divides into two stages, and the final thickness is formed in first stage. With increasing current density the final thickness of ceramic coatings increases.     

高温处理对CNx薄膜晶化的影响

利用直流磁控溅射制得非晶态氮化碳膜,然后在高温下、常压Ｎ气氛中进行热处理,利用ＤＴＡ,ＸＲＤ和Ａｕｇｅｒ研究晶化前后氮化碳成分、结构以及键态的变化．实验结果表明：在１１８６℃附近出现了晶化现象,高温晶化处理可以促进无定形氮化碳向晶态转变,在ＸＲＤ图谱上出现α Ｃ３Ｎ４衍射峰．Ａｕｇｅｒ实验结果表明膜中出现富Ｃ,Ｓｉ,Ｎ的区域 关键词：     

介孔氧化钨电色薄膜的制备与性能研究

采用一种新的非离子型gemini表面活性剂结构导向模板, 成功制备了介孔氧化钨薄膜. 通过SAXRD, TEM和N₂吸附-脱附等方法考察薄膜的制备和微结构特性, 发现获得的产物具有三维蠕虫介孔结构, 比表面积可达145.5 m²• g^－1. 测定了该薄膜在无水高氯酸锂/碳酸丙烯酯电解质溶液中的循环伏安和电致变色性能, 并与无模板薄膜进行了对比研究. 研究表明, 由于具有更大的电化学活性比表面, 纳米介孔氧化钨薄膜表现出增强的电色性能, 在633 nm波长处的透过率调制幅度可达60%以上, 着色效率为51.7 cm²•C^－1.     

Co掺杂ZnO薄膜的局域结构和电荷转移特性研究

采用磁束缚电感耦合等离子体溅射沉积法在不同的氧气分压下制备了Zn_0.95Co_0.05O和Zn_0.94Co_0.05Al_0.01O薄膜.利用X射线吸收精细结构技术对薄膜O-K,Co-K和Co-L边进行了局域结构研究,结果表明：Co²⁺取代了四配位晶体场中的Zn²⁺而未改变ZnO的六方纤锌矿结构,高真空条件下制备的薄膜 关键词： Co掺杂ZnO 稀磁半导体 X射线吸收精细结构 共振非弹性X射线散射