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The characteristics of a nitrogen arc using a graphite cathode and a melting anode in a pilot-scale plasma furnace are investigated. The voltage is examined as a function of current and apparent plasma length. The voltage increases non-linearly with the increase of apparent plasma length, with the current fixed. The experimental data so obtained are compared with the predictions of the Bowman model for the electric arc, and with numerical simulations as well. The level of agreement between the experimental data at the melting anode and the numerical predictions confirms the suitability of the proposed the Bowman model. These characteristics are relevant to the engineering design and evaluation of a DC plasma furnace and reactor for the treatment of hazardous fly ash waste. 相似文献
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给出了均匀磁化等离子体介质中的简并与近简并的建党波四波混频形成反射光栅位形时的普适非线性耦俣方程组,在不作无衰减抽运近似的情况下,得到了任意复耦合系数时的方程组的精确解,其解不仅可以推广到各种等离子体形态,而且可以推广到光致折射材料中去。 相似文献
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The interaction of an atmospheric pressure plasma jet using argon or argon plus hydrogen peroxide vapour addition with bacillus subtilis 下载免费PDF全文
This paper reports that an atmospheric pressure dielectric barrier discharge plasma jet, which uses argon or argon + hydrogen peroxide vapour as the working gas, is designed to sterilize the bacillus subtilis. Compared with the pure argon plasma, the bacterial inactivation efficacy has a significant improvement when hydrogen peroxide vapour is added into the plasma jet. In order to determine which factors play the main role in inactivation, several methods are used, such as determination of optical emission spectra, high temperature dry air treatment, protein leakage quantification, and scanning electron microscope. These results indicate that the possible inactivation mechanisms are the synergistic actions of chemically active species and charged species. 相似文献
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给出了均匀磁化等离子体介质中的简并与近简并的寻常波四波混频形成反射光栅位形时的普适非线性耦合方程组。在不作无衰减抽运近似的情况下,得到了任意复耦合系数时的方程组的精确解。其解不仅可以推广到各种等离子体形态,而且可以推广到光致折射材料中去。对进一步理论研究四波混频相位共轭,发展新的非线性光学器件可能有所帮助。 相似文献
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利用微波电子回旋共振等离子体增强型化学气相沉积(ECR-PECVD)采用一步法直接在K9玻璃上低温沉积制备了多晶硅薄膜.研究了不同实验参数对薄膜沉积的影响,采用X射线衍射(XRD)、拉曼光谱、扫描电子显微镜(SEM)等实验分析方法对不同条件下制备的样品进行了晶体结构和表面形貌分析,并讨论了多晶硅薄膜沉积的最佳条件.实验结果表明,玻璃衬底上多晶硅薄膜呈柱状生长,并有一定厚度的非晶孵化层;较高氢气比例和衬底温度有利于结晶,薄膜的结晶率达到了62%;晶粒团簇的最大尺寸约为500nm. 相似文献
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利用感应耦合等离子体(ICP)增强射频磁控溅射技术在Si(111)片和M2钢表面制备了ZrN薄膜,研究了基片的温度和ICP功率对ZrN薄膜的结构以及性能影响.研究发现:在基片温度≤300℃沉积的ZrN薄膜择优取向为(111);基片温度达到450℃时薄膜出现ZrN(200)衍射峰,ZrN(111)晶面的织构系数明显降低.传统磁控溅射沉积薄膜为柱状结构,当ICP为200 W,基片温度为300℃时沉积薄膜中柱状晶体消失;随着基片温度的升高,N/Zr元素比例降低,并且薄膜的电阻率下降;相对于传统溅射,ICP增强射
关键词:
感应耦合等离子体
磁控溅射
ZrN
微结构 相似文献