首页 | 本学科首页   官方微博 | 高级检索  
文章检索
  按 检索   检索词:      
出版年份:   被引次数:   他引次数: 提示:输入*表示无穷大
  收费全文   18篇
  免费   20篇
  国内免费   1篇
数学   1篇
物理学   38篇
  2021年   3篇
  2018年   2篇
  2017年   3篇
  2015年   3篇
  2014年   3篇
  2013年   2篇
  2012年   1篇
  2011年   2篇
  2010年   2篇
  2009年   8篇
  2008年   9篇
  2006年   1篇
排序方式: 共有39条查询结果,搜索用时 31 毫秒
1.
Metallic nanoparticle(NP) shapes have a significant influence on the property of composite embedded with metallic NPs. Swift heavy ion irradiation is an effective way to modify shapes of metallic NPs embedded in an amorphous matrix. We investigate the shape deformation of AgNPs with irradiation fluence, and 357 MeV Ni ions are used to irradiate the silica containing AgNPs, which are prepared by ion implantation and vacuum annealing. The UV-vis results show that the surface plasmon resonance(SPR) peak from AgNPs shifts from 400 to 377 nm. The SPR peak has a significant shift at fluence lower than 1 × 10~(14) ions/cm2 and shows less shift at fluence higher than 1 × 10~(14) ions/cm~2. The TEM results reveal that the shapes of AgNPs also show significant deformation at fluence lower than 1 × 10~(14) ions/cm~2 and show less deformation at fluence higher than1 × 10~(14) ions/cm~2. The blue shift of the SPR peak is considered to be the consequence of defect production and AgNP shape deformation. Based on the thermal spike model calculation, the temperature of the silica surrounding Ag particles first increases rapidly, then the region of AgNPs close to the interface of Ag/silica is gradually heated. Therefore, the driven force of AgNPs deformation is considered as the volume expansion of the first heated silica layer surrounding AgNPs.  相似文献   
2.
The surface damage to gallium nitride films irradiated by Ar^q+ (6≤q≤16) ions at room temperature is studied by the atomic force microscopy. It is found that when charge state exceeds a threshold value, significant swelling was turned into obvious erosion in the irradiated region. The surface change of the irradiated region strongly depends on the charge state and ion fluence. On the other hand, surface change is less dependent on the kinetic energy nearly in the present experimental range (120 keV≤Ek≤220 keV). For q≤14, surface of the irradiated region is covered with an amorphous layer, rough and bulgy. A step-up appears between the irradiated and un-irradiated region. Moreover, the step height and the surface roughness are functions of the ion dose and charge state, and increase with the increase of dose and charge state. Especially at and near boundary, a sharp bump like ridges in irradiated areas is observed, and there appear characteristic grooves in un-irradiated areas. For q=16, surface of the irradiated region was etched and erased.  相似文献   
3.
用不同电荷态的126Xeq+离子(9≤q≤30)在室温下轰击GaN晶体表面,经原子力显微镜分析表明,当q>18,辐照区域由隆起转为显著的刻蚀.被轰击后的GaN晶体表面形貌主要取决于入射离子的电荷态.同时,样品表面形貌还与入射离子的剂量和入射角有关;在实验参数范围,与入射离子的初动能没有明显关系(180 keV≤Ek≤600 keV).当入射离子的电荷态q=18,与样品表面法线成60°角倾斜入射和垂直表面入射时,样品的表面几乎没有变化,只是倾斜入射后有很微小的隆起;当q<18时,样品表面膨胀隆起,粗糙度增强,倾斜入射时表面隆起比垂直入射时更明显,而且都有清晰的峰状分界区;当q>18时,样品表面被蚀刻呈凹陷状,有明显的齿状刻痕,且侵蚀深度与离子剂量近似呈线性关系,倾斜入射时的刻蚀深度大于垂直入射时的刻蚀深度. 关键词: 高电荷态离子 GaN晶体 原子力显微镜 表面形貌  相似文献   
4.
利用20 keV的He离子注入表面蒸镀了Au薄膜的尖晶石(MgAl2O4)样品, 随后对注入样品进行了退火处理。 在紫外可见光谱上观察到了由于金属纳米颗粒的存在而引起的较强的表面等离子体共振吸收峰, 提供了材料中金属纳米颗粒形成的光谱证据。 并对形成的Au纳米颗粒的尺寸随退火温度以及He注入剂量的变化进行了研究。 Spinel deposited with a thin Au film was implanted with helium ions, and annealed in vacuum condition subsequently. The surface Plasmon resonance absorbance peak due to the existence of metallic nanoparticles in the dielectric matrix was observed on the Ultraviolet Visible Spectrometry, indicating the formation of metallic nanoparticles in spinel. The dependence of Au particles size with annealing temperature and implantation doses was also investigated.  相似文献   
5.
沿Si的(100)面注入He离子, 能量为30 keV、 剂量为5×1016 ions/cm2。 注入后样品切成几块, 在真空炉中分别做退火处理, 退火温度从600 ℃到1 000 ℃, 退火时间均为30 min。 利用原子力显微镜研究了各个样品表面形貌的演化。 发现样品表面形貌与退火温度相关联。 假设在气泡中He原子与空位的比值很高, 导致样品内部存在高压的He泡, 从而使样品表面形貌发生变化。 探讨了在Si中He泡随退火温度的演化和He原子在材料中的释放机制及其对表面的影响。  相似文献   
6.
利用傅立叶变换红外光谱仪对注He尖晶石样品随退火温变化而引起光吸收性能的变化进行了研究。 发现尖晶石样品在626.4 cm-1附近的吸收峰随注入剂量的增加向小波数方向移动, 而在随后退火过程该吸收峰随退火温度的增加而向大波数方向回复。 该吸收峰的回复行为依赖于注入剂量和退火温度。 认为在626.4 cm-1附近吸收峰随注入剂量和退火温度的这种变化与尖晶石中He的俘获以及释放有关。 The infrared absorption behavior of helium implanted spinel with annealing temperature was studied by Fourier transformed infrared (FTIR) spectroscopy. It was found that the absorbance peak at 626.4 cm-1 shifted to smaller wave numbers with the increase of implantation fluence, while on subsequent annealing the absorbance peak shifted back to larger wave numbers with the increase of annealing temperature. The shift of the peak at 626.4 cm-1 with He implantation/annealing is considered to be related with the trapping and release of helium atoms in lattice sites in the spinel crystal.  相似文献   
7.
主要研究了铅离子辐照注碳4H—SiC样品在3个不同退火温度下傅立叶变换红外光谱的变化。从红外谱的变化可以知道铅辐照注碳4H-SiC样品在一定深度内出现了非晶层,波数在960—1450cm^-1范围内出现了干涉带,干涉带强度随着退火温度的升高而 变弱。1373K退火后样品的卢瑟福背散射分析结果显示,一定深度内硅原子的背散射产额明显减少。4H-SiC specimens were implanted with C-ions and then irradiated with Pb-ions, and subsequently annealed at three different temperatures. The samples were investigated by using Fourier transformation infrared spectrum(FTIR) and Rutherford backward scattering(RBS). The obtained FTIR spectra showed that there is a buried amorphous layer close to the ion-incident surface and there are several interference fringes in the range from 960 to 1 450 cm ^-1. The intensity of fringes decreases with the increase of annealing temperature. The obtained RBS spectra showed that the yield of Si atoms in 4H-SiC crystal decreases in a well-defined depth region after annealing at 1 373 K.  相似文献   
8.
应用拉曼光谱研究了5 MeV Kr离子(注量分别为5×1013,2×1014,1×1015 ions/cm2)室温注入6H SiC单晶及其高温退火处理后结构的变化。 研究表明, 注入样品的拉曼光谱中不仅出现了Si—C振动的散射峰, 还产生了同核Si—Si键和C—C键散射峰。 Si—C散射峰强度随退火温度升高而增强, 当退火温度高达1000 ℃时, 已接近未辐照SiC的散射峰强度。晶体Si—Si键散射峰强度随退火温度变化不大, 而非晶Si—Si键散射峰强度随退火温度的增加逐渐消失。相对拉曼强度(Relative Raman Intensity, 简称RRI)随注量的增加逐渐减小并趋于饱和, 且不同退火温度样品的饱和注量不相同; RRI随退火温度的增加逐渐升高, 这在低注量样品中表现得尤为明显。 低、中、高3种注量样品的RRI随退火温度的增加从重合逐渐分离, 并且退火温度越高, 分离越大。 Raman spectroscopy was used to study the structure changes of 6H SiC single crystal implanted with 5 MeV Kr (Krypton) at room temperature and subsequently annealed at high temperature. The Raman spectrum of the implanted SiC displays not only Si—C bonds vibration peaks, but also homonuclear Si—Si and C—C bond vibration peaks. Si—C bond vibration peaks gradually strengthen with increasing temperature. When annealing at 1000 ℃, the peak intensity of Raman spectrum is close to that of virgin specimen. It is found that crystal Si—Si bond vibration peaks do not change when annealing, but amorphous Si—Si bond vibration peaks disappear with increasing annealing temperature. The Relative Raman Intensity (RRI) values decrease with increasing fluence and tend to saturate, but the saturation fluences is different for various anneal temperature. The RRI values increases with raising annealing temperature, which is more obvious in low implanted specimens. At the same time, the RRI values separate gradually with increasing temperature and this phenomenon is strengthened by annealing temperature.  相似文献   
9.
分别进行了2.3 MeV20 Ne8+ 离子和5.0 MeV84 Kr19+ 离子辐照GaN样品的实验, 并对实验样品进行了HRXRD的分析。结果发现, 随着这两种离子辐照剂量的增大, GaN的HRXRD谱(0002)衍射峰的峰位出现了向小角侧有规律的移动, 并在较高剂量时衍射峰发生分裂。同时, 对衍射峰的峰位的移动和峰形的变化等现象反映的辐照损伤机制进行了研究, 并探讨了电子能损与核能损各自在晶格损伤中的作用。Irradiation experiments of gallium nitride (GaN) with 2.3 MeV20 Ne8+ and 5.0 MeV84 Kr19+ respectively were performed. The irradiated samples were analyzed using the high\|resolution X\|ray diffraction (HRXRD) spectrometry. It was found that the diffraction peak of GaN (0001) exhibited regular shift to smaller diffraction angles with the increase of ion fluence for the both ions, and the diffraction peak split into a few sub\|peaks at higher irradiation dose. Underlying mechanisms of the observed peak shift and split were investigated, the contributions of different energy losses to the damage accumulation in the irradiated GaN were discussed.  相似文献   
10.
丁兆楠  杨义涛  宋银  张丽卿  缑洁  张崇宏  罗广南 《物理学报》2017,66(11):112501-112501
为了探讨聚变堆候选低活化钢的抗辐照性能,在兰州重离子加速器国家实验室HIRFL的材料辐照终端,利用63 MeV的~(14)N离子和336 MeV的~(56)Fe离子在-50?C下对一种国产低活化钢进行辐照实验.借助离子梯度减能装置,使入射离子能量在0.22—6.17 MeV/u之间变化,从而在样品表面至24μm深度范围内产生0.05—0.20 dpa的原子离位损伤坪区.利用纳米压痕仪测试样品辐照前后的显微硬度,通过连续刚度测量(constant stiffness measurement)得到低活化钢硬度的深度剖面信息.使用Nix-Gao模型很好地描述了纳米压痕硬度随深度递减的现象(压痕尺寸效应,indentation size effect),从而有效避免了低能离子辐照的软基体效应(softer substrate effect).正电子湮灭寿命谱显示低活化钢在辐照之后长寿命成分增加,说明样品中产生了大量缺陷形成空位团,从而导致了材料力学性能的变化,在离子辐照剂量增加至0.2 dpa时,平均寿命τ_m增加量逐渐变慢,材料中辐照产生的缺陷趋于饱和.  相似文献   
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号