High-quality CdS quantum dots sensitized ZnO nanotube array films for superior photoelectrochemical performance

The surface characteristics of ZnO were synthetically optimized by a self-designed simultaneous etching and W-doping hydrothermal method utilizing as-prepared ZnO nanorod (NR) array films as the template. Benefiting from the etching and regrowth process and the different structural stabilities of the various faces of ZnO NRs, the uniquely etched and W-doped ZnO (EWZ) nanotube (NT) array films with larger surface area, more active sites and better energy band structure were used to improve the photoelectrochemical (PEC) performance and the loading quality of CdS quantum dots (QDs). On the basis of their better surface characteristics, the CdS QDs were uniformly loaded on EWZ NT array film with a good coverage ratio and interface connection; this effectively improved the light-harvesting ability, charge transportation and separation as well as charge injection efficiency during the PEC reaction. Therefore, all the CdS QD-sensitized EWZ NT array films exhibited significantly enhanced PEC performance. The CdS/EWZ-7 composite films exhibited the optimal photocurrent density with a value of 12 mA· cm^-2, 2.5 times higher than that of conventional CdS/ZnO-7 composite films under the same sensitization times with CdS QDs. The corresponding etching and optimizing mechanisms were also discussed.     

钨掺杂BiVO4光阳极降解环丙沙星的表面态行为

采用简单浸渍的方法对BiVO₄光阳极进行表面钨(W)掺杂,以环丙沙星(CIP)为药品和个人护理产品(PPCPs)模型污染物,研究了W掺杂BiVO₄光阳极降解CIP的表面态行为。结果表明,低浓度W掺杂对BiVO₄光阳极的晶体结构、表面形貌和光吸收性能没有显著影响。但W掺杂取代了BiVO₄光阳极表面的V⁵⁺,能抑制BiVO₄光阳极表面V⁵⁺/V⁴⁺还原过程,减少复合中心表面态,同时引入更多氧空穴,增加活性位点表面态。CIP的降解反应受表面活性位点控制。表面W掺杂能有效促进CIP降解的电荷转移,提高BiVO₄光阳极光电催化降解性能。     

W doped SnO2 growth via sol–gel routes and characterization: Nanocubes

The effects of W doping on the characteristical properties of SnO₂ thin films prepared by sol–gel spin coating method were investigated. The SnO₂ thin films were deposited at various W doping ratios and characterized by various measurements. XRD studies indicated that the undoped and W doped SnO₂ films had cubic and tetragonal phases. The SEM images of WTO thin films showed cubic shaped nanocubes corresponding to cubic phase and the smaller particles corresponding to tetragonal phase were formed on the film surfaces, and their distributions and sizes were dependent on the W doping ratio. EDX spectroscopy analyses showed that the calculated and participated atomic ratios of W/(W + Sn) (at.%) in the starting solution and in the WTO thin films were almost close. It was found that the sheet resistance depended on W doping ratio and 2.0 at.% W doped SnO₂ (WTO) exhibited lowest value of sheet resistance (7.11 × 10³ Ω/cm²).     

钨掺杂对锂离子电池LiNiO2正极材料性能的影响

采用溶胶-凝胶法制备了钨掺杂镍酸锂正极材料(LiNi_(1-x)W_xO_2,x=1%、3%),研究了钨掺杂对LiNiO_2正极材料电化学性能的影响。结果表明,钨掺杂明显地改善了LiNiO_2的充放电循环性能,在100 mA·g~(-1)的电流密度和2.5～4.5 V电压范围的测试条件下,LiNi_(0.99)W_(0.01)O_2材料循环400次后的容量保持率为62.51%,而LiNiO_2在相同循环条件下的保持率仅为47.06%。同时,钨掺杂也提升了LiNiO_2的充放电倍率性能,掺杂材料在每一个倍率下放电比容量均高于未掺杂材料。     

衬底温度对反应磁控溅射W掺杂ZnO薄膜的微观结构及光电性能的影响

采用直流脉冲反应磁控溅射方法生长W掺杂ZnO（WZO）透明导电氧化物薄膜并研究了衬底温度对薄膜微观结构、组分、表面形貌以及光电性能的影响.实验结果表明,WZO薄膜具有良好的（002）晶面择优取向,且适当的衬底温度是制备优质WZO薄膜的关键因素.随着衬底温度升高,薄膜表面粗糙度先增大后减小;衬底温度较高时,薄膜的结构致密,结晶质量好,电子迁移率高.当衬底温度为325℃时,WZO薄膜获得最低电阻率9.25×10^-3Ω·cm,方块电阻为56.24Ω/□,迁移率为11.8 cm² V^-1·s^-1,其在可见光及近红外区域（400—1500 nm）范围的平均透过率达到85.7%.     

钨掺杂BiVO4光阳极降解环丙沙星的表面态行为

采用简单浸渍的方法对BiVO₄光阳极进行表面钨(W)掺杂,以环丙沙星(CIP)为药品和个人护理产品(PPCPs)模型污染物,研究了W掺杂BiVO₄光阳极降解CIP的表面态行为。结果表明,低浓度W掺杂对BiVO₄光阳极的晶体结构、表面形貌和光吸收性能没有显著影响。但W掺杂取代了BiVO₄光阳极表面的V⁵⁺,能抑制BiVO₄光阳极表面V⁵⁺/V⁴⁺还原过程,减少复合中心表面态,同时引入更多氧空穴,增加活性位点表面态。CIP的降解反应受表面活性位点控制。表面W掺杂能有效促进CIP降解的电荷转移,提高BiVO₄光阳极光电催化降解性能。     

W掺杂对β-Ga_2O_3导电性能影响的理论研究

采用密度泛函理论的平面波超软赝势计算方法,对不同W掺杂浓度下β-Ga2O3的导电性能进行研究.计算了β-Ga2(1-x)W2x O3(x=0,0.0625,0.125)的优化参数、总态密度和能带结构.结果表明,W掺入β-Ga2O3使Ga2(1-x)W2x O3材料的体积增大,总能量升高,稳定性降低.当W的掺杂量较小时,其电子迁移率较大,导电性能也很强.当增加W的掺杂量,Ga2(1-x)W2x O3材料的平均电子有效质量就略有增大,能隙变得越窄,这与实验的变化趋势相一致.