Si(001)衬底上分子束外延生长Ge0.975Sn0.025合金薄膜

使用低、高温两步法生长的高质量Ge薄膜作为缓冲层,在Si(001)衬底上采用分子束外延法生长出Ge_0.975Sn_0.025合金薄膜.X射线双晶衍射和卢瑟福背散射谱等测试结果表明,Ge_0.975Sn_0.025合金薄膜具有很好的晶体质量,并且没有发生Sn表面分凝.另外,Ge_0.975Sn_0.025合金薄膜在500 ℃下具有很好的热稳定性,有望在Si基光电器件中得到应用. 关键词： GeSn Ge 分子束外延 外延生长     

A comparison of silicon oxide and nitride as host matrices on the photoluminescence from Er+ ions

This paper compares the properties of silicon oxide and nitride as host matrices for Er ions.Erbium-doped silicon nitride films were deposited by a plasma-enhanced chemical-vapour deposition system.After deposition,the films were implanted with Er3+ at different doses.Er-doped thermal grown silicon oxide films were prepared at the same time as references.Photoluminescence features of Er3+ were inspected systematically.It is found that silicon nitride films are suitable for high concentration doping and the thermal quenching effect is not severe.However,a very high annealing temperature up to 1200° C is needed to optically activate Er3+,which may be the main obstacle to impede the application of Er-doped silicon nitride.     

第二届大学生数学夏令营数学竞赛简况

<正> 由中科院数学研究所举办的第二届全国大学生数学夏令营,1988年7月22日至29日在北京举行.夏令营期间举办了数学竞赛,竞赛分两试进行,第一试的考题侧重基础知识;第二试则要求学生灵活运用所学的知识.两次试题见附录.全国36名大学生参加了竞赛.这次数学竞赛排出了个人成绩和团体成绩两个名次.获个人成绩前五名是:第一名 魏军城 (武汉大学),159分,第二名 白学政 (北京大学),138分,     

Sixteen-element Ge-on-SOI PIN photo-detector arrays for parallel optical interconnects

We describe the structure and testing of one-dimensional array parallel-optics photo-detectors with 16 photodiodes of which each diode operates up to 8 Gb/s. The single element is vertical and top illuminated 30μm-diameter silicon on insulator （Ge-on-SOI） PIN photodetector. High-quality Ge absorption layer is epitaxially grown on SO1 substrate by the ultra-high vacuum chemical vapor deposition （UHV-CVD）. The photodiode exhibits a good responsivity of 0.20 A/W at a wavelength of 1550 nm. The dark current is as low as 0.36/aA at a reverse bias of 1 V, and the corresponding current density is about 51 mA/cm2. The detector with a diameter of 30 t.trn is measured at an incident light of 1.55 μm and 0.5 mW, and the 3-dB bandwidth is 7.39 GHz without bias and 13.9 GHz at a reverse bias of 3 V. The 16 devices show a good consistency.     

GaN非线性光学效应研究进展

本文简述了对非线性光学材料的一般要求，详细介绍了GaN材料的极化效应，以及因此而具有的良好非线性光学效应。以波长转换为例说明了它在未来全光网络中的应用前景。     

随机生长误差对双腔型平顶法布里-珀罗滤波器的影响

在光网络中平顶滤波器可以有效地提高信道光检测的快速性和准确性。利用两个法布里珀罗腔间的串联耦合,可以构建出具有平顶透射特性的双腔型法布里珀罗滤波器。采用传输矩阵的方法,研究了随机生长误差对双腔型平顶滤波器透射特性的影响。模拟分析表明,当两个法布里珀罗腔的物理厚度差超过一个纳米时,在透射谱中就会出现两个高度不同的透射峰;解释了实测器件的透射谱中的双峰不对称性;用界面起伏的概念解释了实测滤波器带宽大于理论值的原因。理论分析与实验结果取得了较好的一致。     

A Two-Dimensional Photonic Crystal Slab Mirror with Silicon on Insulator for Wavelength 1.3μm

A concrete two-dimensional photonic crystal slab with triangular lattice used as a mirror for the light at wavelength 1.3μm with a silicon-on-insulator （SOI） substrate is designed by the three-dimensional plane wave expansion method. For TE-like modes, the bandgap in the Г-K direction is from 1087nm to 1559nm. The central wavelength in the bandgap is about 1.3μm, hence the incident light at wavelength 1.3μm will be strongly reflected. Experimentally, such a photonic crystal slab is fabricated on an SOI substrate by the combination of EBL and ICP etching. The measurement of its transmission characteristics shows the bandgap edge in a longer wavelength is about 1540 nm. The little discrepancy between the experimental data and the theoretical values is mainly due to the size discrepancy of the fabricated air holes.     

采集强干扰下微弱信号的APD电路系统研究

基于雪崩光电二极管反向偏压及其电容特性,利用时间同步原理,构建了一个用于回避强烈反射光信号,探测微弱回波信号的雪崩光电二极管探测系统.对雪崩光电二极管电容效应作出了分析,得出交流高压供电会使雪崩光电二极管产生干扰尖峰脉冲的结论.为了消除这个电容效应产生的尖峰干扰,提出了施加直流反向低压的方案,以达到减少雪崩光电二极管电容变化量的目的.通过实验数据验证了方法可行性.     

带隙法测定SiGe/Si材料的应变状态

从固体模型理论的结果出发，计算了生长于Si（100）衬底上x值小于085的Si_1-xGe_x合金材料（能带结构为类Si结构）的间接带隙与应变的关系，结 果表明，应变的S iGe材料的带隙和完全弛豫状态下材料的带隙之差与应变呈线性关系.基于这一结果，提出了 用测量带隙来间接测定SiGe/Si应变状态的方法.用带隙法和x射线双晶衍射法测量了不同应 变状态下的SiGe/Si多量子阱材料的应变弛豫度，两者可以较好的符合，表明带隙法测量SiG e应变弛豫度是可行的. 关键词： SiGe合金 应变 带隙     

多层光子晶体滤波器研究

从双层结构出发研究了一种由多块不同的单周期光子晶体组合而成的多层结构的滤波器，论述了这种滤波器的工作原理，研究表明这种结构适于制作带通、窄带通过、带阻、宽带带阻、高通以及其它各种性能的滤波器。实验和理论研究的结果相一致。