Thermal oxidation-grown vanadium dioxide thin films on FTO (Fluorine-doped tin oxide) substrates

By deposition of metallic vanadium on FTO substrate in Argon atmosphere at room temperature, the sample was then annealed in furnace for 2 h at the temperature of 410 °C in air ambient. (1 1 0) -orientated vanadium dioxide films were prepared on the FTO surface. A maximum transmittance of ∼40% happened at 900–1250 nm region at room temperature. The change of optical transmittance at this region was ∼25% between semiconducting and metallic states. In particular, vanadium dioxide thin films on FTO exhibit semiconductor–metal phase transition at ∼51 °C, the width of the hysteresis loop is ∼8 °C.     

导电玻璃上室温沉积钛膜及TiO2纳米管阵列的制备与表征

在掺氟的SnO2(FTO)导电玻璃衬底上采用射频磁控溅射的方法室温沉积纯Ti薄膜,以NH4F/甘油为电解液,经电化学阳极氧化得到结构有序、微米级的TiO2纳米管阵列/FTO复合结构,并通过场发射扫描电子显微镜(FESEM)、X射线衍射(XRD)以及光电化学的方法对纳米管阵列进行了表征.研究表明,在氩气气压为0.5Pa,功率为150W,时间为0.5h条件下在导电玻璃上室温沉积获得钛膜的结构为晶带T型组织,表面均匀性好且致密度较高;在电压为30V下,随着阳极氧化时间从1h延长至3h,纳米管的管径从50nm增加到75nm,纳米管的长度从750nm增至1100nm后减至800nm,管壁由平滑变为波纹状;随氧化电压的升高,纳米管管径逐渐增大,而表面覆盖物逐渐减少,可通过在稀的HF溶液(0.05%(w,质量分数))中超声清洗去除;此外,瞬态光电流测试表明结晶的电极表现出更好的光电转换性能,紫外光照射下能促进TiO2光生载流子有效分离,在热处理温度为450℃时,具有较高的光电化学性能.