柠檬酸铝/聚丙烯酰胺胶态分散凝胶反应动力学和机理的研究

采用粘度法研究了柠檬酸铝（AlCit)与部分水解取丙烯酰胺（HPAM）胶态分散凝胶体系的反应动力学。结果表明，胶态分散凝胶体系的交联反应是一级反应。并推导出胶态分散凝胶体系的反应动力学方程。     

羟基铝溶液及铝交联蒙脱土的研究

本文用(27)~Al NMR法和8-羟基喹啉萃取法分别研究了羟基铝溶液中十三聚铝含量的变化规律,还用X-射线衍射法研究了铝交联蒙脱土d_(001)的变化。研究结果表明,铝离子的聚合情况主要由羟铝比决定,而浓度影响不大。随着羟铝比的增加,溶液中单核铝离子含量减少,十三聚铝离子相对含量增加,所得铝交联蒙脱土的d_(001)也随之增大。参照这些变化规律、控制羟基铝溶液的组成,可以制备各种层柱状铝交联蒙脱土复合物。     

3-Cyanopyridine-2(1H)-thiones and 3-cyano-2-(methylthio)pyridines in the synthesis of substituted 3-(aminomethyl)pyridines

The reactions of substituted 3-cyanopyridine-2(1H)-thiones and 3-cyano-2-(methylthio)pyridines with lithium aluminum hydride in anhydrous diethyl ether afforded the corresponding 3-aminomethyl derivatives, which were used in the synthesis of the corresponding amides.     

应变速率和电位对应力腐蚀裂纹扩展的影响

以滑移-溶解-再钝化模型为基础,推导出应力腐蚀裂纹扩展速率与裂尖应变速率和电位之间的理论公式.计算表明,在裂纹扩展速率与裂尖应变速率的关系曲线中有两个特征区域.裂纹扩展速率在区域I随裂尖应变速率增加而增大,而在区域II不随裂尖应变速率的改变而变化.用慢应变速率拉伸技术（SSRT）测量了304L不锈钢的裂纹增长速率.当电位控制在区域II的阳极区时,理论计算的裂纹扩展速率与实验得到的结果比较吻合.     

苯并三氮唑及其羧酸酯衍生物对铜缓蚀机理的分子动力学模拟研究

用分子动力学(MD)方法, 模拟计算了5种铜缓蚀剂[苯并三氮唑(BTA)、苯并三氮唑-5-羧酸甲酯(MBTC)、苯并三氮唑-5-羧酸丁酯(BBTC)、苯并三氮唑-5-羧酸己酯(HBTC)、苯并三氮唑-5-羧酸辛酯(OBTC)]与Cu₂O晶体的相互作用. 结果发现, 中性条件下缓蚀剂分子与Cu₂O晶体的结合能均大于酸性条件下的数值, 但两种条件下结合能的大小排序均为OBTC＞HBTC＞BBTC＞MBTC＞BTA. 对体系各种相互作用以及对关联函数g(r)的分析表明, 体系结合能主要由库仑作用提供, Cu₂O晶体中的Cu原子与缓蚀剂分子中的N原子之间形成了配位键. 在与Cu₂O(001)晶面结合过程中, BTA及其衍生物分子发生了扭曲变形, 但形变能远小于体系的非键相互作用能.     

Kinetics of the Formation of Goethite in the Presence of Sulfates and Chlorides of Monovalent Cations

The synthesis of goethite by oxidation of Fe²⁺in presence of metallic iron was undertaken in an aqueous medium containing indifferent salts such as Na₂SO₄, (NH₄)₂SO₄, NaCl, and NH₄Cl. Temperature and bubbling air rate were maintained, respectively, at 70°C and 1 L/min. The influence of anions and cations on the kinetics of each step of the process has been followed distinctly, the iron dissolution rate has been determined by the variation of the medium acidity, and the precipitation of goethite has been determined by gravimetric measurements. With respect to Cl⁻, the SO₄²⁻anion decreases the rate of the two reactions. NH₄⁺acts as an inhibitor when it is present at low concentrations and as an accelerator for higher concentrations; the limit corresponding to the change of NH₄⁺behavior depends on the nature of the counter ion. The reaction product is composed of pure goethite in the presence of sulfate salts, whereas a mixture of goethite and lepidocrocite, respectively, 60–70 and 40–30%, was observed in the presence of chloride salts.     

Application of thermomagnetometry to corrosion studies of archaeological iron

Summary Thermomagnetometry has been applied to mineralized archaeological iron samples and samples from accelerated corrosion tests. It has successfully quantified the degree of corrosion, measured by the loss of iron, as well as the amount of magnetite formed and water held in the corrosion and adhered soil layers. Thermomagnetometry, thermogravimetric analysis and differential scanning calorimetry have been applied to the reported corrosion products from archaeological iron. Fourier transform infra-red and Raman spectroscopies and X-ray diffraction analyses were undertaken on the residues and at intermediate heating stages, where the thermal analyses indicated, to identify the reaction products.     

From crown ethers to zeolites: Reaction of EtAlCl2 with crown ethers

In contrast to aluminum alkyls, alkyl aluminum halides such as EtAlCl₂ react with crown ethers to form cation-anion pairs which exhibit the liquid clathrate effect. Specifically, [12-C-4·AlCl₂][AlCl₃Et] and [18-C-6·AlCl₂][AlCl₃Et] have been isolated and characterized by X-ray diffraction techniques. The cations show aluminum in an octahedral environment made up of four of the oxygen atoms from the crown and two chlorine atoms. The 12-C-4 derivative crystallizes in the monoclinic space group P2₁/c with cell constants of a=7.497(4), b=22.121(8), c=12.339(5) Å, =94.99(3)^o, and Z=4 for =1.43 g cm^–3. Least-squares refinement based on 1413 observed reflections led to a final conventional R value of 0.093. The 18-C-6 complex belongs to the triclinic space group P1 with a=8.414(4), b=12.193(6), c=12.394(6) Å, =73.14(4), =86.07(4), =81.52(4)^o, and Z=2 for =1.45 g cm^–3. Refinement based on 2605 observed reflections led to R=0.063. The complex aluminum-containing species are related to a class of compounds called aluminoxanes.     

Complexation of Al(III) by 8-Hydroxyquinoline and Drastic Fluorescence Enhancement in Reverse Micelles

Complexation of Al^IIIby 8-hydroxyquinoline and fluorescence behavior of the quinolinate(s) were studied in reverse micellar systems at low water content, and compared to aqueous media. Two surfactants were used: one was cationic (CTAC: cetyltrimethylammonium chloride) and the other was anionic (AOT: sodium bis(2-ethylhexyl)sulfosuccinate). The results obtained in the CTAC/dichloromethane system (W= [H₂O]/[surfactant] = 0.9) showed that complexation occurred very likely in the oil phase and no micellar effect was observed. On the contrary, in the presence of AOT, specific micellar effects were observed due to the presence of the anionic polar heads: stabilization of the positively charged 1:1 and 1:2 chelates, at the expense of the neutral water-insoluble 1:3 chelate which is formed in aqueous solutions under similar conditions;drastic fluorescence enhancement factorsof 120 and 100 in AOT/heptane (W= 1.5) and AOT/dichloromethane (W= 1.6), respectively. Such factors have never been reported so far in either hydroorganic or direct micellar systems. In return, the length of time for the production of the complex(es) is increased because of the microheterogeneity of the medium and the small sizes of the water pools.     

Chemical Liquid Phase Deposition of Thin Aluminum Oxide Films

Introduction Inorganic oxide films have attracted a lot of interest in the last several decades. Among them, silicon dioxide films are widely used in modern microelectronics, optics and mechanics. This material has been grown by various methods including thermal oxidation, chemical vapor phase deposition, plasma-enhanced chemical vapor phase deposition, and so on.1,2 Recently, Nagayama et al.3 have reported that SiO2 thin films could be produced by a new chemical method of liquid phase depos…