Second Dissociation Constants of 4-[N-morpholino]butanesulfonic Acid and N-[2-hydroxyethyl]piperazine-N′-4-butanesulfonic Acid from 5 to 55°C

The values of the second dissociation constant, pK ₂, for the dissociation of the NH⁺ charge center of the zwitterionic buffer compounds 4-(N-morpholino)butanesulfonic acid (MOBS), and N-(2-hydroxyethyl)piperazine-N-4-butanesulfonic acid (HEPBS) have been determined from 5 to 55°C, including, 37°C at intervals of 5°C. The electromotive-force (emf) measurements have been made utilizing hydrogen electrodes and silver–silver chloride electrodes. The value of pK ₂ for MOBS was found to be 7.702 ± 0.0005, and 8.284 ± 0.0004 for HEPBS, at 25°C, respectively. The related thermodynamic quantities, G ^o, H ^o, S ^o, and C _p ^o for the dissociation processes of MOBS and HEPBS have been derived from the temperature coefficients of pK ₂. Both the MOBS and HEPBS buffer materials are useful as primary pH standards for the control of pH 7.3 to 8.6 in the region close to that of physiological fluids.     

液相色谱专家系统中柱系统推荐规则的建立和验证

把分子结构和分子、离子静电作用力作为影响溶质保留值和选择性的基本点,提出了液相色谱专家系统柱系统推荐的基本规则,由此可以从溶质所包含的基团或官能团的信息进行色谱柱系统推荐。为了验证这些规则的正确性,应用几类常用的或典型的样品从分子结构通道进行液相色谱柱系统推荐,获得满意的结果。     

Controlled-porosity glasses as alternative adsorbents to silica gel for HPLC

Summary The paper deals with the use of controlled-porosity glasses (CPGs) as adsorbents for HPLC. The physicochemical and chromatographic properties of small-pore CPGs are compared to the analogous properties of silica gels. The results show good correlation between them and suggest the possibility of application of CPGs as adsorbents for liquid chromatography.     

An extremal problem related to probability

Summary We consider a walk from a stateA ₁ to a stateA _n+1 in which the probability of remaining atA _i isp _i , and the probability of progressing fromA _i toA _i+1 is 1 –p _i . The probabilityW _nk of reachingA _n+1 fromA ₁ in exactlyn + k steps can then be expressed as a polynomial of degreen + k in then variablesp ₁,,p _n . We determine the maximum value ofW _nk and the (unique) choice (p ₁,,p _n ) for which this extremum occurs.Dedicated to Professor Otto Haupt with best wishes on his 100th birthday     

A class of interaction-round-a-face models and its equivalence with an ice-type model

A new model (called the Temperley-Lieb interactions model) is introduced, in two-dimensional lattice statistics, on a square lattice . The Temperley-Lieb equivalence of this model to the six-vertex, self-dual Potts, critical hard-hexagons and critical nonintersecting string models is established. A graphical equivalence of this model to the six-vertex model generalizes this equivalence to noncritical cases of the above models. The order parameters of a specialization of this model are studied.     

Percolation in strongly correlated systems: The massless Gaussian field

We derive a number of new results for correlated nearest neighbor site percolation onZ ^d. We show in particular that in three dimensions the strongly correlated massless harmonic crystal, i.e., the Gaussian random field with mean zero and covariance –, has a nontrivial percolation behavior: sites on whichS _x h percolate if and only ifh _c . with0 _c < . This provides the first rigorous example of a percolation transition in a system with infinite susceptibility.     

Growth of Ni2Si by rapid thermal annealing: Kinetics and moving species

The growth kinetics is characterized and the moving species is identified for the formation of Ni₂Si by Rapid Thermal Annealing (RTA) of sequentially deposited Si and Ni films on a 100 Si substrate. The interfacial Ni₂Si layer grows as the square root of time, indicating that the suicide growth process is diffusion-limited. The activation energy is 1.25±0.2 eV in the RTA temperature range of 350–450° C. The results extend those of conventional steady-state furnace annealing quite fittingly, and a common activation energy of 1.3±0.2 eV is deduced from 225° to 450° C. The marker experiment shows that Ni is the dominant moving species during Ni₂Si formation by RTA, as is the case for furnace annealing. It is concluded that the two annealing techniques induce the same growth mechanisms in Ni₂Si formation.     

液晶的激光拉曼光谱研究——Ⅰ.十九种液晶的固相激光拉曼光谱

本文报道联苯、联苯酯、单酯、双酯、Schiff碱和氧化偶氮苯型十九种液晶化合物的固相激光拉曼光谱,讨论了2300～400 cm~(-1)范围内基团的特征谱带归属以及光谱与结构之间的关系.