Adsorption and diffusion of a Si adatom on the H/Si(1 1 1) surface: comparison with the H/Si(0 0 1) surface

Using a first-principles method, we investigate the adsorption and diffusion of a Si adatom on the H-terminated Si(1 1 1) substrate, which would be useful in understanding the initial stages of Si homoepitaxy using a H surfactant. The adatom substitutes H atom(s) to form a monohydride structure or a dihydride structure. In forming the monohydride structure, the energy barrier for H substitution is absent. The adatom migrates on the surface with alternating its chemical state between monohydride and dihydride. These behaviors of the adatom are quite similar to those on the H/Si(0 0 1)2 × 1 surface, despite the significant difference in the substrate structure between both orientations. The resulting diffusion barrier is 1.30 eV, which is also comparable to that on the H/Si(0 0 1)2 × 1 surface.     

Combined effects of substrate compliance and film compositional grading on strain relaxation in layer-by-layer semiconductor heteroepitaxy: the case of InAs/In0.50Ga0.50As/GaAs(1 1 1)A

A systematic theoretical analysis is presented of the combined effects of substrate compliance and film compositional grading on the relaxation of strain due to lattice mismatch in layer-by-layer semiconductor heteroepitaxy. The analysis is based on a combination of continuum elasticity theory and a novel atomistic simulation approach for modeling structural and compositional relaxation in layer-by-layer heteroepitaxial systems. Results are presented for InAs epitaxy on GaAs(1 1 1)A compliant substrates with some marginal film compositional grading that consists of one monolayer of In_0.50Ga_0.50As grown on the substrate surface prior to InAs growth. A parametric study is carried out over a wide range of substrate thicknesses. Interfacial stability with respect to misfit dislocation formation, the dependence on substrate thickness of a thermodynamic critical film thickness, and the completion of the coherent-to-semicoherent interfacial transition are examined in detail. In addition, the structural characteristics and compositional distribution of the corresponding semicoherent interfaces, the associated strain fields, as well as the film surface morphological characteristics are analyzed. Most importantly, the role of segregation at defects of a semicoherent interface in the thermodynamics of layer-by-layer heteroepitaxial growth is demonstrated. Our study shows that systematic combination of the mechanical behavior of thin compliant substrates with grading of the epitaxial film composition provides a very promising engineering strategy for strain relaxation in heteroepitaxy.     

An angle-scanned photoelectron diffraction (XPD) study of the growth and structure of ultrathin Fe films on Au(001)

We report a study of the growth and structure of Fe films on Au(001) at room temperature using angle-resolved photoelectron spectroscopy (ARXPS, AlK) and polar-scan photoelectron diffraction (XPD, AlK), exploiting the forward scattering (FS) enhancement of photoelectrons along atomic chains. The structure of the Fe 3p and 2p XPD polar diagrams and the development of the FS features with film growth evidence that Fe grows pseudomorphically in a nearly perfect layer-by-layer mode with bcc (001) structure rotated by 45° about the surface normal. At least up to 4 and probably up to 6 monolayers Fe, a segregated Au monolayer (surfactant layer) exists on top of the Fe film. This follows from the comparison of a simple model for the development of the substrate and film FS enhancements with the experimental data. By using angular shifts of the Fe 3p and Fe 2p bcc-[111] and bcc-[101] FS peaks we could determine the Au(on top)---Fe and Fe---Fe interlayer distances for 1 and 2 ML thick films to be 1.71(0.04) Å and 1.48(0.08) Å, respectively, showing that very thin films have a slightly expanded bcc structure (bct). The regular bcc angle positions are observed above 4–6 ML.     

Growth of ultrathin Pd films on Al(001) surfaces

High-energy ion backscattering spectroscopy (HEIS) and X-ray photoelectron spectroscopy (XPS) were used to determine the growth mode and the interface structure of ultrathin Pd films deposited on Al(001) surfaces at room temperature. Measured Al and Pd surface peak areas for MeV He⁺ ions incident normal to the surface show that Pd atoms intermix with and displace Al substrate atoms. The mixing continues for Pd coverages from 0–5 monolayers, at which point a Pd metal film begins to grow on the alloy surface. XPS measurements of the Pd 3d photopeaks show a chemical shift that is consistent with the formation of an AlPd-like compound during the mixing phase, and Pd metal thereafter. HEIS results further reveal that the alloyed overlayer as well as the Pd metal film have some degree of axial alignment with respect to the Al substrate. The XPS intensity measurements are consistent with this two-stage growth model.     

透射式GaAs光电阴极AlGaAs/GaAs外延层内应力的种类及其表征与测量

本文介绍了透射式GaAs光电阴极AlGaAs窗层和GaAs光电发射外延层内应力的种类及其表征方法和测量方法,另外还给出了相应的实例.     

ZnTe/GaAs(2 1 1)B heterojunction valence band discontinuity measured by X-ray photoelectron spectroscopy

Thin ZnTe layers were grown by molecular beam epitaxy on single crystal GaAs(2 1 1)B substrates. Reflection high energy electron diffraction monitored the deoxidation of substrate and entire growth process. Valence band offset was calculated with X-ray photoelectron spectroscopy. Also interface formation of the ZnTe/GaAs was studied. Analysis shows that interface is abrupt and calculated valance band offset is 0.25 ± 0.1 eV and indicates type I alignment. The experimental result agrees well with the theoretical predictions involving interface dipole effect as well as electron affinity rule.     

An interface study of crystalline Fe/Ge multilayers grown by molecular beam epitaxy

Fe/Ge multilayers were grown on single crystal Ge(0 0 1) substrates by molecular beam epitaxy. The structural, electronic and magnetic properties of Fe/Ge have been studied. The analysis shows that Fe grows in a layer-by-layer epitaxial growth mode on Ge(0 0 1) substrates at 150 °C and no intermixing has been observed. Growth of a crystalline Ge film at 150 °C on a single crystal Fe film has been observed. At this temperature Ge films grow by means of the island growth mode according to reflection of high energy electron diffraction patterns. Fe layers of 36 nm thickness, deposited at 150 °C on Ge(0 0 1) substrates, show two magnetization reversal values indicating the growth of Fe in two different crystal orientations. 36 nm thick Fe and Ge layers grown at 150 °C in Ge/Fe/Ge/Fe/Ge(0 0 1) sequence shows ferromagnetic behavior, however, the same structure grown at 200 °C shows paramagnetic behavior.     

Role of oxygen vacancies formed between top electrodes and epitaxial NiO films in bipolar resistance switching

We investigated bipolar resistance switching (RS) behavior of a top electrode/epitaxial NiO using Al and Pt as the top electrodes (TEs) and epitaxial NiO deposited at 500 °C (NiO-500) and 700 °C (NiO-700). We found that the contact between Al and Pt TEs and NiO-500 was a high resistance insulating contact, while the contact between the two TEs and NiO-700 was a low-resistance metallic contact. We also found that only NiO-500 with the Pt TE exhibited bipolar RS after an electroforming process. This study suggests that during the formation of the Pt/NiO-500 interface, the amount and behavior of oxygen at the interface seem to play the most important role in bipolar RS behavior. In order to improve the device performance, better control of oxygen content and its movement at the interface seems necessary.     

Ga液滴沉积量对GaAs/GaAs(001)同心量子双环形貌的影响

通过液滴外延法制备了GaAs/GaAs(001)同心量子双环(Concentric Quantum Double Rings, CQDRs),研究了Ga液滴沉积量对CQDRs的影响.研究结果发现:随着Ga液滴沉积量的增加,CQDRs密度降低,内环高度增高,外环高度降低,中心孔洞深度增加. CQDRs内环拟合结果表明,Ga液滴沉积量少于0.92ML(Monolayer, ML)时无法成环;外环拟合结果显示,在本实验条件下,形成外环的最小Ga液滴沉积量为3.1ML.拟合结果与实验结果一致,相关研究结果对液滴外延法制备GaAs同心量子双环具有指导意义.