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51.
V. Bruder-Hubscher F. LagardeM.J.F. Leroy C. CoughanowrF. Enguehard 《Analytica chimica acta》2002,451(2):285-295
The release of five elements (Cr, Cu, Mn, Pb and Zn) from a municipal solid waste incineration bottom ash (BA) under different extraction conditions has been investigated by performing the three-step sequential extraction procedure proposed by the Standards, Measurements and Testing Program of the European Union. A fourth step (strong acid attack) has been added in order to calculate the mass balance. The results of this study provide information on the potential mobility of the studied elements. Almost all of the Cr and part of the Mn are extracted with strong acid which indicates low potential mobility in the environment. Most of the Cu is extracted under oxidizing conditions. Pb and Zn are released under acidic condition, indicating the possibility of their mobilization by changes in pH. The reproducibility of the sequential extraction procedure is also discussed. 相似文献
52.
Poly(ethylene glycol) (PEG)-supported dendrimers have been synthesized using 2.4,6-trichloro-1,3,5-triazine (TCT) as dendrons and tris(hydroxymethyl)aminomethane as tinkers with high loading capacity, excellent solubility and thermal stability by divergent method. The new synthesized PEG-supported G2.0 dendrimer has 10 times as large functional group loading capacity as commercial PEG3400 with overall yield 44.0%. 相似文献
53.
Functional organic molecular materials and conjugated oligomers or polymers now allow the low-cost fabrication of thin films for insertion into new generations of electronic and optoelectronic devices. The performance of these devices relies on the understanding and optimization of several complementary processes. Our goal is to discuss the relationship between the molecular stacking structures and their optoelectronic properties that are of importance in all these areas. The concept of intermolecular interaction should be taken here in the special sense that is inter-dipole coupling. Specifically, we will address the impact of inter-dipole interaction between adjacent molecules in aggregate state on the solid-state emission properties. 相似文献
54.
Photocatalytic reactions occurring at semiconductor particles/solution interfaces can be applied to organic syntheses. In this review article, examples of photocatalytic syntheses of cyclic amino acids by suspended semiconductor particles, e.g., titanium(IV) oxide or cadmium(II) sulfide are introduced and interpreted. Different from the photocatalytic decomposition of pollutants under aerobic conditions, selective conversion of organic compounds can be driven by the photocatalytic reactions under deaerated conditions. 相似文献
55.
Partitioning adsorption properties of palladium cations on composite supports of MgO/-Al2O3 were explored by IR, TPR and catalytic performance tests for CO oxidation. The experimental results revealed that palladium cations in conventional impregnation was dispersed completely on -Al2O3, when the amount of MgO in the samples was lower than 5%. For the catalysts prepared by double impregnation, part of palladium dispersed on MgO phase due to the complexing action of EDTA. Pd–MgO interaction suppressed the reaction of CO oxidation. 相似文献
56.
The use of capillary column gas chromatography and gas chromatography/mass spectrometry for the analysis of a series of standard solutions (0.1 to 10 μg/ml) of 2,4,6-trinitrotoluene (TNT) and eight other nitroaromatic components was evaluated. The techniques included gas chromatography with electron capture detection (GC/ECD), full scan and selected ion monitoring gas chromatography/mass spectrometry with electron impact ionization (EI/FS and EI/SIM), full scan and selected ion monitoring gas chromatography/mass spectrometry with positive ion chemical ionization using methane reagent gas (PICI/FS and PICI/SIM), and full scan and selected ion monitoring gas chromatography/mass spectrometry with negative ion chemical ionization using methane reagent gas (NICI/FS and NICI/SIM). The performance of the techniques was comapared by determining the linear response range, precision, and detection limits of the analyses. 相似文献
57.
58.
Norio Manabe Kenichi Kawamura Masanao Ishikawa Shoutarou Suzuki Boping Liu Minoru Terano Hisayuki Nakatani 《Polymer Testing》2005,24(8):994-997
In this study, a novel potentiometric titration of hydroperoxide in degraded polypropylene (PP) is proposed. This titration is quite sensitive compared with the conventional ones such as UV and manual titrations, and its detection limit was about 2 meq/kg. The sensitivity was equal to that of molecular weight measurement by GPC for the degraded PP and, in addition, the volatilization behavior of the hydroperoxide could be detected. This titration was found to be very effective for the determination of PP degradation. 相似文献
59.
以碳纳米管(CNT)作为低铂载量膜电极(CCM)催化层(0.1 mgPt·cm-2)添加剂,研究了CNT的添加方式对催化层微观结构以及膜电极性能的影响.结果表明,与常规低铂载量催化层相比,在其表面喷涂一层CNT或将CNT均匀分散到Pt/C催化层中均有利于提升低铂载量膜电极的输出性能,在70℃和100%相对湿度条件下最高输出功率比常规低铂载量膜电极的0.522 W·cm-2分别提升了22.4%和60.0%,并且均匀分散添加方式优于分层添加方式.其原因在于分层添加CNT后改善了低铂催化层和气体扩散层之间的接触界面,降低了催化层与扩散层间的接触电阻,而均匀分散添加方式除了可降低界面接触电阻外,还显著改善了低铂催化层中的气体传输,大幅提升了Pt催化剂的利用效率,使得膜电极电化学反应电阻明显降低.进一步对均匀分散添加方式中CNT的载量进行优化,表明CNT添加量为37.5 μg·cm-2时电池输出性能最佳,70℃和100%相对湿度条件下的最大输出功率达到0.91 W·cm-2.本研究工作表明,将CNT均匀分散添加到催化层中是一种有效提升低铂载量膜电极性能的方法. 相似文献
60.
Guadalupe Fortuño 《Plasma Chemistry and Plasma Processing》1988,8(1):19-34
A parametric study of the etching of Si and SiO2 by reactive ion etching (RIE) was carried out to gain a better understanding of the etching mechanisms. The following fluorocarbons (FCs) were used in order to study the effect of the F-to-Cl atom ratio in the parent molecule to the plasma and the etching properties: CF4, CF3Cl, CF2Cl2, and CFCl3 (FC-14, FC-13, FC-12, and FC-11 respectively). The Si etch rate uniformity across the wafer as a function of the temperature of the wafer and the Si load, the optical emission as a function of the temperature of the load, the etch rate of SiO2 as a function of the sheath voltage, and the mass spectra for each of the FCs were measured. The temperature of the wafer and that of the surrounding Si load strongly influence the etch rate of Si, the uniformity of etching, and the optical emission of F, Cl, and CF2. The activation energy for the etching reaction of Si during CF4 RIE was measured. The etch rate of Si depends more strongly on the gas composition than on the sheath voltage; it seems to be dominated by ion-assisted chemical etching. The etching of photoresist shifted from chemical etching to ion-assisted chemical etching as a function of the F-to-Cl ratio and the sheath voltage. The etch rate of SiO2 depended more strongly on the sheath voltage than on the F-to-Cl ratio. 相似文献