Reaction of calcium and phosphate ions with titanium,zirconium, niobium,and tantalum

To understand the bone formation ability of constituent metal elements of new titanium alloys, titanium, zirconium, niobium, and tantalum, these metals were immersed in various electrolytes containing calcium and/or phosphate ions and characterized using X‐ray photoelectron spectroscopy. In addition, cathodic polarization of the metals in the electrolytes was performed to evaluate the stability of the surface oxide films on the metals in the electrolyte. The calcium phosphate layer formed on Ti in electrolytes containing calcium and phosphate ions is relatively protective against mass transfer throughout the layer. However, the zirconium phosphate layer formed on Zr is much more protective and stable than that on Ti. Therefore, calcium ions were not incorporated. Nb and Ta formed calcium phosphate, but the amount was smaller than that in Ti, because phosphates formed on Nb and Ta are somewhat protective and the incorporation of the calcium ion is inhibited. Titanium played the most important role in forming calcium phosphate, while zirconium inhibited the formation of calcium phosphate on titanium alloys. The control of bone formation is feasible by the design of titanium alloys. Copyright © 2015 John Wiley & Sons, Ltd.     

Selective and Sensitive Determination of Uranyl Ions in Complex Matrices by Ion Imprinted Polymers‐Based Electrochemical Sensor

We report on the design of a UO₂²⁺‐selective electrode based on the use of UO₂²⁺ imprinted polymer nanoparticles (IP‐NPs), and its application for the differential pulse adsorptive cathodic stripping voltammetry determination of uranyl ions. A carbon paste electrode was modified with the IP‐NPs, and differential pulse adsorptive cathodic stripping voltammetry was applied as the detection technique after open‐circuit sorption of UO₂²⁺ ions. The modified electrode responses to UO₂²⁺ was linear in the 0.1 µg L^?1 to 10 µg L^?1 and in the 0.01 mg L^?1 to 10 mg L^?1. The method detection limit of the sensor was 0.03 µg L^?1.     

Effect of pulsed bias on the properties of ZrN/TiZrN films deposited by a cathodic vacuum arc

ZrN/TiZrN multilayers are deposited by using the cathodic vacuum arc method with different substrate bias(from 0 to 800 V),using Ti and Zr plasma flows in residual N 2 atmosphere,combined with ion bombardment of sample surfaces.The effect of pulsed bias on the structure and properties of films is investigated.Microstructure of the coating is analyzed by X-ray diffraction(XRD),and scanning electron microscopy(SEM).In addition,nanohardness,Young’s modulus,and scratch tests are performed.The experimental results show that the films exhibit a nanoscale multilayer structure consisting of TiZrN and ZrN phases.Solid solutions are formed for component TiZrN films.The dominant preferred orientation of TiZrN films is(111) and(220).At a pulsed bias of 200 V,the nanohardness and the adhesion strength of the ZrN/TiZrN multilayer reach a maximum of 38 GPa,and 78 N,respectively.The ZrN/TiZrN multilayer demonstrates an enhanced nanohardness compared with binary TiN and ZrN films deposited under equivalent conditions.     

Cathodic Stripping Voltammetric Determination of Tellurium(IV) with in situ Plated Bismuth-Film Electrode

Abstract

A very sensitive and reliable method is proposed for the determination of tellurium(IV) [Te(IV)] by Osteryoung square-wave cathodic stripping voltammetry. This method is based on the reduction of Te(IV) with bismuth(III) onto an edge-plane pyrolytic graphite electrode, followed by a cathodic potential scan. The reduced Te gave a well-defined catalytic hydrogen wave at ?1200 mV vs. Ag/AgCl. The peak height of the catalytic wave was directly proportional to the initial Te(IV) concentration in the concentration ranges of 0.01–0.10 and 0.1–1.0 µg L^?1 with 30 s deposition time. A 3σ detection limit of 1.0 ng L^?1 Te(IV) was obtained with the same deposition time. The relative standard deviation was 3% on replicate runs (n = 5) for the determination of 0.1 µg L^?1 Te(IV). Analytical results of natural water samples demonstrate that the proposed method is applicable to the determination of traces of Te(IV).     

Cathodic Stripping Voltammetry Of Cerium

Abstract

The experimental conditions for the accumulation of cerium as insoluble Ce₃(PO₄)₄ on a platinum indicator electrode were studied. The determination of cerium down to 0.01% in oxides of other lanthanides is described.     

电沉积方式对纳米晶钴镀层的结构和摩擦学性能影响研究

采用不同电沉积方式制备了不同结构和晶粒尺寸的纳米晶钴(Co)镀层.采用扫描电镜和X-射线衍射仪分别分析了镀层表面形貌、晶相结构与晶粒尺寸.采用MV-2T显微硬度计测试镀层的硬度.最后采用UMT-3M多功能摩擦磨损试验机对镀层的摩擦和磨损性能进行了评价,并用扫描电镜对其磨损表面进行了观察分析.结果表明:电沉积方式对制备的纳米Co镀层的晶相结构、晶粒尺寸、镀层形貌和摩擦磨损性能影响显著;采用双脉冲制备的纳米Co镀层具有最小的晶粒尺寸、最高的硬度及较好的耐磨性能;采用单双脉冲混合电镀制备的纳米Co镀层表面针孔孔洞直径最小,结构最致密,耐磨性能最好.这些研究结果说明可通过优化电沉积方式来提高镀层的结构致密性,改善其硬度和耐磨性能.     

新型氧化铝模板自组装制备非晶碳纳米点阵列膜及其场发射性能研究

通过对阳极氧化铝(AAO)模板进行特殊扩孔处理,消除了AAO模板中带电阴离子对沉积碳离子的不良影响,利用磁过滤阴极弧等离子体沉积技术成功制备了非晶碳纳米尖点阵列膜.场发射扫描电镜(FESEM)分析表明,经过氧化和扩孔多步处理制备的AAO模板具有特殊的开口结构,制备的非晶碳纳米尖点阵列完整地复制了AAO模板的孔道阵列结构,纳米点排列整齐有序,直径约100nm,密度达1010cm-2,样品的场发射测试显示,非晶碳纳米点阵列具有良好的电子发射性能,发射电流为10mA/cm-2时的阈值电场为3.7V/μm.     

高质量非晶金刚石薄膜的制备研究

利用自行研制的磁过滤等离子体技术(FCAP),并创造性地对衬底施加低频率周期性负偏压,在室温下的单晶硅表面上制备了高质量的非晶金刚石薄膜。用扫描电子显微镜(SEM),原子力显微镜(AFM),红外吸收光谱(IR),纳米硬度计和摩擦试验仪对制备的非晶金刚石薄膜进行了结构和性能表征。实验结果表明:制备的非晶金刚石薄膜表面十分光滑,表面粗糙度仅为0.1nm;薄膜中sp3键成份高达70.7%,对应薄膜硬度达到74.8GPa,接近金刚石的硬度;薄膜摩擦系数在0.12~0.16之间。文中也讨论了偏压类型对沉积薄膜结构的影响。