铁分子Fe2的自旋极化效应

采用密度泛函方法(B3P86)对 Fe_2分子结构进行了优化.计算结果中未观察到自旋污染,基态波函数与高态波函数并未混杂,结果表明,Fe_2中有8个未配对电子,这些电子空间分布不同和自旋平行产生的自旋极化效应,使 Fe_2能量最低.计算结果表明,Fe_2分子的基态是~9∑_g~ ,并非~7Δ_u,进而表明 Fe_2的自旋平行效应比电子自旋配对效应要强.计算得到该分子基态的二阶、三阶和四阶力常数分别为1.4115×10~(-2)aJ/nm~2、-37.1751×10~3aJ/nm~3和 98.7596×10~4aJ/nm~4；光谱数据ω_eχ_e、B_e、α_e分别为0.3522、0.0345、 0.4963×10~(-4)cm~(-1)；离解能为3.5522eV,平衡键长为0.2137nm,振动频率为292.914cm~(-1)；并得到了 Murrel-Sorbie 函数.     

油水两液相一维非等温渗流的传递分析

在求解油水两液相非等温渗流的温度场、压力场基础上,以驱动功、驱动功率、驱动阻力、驱动速率为特征参数,对该过程进行(火用)传递分析。数值模拟的结果表明:含水通过降低油的相对渗透率、从而增大驱动阻力、减小驱动功率, 最终导致原油产量降低。     

355nm Nd∶YAG激光在H_2中的高效一级斯托克斯转换

对脉冲Nd∶YAG激光(355 nm)在H2和H2∶He-Ar混合气体中的受激拉曼散射(SRS)进行了研究。在0.5 MPa的氢气中,同时测量到从二级反斯托克斯到三级斯托克斯的多波长输出,其总转化效率达88%;而高压下只剩下一级和二级斯托克斯输出,其中二级斯托克斯最大能量转化效率达44%(对应量子效率为63%)。由于高级斯托克斯的竞争,纯氢气中一级斯托克斯的最大能量转换效率不超过43%。通过向3 MPa氢气中掺入2 MPaAr气后,很好地抑制了二级斯托克斯的产生,从而获得了能量转换效率高达71%(对应量子效率为83%)的一级斯托克斯输出。对四波混频和级联受激拉曼散射在氢气多级斯托克斯产生中的作用以及惰性气体对它们的影响进行了讨论。     

Quantum states in fabricating poly-Si films

The quantum states are presented in these processions of fabricating poly-Si films. Amorphous silicon films prepared by PECVD has been crystallized by conventional furnace annealing (FA) and rapid thermal annealing (RTA), respectively. It is found that the thin films grain size present quantum states with the increasing of the gas flow ratios of SiH₄, H₂ mixture, substrate temperatures, frequency power, annealing temperature and time.     

The polar ionosphere at Zhongshan station on May 11, 1999, the day the solar wind almost disappeared

The solar wind almost disappeared on May 11, 1999: the solar wind plasma density and dynamic pressure were less than 1cm⁻³ and 0.1 nPa respectively, while the interplanetary magnetic field was northward. The polar ionospheric data observed by the multi-instruments at Zhongshan Station in Antarctica on such special event day was compared with those of the control day (May 14). It was shown that geomagnetic activity was very quiet on May 11 at Zhongshan. The magnetic pulsation, which usually occurred at about magnetic noon, did not appear. The ionosphere was steady and stratified, and the F₂ layer spread very little. The critical frequency of day-side F₂ layer, f₀F₂, was larger than that of control day, and the peak of f₀F₂ appeared 2 hours earlier. The ionospheric drift velocity was less than usual. There were intensive auroral E_s appearing at magnetic noon. All this indicates that the polar ionosphere was extremely quiet and geomagnetic field was much more dipolar on May 11. There were some signatures of auroral substorm before midnight, such as the negative deviation of the geomagnetic H component, accompanied with auroral E_s and weak Pc3 pulsation.

     

Analysis of Aperture Field of Circular Groove Guide Horn Antenna by Using FD-TD Method

This paper presents an instance of using FD-TD method to analyze the aperture field of circular groove guide horn antenna. This process is one part of a hybrid method to solve the radiation field of aperture antenna. To verify the calculated aperture field the radiation pattern is computed from it and compared with the measured one. Good agreement is reached.     

CsNiCl3晶体的光谱精细结构、零场分裂参量及Jahn-Teller效应

应用不可约张量理论构造了三角对称晶场中3d²/3d⁸态离子的45阶可完全对角化的微扰哈密顿矩阵，研究了CsNiCl₃晶体的光谱精细结构、晶体结构、零场分裂参量、Jahn-Telller效应以及自旋单重态对Ni²⁺离子基态能级的影响，理论与实验相符合.在此基础上，进一步研究了以前工作中被忽略的自旋-自旋耦合作用和Trees修正对CsNiCl₃晶体的光谱精细结构和零场分裂参量的影响，发现有四种机理会影响零场分裂参量：1)自旋-轨道耦合机理，2)自旋-自旋耦合机理；3)自旋-轨道与自旋-自旋联合耦合机理；4)自旋-轨道与Trees修正联合耦合机理，其中自旋-轨道耦合机理是最主要的，其他三种机理也是不可忽略的. 关键词： 基态能级 精细结构 零场分裂 自旋-自旋耦合     

含外规范场和动力学费米子自能的狄拉克算符及费米子凝聚

将非阿贝尔规范理论中狄拉克算符行列式的计算从传统的只能含有硬费米子质量项的情况推广到可以含有动量相关的费米子自能的情况，并且行列式与费米子凝聚的计算都被推广到使之能够含有任意的外规范场. 关键词： 费米子自能 外规范场 狄拉克算符的行列式 费米子凝聚     

磁各向异性色散介质散射的Pad啨时域有限差分方法分析

根据矩阵Pad啨逼近理论,把磁化色散介质的相对磁导率张量表示成以jω为自变量的矩阵函数形式,用/t代替jω后过渡到时域,再引入离散时域移位算子代替时间微分算子.进而导出磁化色散介质中的磁感应强度B和磁场强度H在离散时域的色散关系,并将其具体应用于旋磁介质,得到了这种磁化色散介质的Pad啨时域有限差分方法的递推表达式.作为验证,用这种方法计算了磁化铁氧体球的后向雷达散射截面,所得结果与文献结果一致.理论推导及算例表明,该方法是正确和有效的.     

场发射平板显示高低压电平转换电路

提出适用于场发射高压驱动的高低压电平转换电路设计及性能分析。通过模拟,此电路可以在100V的驱动工作电压以及10mA的驱动电流条件下安全工作,最高工作频率可达20MH_z。在50pF输出负载下上升时间和下降时间分别为14,25ns。同时分析了高压CMOS器件与0.8μm标准CMOS工艺兼容过程中的厚栅氧化对于低压器件及高压N管的阈值特性影响。