高单酯含量的甲基丙烯酸-β-羟乙酯磷酸酯的催化合成

采用浸渍法将磷钨酸及其盐[TEAH]₃PW₁₂O₄₀负载到活性炭上制备出HPW/AC和TEAPW/AC 2个系列的催化剂,并用IR、XRD、N₂-吸附脱附和NH₃-TPD等技术手段对它们的结构和酸性进行了表征。进一步,以P₂O₅为磷酸化剂考察了上述催化剂在功能性磷酸酯-甲基丙烯酸-β-羟乙酯磷酸酯合成中的催化性能。结果显示,上述催化剂在该酯化反应中不仅具有很高的活性,而且由于催化剂的微孔结构抑制了双、三酯的生成,明显提高了单酯的选择性。在优化的反应条件和催化剂上,酯化率可达94%,单酯选择性可达95%。且催化剂高度稳定,可以重复使用。该催化剂和催化工艺不仅克服了磷酸酯合成中使用含氯原料的缺点,而且大大提高了产物中单酯的含量。     

Influence of air pressure on the performance of plasma synthetic jet actuator

Plasma synthetic jet actuator(PSJA) has a wide application prospect in the high-speed flow control field for its high jet velocity.In this paper,the influence of the air pressure on the performance of a two-electrode PSJA is investigated by the schlieren method in a large range from 7 k Pa to 100 k Pa.The energy consumed by the PSJA is roughly the same for all the pressure levels.Traces of the precursor shock wave velocity and the jet front velocity vary a lot for different pressures.The precursor shock wave velocity first decreases gradually and then remains at 345 m/s as the air pressure increases.The peak jet front velocity always appears at the first appearance of a jet,and it decreases gradually with the increase of the air pressure.A maximum precursor shock wave velocity of 520 m/s and a maximum jet front velocity of 440 m/s are observed at the pressure of 7 k Pa.The averaged jet velocity in one period ranges from 44 m/s to 54 m/s for all air pressures,and it drops with the rising of the air pressure.High velocities of the precursor shock wave and the jet front indicate that this type of PSJA can still be used to influence the high-speed flow field at 7 k Pa.     

Electric and plasma characteristics of RF discharge plasma actuation under varying pressures

The electric and plasma characteristics of RF discharge plasma actuation under varying pressure have been investigated experimentally. As the pressure increases, the shapes of charge–voltage Lissajous curves vary, and the discharge energy increases. The emission spectra show significant difference as the pressure varies. When the pressure is 1000 Pa,the electron temperature is estimated to be 4.139 e V, the electron density and the vibrational temperature of plasma are peak4.71×10~(11)cm~(-3) and 1.27 e V, respectively. The ratio of spectral lines I391.4/peak I380.5which describes the electron temperature hardly changes when the pressure varies between 5000–30000 Pa, while it increases remarkably with the pressure below 5000 Pa, indicating a transition from filamentary discharge to glow discharge. The characteristics of emission spectrum are obviously influenced by the loading power. With more loading power, both of the illumination and emission spectrum intensity increase at 10000 Pa. The pin–pin electrode RF discharge is arc-like at power higher than 33 W, which results in a macroscopic air temperature increase.     

Electrical and optical characteristics of the radio frequency surface dielectric barrier discharge plasma actuation

Electrical characteristics and optical emission spectrum of the radio frequency(RF) surface dielectric barrier discharge(SDBD) plasma actuation are investigated experimentally in this paper. Influences of operating pressure, duty cycle and load power on the discharge are analyzed. When the operating pressure reaches 30 kPa, the discharge energy calculated from the Charge–Voltage(Q–V) Lissajous figure increases significantly, while the effective capacitance decreases remarkably. As the duty cycle of the applied voltage increases, the voltage–current waveforms, the area of Q–V loop and the capacity show no distinct changes. Below 40 W, effective capacitance increases with the increase of load power, but it almost remains unchanged when load power is between 40 W and 95 W. The relative intensity I_(391.4)~peak/I_(380.5)~peak changes little as the operating pressure varies from 4 kPa to 100 kPa, while it rises evidently with the pressure below 4 kPa, which indicates that the RF discharge mode shifts from filamentary discharge to glow discharge at around 4 kPa. With the increase of load power, the relative intensity I_(391.4)~peak/I_(380.5)~peak rises evidently. Additionally, the relative intensity I_(371.1)~peak/I_(380.5)~peak is insensitive to the pressure,the duty cycle, and the load power.     

Modeling and optimization of the multichannel spark discharge

This paper reports a novel analytic model of this multichannel spark discharge, considering the delay time in the breakdown process, the electric transforming of the discharge channel from a capacitor to a resistor induced by the air breakdown, and the varying plasma resistance in the discharge process. The good agreement between the experimental and the simulated results validated the accuracy of this model. Based on this model, the influence of the circuit parameters on the maximum discharge channel number(MDCN) is investigated. Both the input voltage amplitude and the breakdown voltage threshold of each discharge channel play a critical role. With the increase of the input voltage and the decrease of the breakdown voltage, the MCDN increases almost linearly. With the increase of the discharge capacitance, the MDCN first rises and then remains almost constant. With the increase of the circuit inductance, the MDCN increases slowly but decreases quickly when the inductance increases over a certain value. There is an optimal value of the capacitor connected to the discharge channel corresponding to the MDCN. Finally, based on these results, to shorten the discharge time, a modified multichannel discharge circuit is developed and validated by the experiment. With only 6-kV input voltage, 31-channels discharge is achieved. The breakdown voltage of each electrode gap is larger than 3 kV. The modified discharge circuit is certain to be widely used in the PSJA flow control field.     

基于ARM的嵌入式图像识别检测系统的设计

图像识别的主要目的是使用计算机作为工具对目标图像进行处理、解析与应用,通过数据分析检测出具有不同特征的目标和对象,发展至今其已成为了人工智能的基础。本文基于ARM嵌入式芯片提出了一种结合尺度不变特征变换匹配算法的图像识别检测系统,系统硬件部分采用模块化设计的思想以提高系统的兼容性,分为图像获取、数据采集、数据存储、图像识别等模块;软件部分采用斑点检测匹配匹配算法进行图像识别以提高图像识别速度与精度。实验结果表明所设计的系统具有识别速度快、精度高、可靠性高、故障少的特点。     

激波/边界层干扰对等离子体合成射流的响应特性

利用高速纹影系统和数值模拟方法研究了激波/边界层干扰对逆流喷射的等离子体合成射流的响应特性,并揭示了流动控制机理.实验在来流马赫数Ma=3.1的风洞中进行,测试模型采用钝头体和压缩斜坡的组合模型,等离子体合成射流激励器安装在钝头体头部.纹影系统捕捉了放电频率为f=1 kHz和f=3 kHz的激励对附体激波形态和分离激波运动的控制效果.等离子体合成射流使压缩斜坡激波/边界层干扰区域的起始点向下游移动,分离泡尺寸减小,附体激波强度减弱,发生弯曲,再附点移向上游,与此同时分离激波向附体激波逼近.与f=3 kHz激励相比,f=1 kHz激励的射流流量更大,对激波/边界层干扰的影响范围更广、控制效果更好.通过数值模拟,揭示了射流与来流相互作用对下游流场的作用机理:射流与来流相互作用诱导出大尺度旋涡,大尺度旋涡耗散发展增强了近壁面流场的湍流度;压缩斜坡上游近壁面的流场性质发生变化,进而导致了压缩斜坡激波/边界层干扰区域流动的变化.     

双掺质KTP晶体倍频效应的研究

采用激光粉末倍频法,对掺入相同浓度Nb5+离子(1;)和相同浓度Nd3+,Yb3+,Tm3+等稀土离子(3;)的KTP-K6体系中生长的Nb:Nd:KTP,Nb:Yb:KTP和Nb:Tm:KTP双掺晶体进行了粉末倍频效应测试.结果发现,3种双掺质KTP晶体的粉末倍频效应较之KTP均有所提高.     

偶数阶微分方程的两点边值问题

利用对称双线性型引理和Ｓｃｈａｕｄｅｒ不动点定理,本文对一类偶数阶非线性微分方程给出存在唯一性定理．     

掺质KTP型晶体生长与性能研究

采用高温溶液法生长了含掺质离子Zr4+,Ga3+的单掺和双掺系列KTP型晶体.晶体生长过程中发现Ga掺入溶液后,体系更加稳定,容易生长出光学质量的晶体;而Zr掺入溶液后体系稳定性降低,晶体生长较困难.用等离子体发射光谱测定了各掺质离子在晶体中的含量,计算出掺质离子的分配系数,发现生长体系中Ga无论是在高掺入量还是低掺入量的情况下,Ga在晶体中的含量都十分稳定.测定了晶体的晶胞参数、紫外-可见-红外吸收光谱,测定的结果发现,晶胞参数均变化不大,在吸收光谱中Ga:KTP在可见光谱区有少量的光吸收,而Zr:KTP晶体是无色透明的.通过粉末倍频实验发现,Zr的掺入有助于晶体倍频转换效率的提高.通过晶体c轴向离子电导率的测试发现,Ga的掺入使c轴向电导率降低了大约3个数量级.双掺Zr和Ga的晶体是性能更为优良的掺质KTP型晶体.