介质阻挡放电和CuZSM-5结合体系中等离子体对C2H4的作用

采用吸附、程序升温脱附及氧化和发射光谱等技术研究了介质阻挡放电对气相和催化剂表面吸附乙烯的作用. 实验表明, 介质阻挡放电等离子体能脱附催化剂表面吸附物种(如CO2和H2O等), 并引发表面化学反应生成新物种(如在等离子体作用下C2H4和O2生成CO2和H2O); 改变催化剂表面积碳化合物结构, 并降低其起燃点; 引发气相中乙烯发生反应生成中间物种或碎片(如CN和CH等). 在富氧体系NO/O2/N2中加入C2H4, 能使介质阻挡放电等离子体和CuZSM-5“一段法”结合体系产生协同效应, 提高NOx转化率. 该协同效应的产生与等离子体在气相及催化剂表面引发化学反应, 产生参与NOx还原反应的新稳态物种和短寿命高能活性物种有关.     

低温等离子体转化NO/O2/N2气氛中NO的实验研究

通过建立低温等离子体实验系统,研究了介质阻挡放电型低温等离子体反应器作用于NO/O2/N2混合气体系时,NO,O2初始浓度对NO的转化效率的影响以及NOx,O3浓度随能量密度的变化关系.低温等离子体作用于NO/O2/N2混合气体系时,NO同时发生氧化还原反应,氧化反应占主导地位,大部分NO转化为NO2;NO转化率随O2,NO初始浓度增大而降低,能量密度在450～600 J/L时转化率较高;产生的O3浓度随能量密度的增大呈先增后减的趋势.     

介质阻挡放电与 CuZSM-5 结合方式对脱除 NOx 的影响

 研究了介质阻挡放电 (DBD) 与 CuZSM-5 结合方式, 即 DBD 和 CuZSM-5 两段分置 (两段法) 或将 CuZSM-5 放入 DBD 区 (一段法), 对脱除氮氧化物的影响. 结果表明, 在 NO/N2 或 NO/C2H4/N2 无氧体系中, DBD 与 CuZSM-5 结合产生的协同效应很小; 在 NO/O2/N2 富氧体系中, DBD 与 CuZSM-5 结合导致氮氧化物转化率下降; 而在 NO/C2H4/O2 /N2 富氧体系中, 在 250 ºC, 空速 12 000 h1, 输入放电能量密度 (Ein) 155 J/L 的条件下, 单纯催化、单纯等离子体放电、一段法和两段法时氮氧化物转化率分别为 39%, 1.5%, 79% 和 52%. 两段法产生了中等程度的协同效应, 主要是第一段等离子体放电产生新稳态物种 (如 NO2, CO 和 CO2 等) 起作用; 而一段法产生的协同效应较大, 主要是由于等离子体放电产生的新稳态物种和激发态短寿命物种 (如 N2*, NO*, CH 和 CN 等) 共同起作用.     

介质阻挡放电等离子体与吸附在CuZSM-5上的NO或NO/O2的相互作用

采用吸附和程序升温脱附(TPD)技术研究了介质阻挡放电等离子体对CuZSM-5催化剂上吸附的氮氧化物作用. 实验表明, 介质阻挡放电等离子体使催化剂表面吸附的NO及Cu活性位上吸附的NOx物种脱附, 并引发表面化学反应生成新的氮氧化物. 对于NO/N2体系, 介质阻挡放电等离子体与吸附在CuZSM-5上NO作用, 主要生成N2O和O2. 在富氧体系NO/O2/N2, 则生成较大量的N2O、NO2和NO. 等离子体预处理活性下降的CuZSM-5, 可明显提高其催化分解NO活性. 对比有或无介质阻挡放电等离子体预处理NO或NO/O2饱和吸附的CuZSM-5上的NO-TPD结果表明, 等离子体提高催化剂活性的原因与其使催化剂Cu活性位上吸附的NOx物种脱附有关.     

介质阻挡放电等离子体与吸附在CuZSM-5上的NO或NO/O2的相互作用

采用吸附和程序升温脱附(TPD)技术研究了介质阻挡放电等离子体对CuZSM-5催化剂上吸附的氮氧化物作用.实验表明,介质阻挡放电等离子体使催化剂表面吸附的NO及Cu活性位上吸附的NOx物种脱附,并引发表面化学反应生成新的氮氧化物.对于NO/N2体系,介质阻挡放电等离子体与吸附在CuZSM-5上NO作用,主要生成N2O和O2.在富氧体系NO/O2/N2,则生成较大量的N2O、NO2和NO.等离子体预处理活性下降的CuZSM-5,可明显提高其催化分解NO活性.对比有或无介质阻挡放电等离子体预处理NO或NO/O2饱和吸附的CuZSM-5上的NO-TPD结果表明,等离子体提高催化剂活性的原因与其使催化剂Cu活性位上吸附的NOx物种脱附有关.     

介质阻挡放电等离子体脱除氮氧化物的发射光谱研究

在大气压下, NO/N2体系中, 利用发射光谱技术对50 Hz和5 kHz交流介质阻挡放电等离子体在200～900 nm范围内进行了诊断. 在632、674.5、715.5和742 nm等处测得了N原子的谱线. 利用化学发光法NOx分析仪, 模块式红外吸收气体分析检测仪, 大气压下直连质谱多种检测手段对放电前后的稳定物种进行了分析, 观察到O2的生成. 初步讨论了无氧条件下介质阻挡放电等离子体中NO脱除的反应机制.     

温和条件下Fe（NO3）3／4-OH-TEMPO催化需氧氧化醇制备羰基化合物

以Fe(NO3)3·9H2O为助剂与廉价的有机小分子催化剂 4-羟基-2,2,6,6-四甲基哌啶-N-氧自由基(4-OH-TEMPO)组成催化体系.考察了该催化剂体系上分子氧驱动的氧化含有C=C, N, O和S杂原子的较宽底物范围的伯醇和仲醇氧化生成相应的醛或酮. 结果表明,该反应可在室温条件下在空气中进行,对目的产物的选择性高. 探讨了Fe(NO3)3/4-OH-TEMPO催化氧化醇的反应机理.     

添加气对非平衡等离子体转化低碳烷烃的影响

在常压下,研究了添加气的种类(N2,He,Ar,H2,NH3,CO和CO2)对介质阻挡放电低碳烷烃(甲烷、乙烷和丙烷)转化制低碳烯烃的影响.结果表明,以甲烷或乙烷为原料时,N2,He,Ar和CO的引入有利于提高原料的转化率和总烯烃的选择性;而CO2,H2和NH3的引入对甲烷、乙烷的转化率无明显影响,但H2和NH3的引入会使总烯烃的选择性显著降低.以丙烷为原料时,所研究的添加气均可提高丙烷的转化率,而只有CO的引入可提高总烯烃选择性.综上所述,80%(摩尔分数)CO添加量最有利于低碳烷烃转化成低碳烯烃,对应的甲烷、乙烷和丙烷的转化率分别提高了14.4%,17.6%和42.8%,总烯烃的选择性分别提高了19.9%,25.0%和11.9%.以CH4为例,通过对放电电流波形和等离子体区物种的发射光谱(OES)研究发现,引入CO能显著增加等离子体的电子密度,并且体系中出现激发态O*物种(777.5和844.7 nm),这种O*物种能够促进C—H键的断裂,有利于烯烃的生成.因此,等离子体区电子密度的增加和激发态O*物种的出现可能是CH4-CO体系中CH4有效转化的主要原因.     

介质阻挡放电条件下甲烷水蒸气重整和部分氧化反应制氢

构建了CH_4-O_2-N_2-H_2O反应体系,对介质阻挡放电条件下甲烷水蒸气重整和部分氧化制氢反应过程进行了研究,考察了H2O/CH4物质的量比、O_2/N_2物质的量比、气体总流量、放电电压及放电频率等参数对制氢效率的影响,并基于发射光谱原位诊断法分析了反应机理。结果表明,甲烷转化率和氢气产率随着H_2O/CH_4物质的量比、O_2/N_2物质的量比和放电电压的增加而增加,而随着反应气体总流量的增加而减小,随着放电频率的增加先增大后减小,在9.8 kHz处取得最大值。在H_2O/CH_4物质的量比1.82、O_2/N_2物质的量比2.1、总流量136 mL/min、放电电压18.6 kV及放电频率9.8 kHz的条件下,甲烷转化率与氢气产率分别达47.45%和21.33%。甲烷和水蒸气等反应物分子通过电子解离产生CH_x·、H·、OH·、O·等自由基,进而通过自由基间的碰撞反应生成H_2;H·自由基一方面来源于CH_4的电子解离;另一方面来源于水蒸气一次解离以及OH·的进一步离解。部分氧化反应主要表现为O_2电子解离形成的O·自由基以及水蒸气一次反应产物OH·自由基进一步离解形成的O·自由基对CH_2·自由基的氧化。     

非平衡等离子体放电模式及反应器结构对氨气分解制氢的影响

在常压下研究了不同等离子体放电模式及反应器结构对氨分解制氢反应的影响.实验中调节反应器结构分别产生了介质阻挡放电和交流弧放电两种放电模式.通过对两种放电模式的放电图像、电压-电流波形和氨分解过程中等离子体区活性物种的发射光谱(OES)研究发现,与介质阻挡放电相比,交流弧放电为局部强放电,具有更高的电源效率和电子密度.因此,在介质阻挡放电中氨气分子大部分通过生成电子激发态物种NH3*,再与载能电子碰撞断裂N―H键进行氨分解反应;而在交流弧放电中载能电子具有更高的平均电子能量,可直接断裂氨气分子的N―H键生成NH2和NH等高活性物种,促进氨分解反应的进行.结果表明,交流弧放电的氨分解效果要明显优于介质阻挡放电.在交流弧放电模式下不同类型反应器对氨气分解转化率由高到低的顺序为:管-管管-板针-板板-板.在输入功率为30 W,气隙间距为6 mm时,管-管交流弧放电的氨气转化率达到60%左右,而板-板介质阻挡放电的氨气转化率仅为4%.     

甲烷氧等离子体直接合成过氧化氢

本文利用介质阻挡放电(DBD)方法, 在室温和常压下将甲烷和氧气的混合气体进行等离子体活化, 通过甲烷和氧等离子体直接气相反应高收率合成H2O2. 该方法能有效克服氢氧直接法合成H2O2受到原料气配比严格限制的缺点.     

Phenol production in benzene/air plasmas at atmospheric pressure. Role of radical and ionic routes

Benzene can be efficiently converted into phenol when it is treated by either corona or dielectric barrier discharge (DBD) plasmas operating at atmospheric pressure in air or mixtures of N(2) and O(2). Phenol produced by corona discharge in an atmospheric pressure chemical ionization source (APCI) has been detected as the corresponding radical cation C(6)H(5)OH(+*) at m/z 94 by an ion trap mass spectrometer. On the other hand, phenol has been observed also as neutral product by gas chromatography-mass spectrometry analysis (GC-MS) after treatment in a DBD plasma. Experiments aimed at shading light on the elementary processes responsible for benzene oxidation were carried out (i) by changing the composition of the gas in the corona discharge source; (ii) by using isotopically labeled reagents; and (iii) by investigating some relevant ion-molecule reactions (i.e. C(6)H(6)(+*) + O(2), C(6)H(5)(+) + O(2)) via selected guided ion beam measurements and with the help of ab initio calculations. The results of our approach show that ionic mechanisms do not play a significant role in phenol production, which can be better explained by radical reactions resulting in oxygen addition to the benzene ring followed by 1,2 H transfer.     

Removal of NO in NO/N2, NO/N2/O2, NO/CH4/N2, and NO/CH4/O2/N2 systems by flowing microwave discharges

In this paper, continuing previous work, we report on experiments carried out to investigate the removal of NO from simulated flue gas in nonthermal plasmas. The plasma-induced decomposition of small concentrations of NO in N2 used as the carrier gas and O2 and CH4 as minority components has been studied in a surface wave discharge induced with a surfatron launcher. The reaction products and efficiency have been monitored by mass spectrometry as a function of the composition of the mixture. NO is effectively decomposed into N2 and O2 even in the presence of O2, provided always that enough CH4 is also present in the mixture. Other majority products of the plasma reactions under these conditions are NH3, CO, and H2. In the absence of O2, decomposition of NO also occurs, although in that case HCN accompanies the other reaction products as a majority component. The plasma for the different reaction mixtures has been characterized by optical emission spectroscopy. Intermediate excited species of NO*, C*, CN*, NH*, and CH* have been monitored depending on the gas mixture. The type of species detected and their evolution with the gas composition are in agreement with the reaction products detected in each case. The observations by mass spectrometry and optical emission spectroscopy are in agreement with the kinetic reaction models available in literature for simple plasma reactions in simple reaction mixtures.     

Conversion of NO in NO/N2, NO/O2/N2, NO/C2H4/N2 and NO/C2H4/O2/N2 Systems by Dielectric Barrier Discharge Plasmas

An experimental study on the conversion of NO in the NO/N₂, NO/O₂/N₂, NO/C₂H₄/N₂ and NO/C₂H₄/O₂/N₂ systems has been carried out using dielectric barrier discharge (DBD) plasmas at atmospheric pressure. In the NO/N₂ system, NO decomposition to N₂ and O₂ is the dominating reaction; NO conversion to NO₂ is less significant. O₂ produced from NO decomposition was detected by an on-line mass spectrometer. With the increase of NO initial concentration, the concentration of O₂ produced decreases at 298 K, but slightly increases at 523 K. In the NO/O₂/N₂ system, NO is mainly oxidized to NO₂, but NO conversion becomes very low at 523 K and over 1.6% of O₂. In the NO/C₂H₄/N₂ system, NO is reduced to N₂ with about the same NO conversion as that in the NO/N₂ system but without NO₂ formation. In the NO/C₂H₄/O₂/N₂ system, the oxidation of NO to NO₂ is dramatically promoted. At 523 K, with the increase of the energy density, NO conversion increases rapidly first, and then almost stabilizes at 93–91% of NO conversion with 61–55% of NO₂ selectivity in the energy density range of 317–550 J L⁻¹. It finally decreases gradually at high energy density. A negligible amount of N₂O is formed in the above four systems. Of the four systems studied, NO conversion and NO₂ selectivity of the NO/C₂H₄/O₂/N₂ system are the highest, and NO/O₂/C₂H₄/N₂ system has the lowest electrical energy consumption per NO molecule converted.     

Optical study of diffuse bi-directional nanosecond pulsed dielectric barrier discharge in nitrogen

In this study, a bi-directional high voltage pulse with 20 ns rising time is employed to generate diffuse glow-like dielectric barrier discharge plasma with very low gas temperature in N2 using needle-plate electrode configuration at atmospheric pressure. Both the diffuse nanosecond pulsed dielectric barrier discharge images and the optical emission spectra of the discharge are recorded successfully under severe electromagnetic interference. The effects of pulse peak voltage, pulse repetition rate, and the concentrations of Ar and O2 on the emission intensities of NO (A2Σ→X2Π), OH (A2Σ→X2Π, 0-0), N2 (C3Πu→B3Πg, 0-0, 337.1 nm), and N2+ (B2Σu+→X2Σg+, 0-0, 391.4 nm) are investigated. The effects of the concentrations of Ar and O2 on the discharge diffuse performance are also studied. It is found that the emission intensities of NO (A2Σ→X2Π), OH (A2Σ→X2Π, 0-0), N2 (C3Πu→B3Πg, 0-0, 337.1 nm), and N2+ (B2Σu+→X2Σg+, 0-0, 391.4 nm) rise with increasing pulse peak voltage, pulse repetition rate, and the concentration of Ar, but decrease with increasing the concentration of O2. The main physicochemical processes involved are also discussed.     

Plasma chemistry of NO in complex gas mixtures excited with a surfatron launcher

The plasma chemistry of NO has been investigated in gas mixtures with oxygen and/or hydrocarbon and Ar as carrier gas. Surface wave discharges operating at microwave frequencies have been used for this study. The different plasma reactions have been analyzed for a pressure range between 30 and 75 Torr. Differences in product concentration and/or reaction yields smaller than 10% were found as a function of this parameter. The following gas mixtures have been considered for investigation: Ar/NO, Ar/NO/O2, Ar/NO/CH4, Ar/CH4/O2, Ar/NO/CH4/O2. It is found that NO decomposes into N2 and O2, whereas other products such as CO, H2, and H2O are also formed when CH4 and O2 are present in the reaction mixture. Depending on the working conditions, other minority products such as HCN, CO2, and C2 or higher hydrocarbons have been also detected. The reaction of an Ar/NO plasma with deposits of solid carbon has also been studied. The experiments have provided useful information with respect to the possible removal of soot particles by this type of plasma. It has been shown that carbon deposits are progressively burned off by interaction with the plasma, and practically 100% decomposition of NO was found. Plasma intermediate species have been studied by optical emission spectroscopy (OES). Bands and/or peaks due to N2*, NO*, OH*, C2*, CN*, CH*, or H* were detected with different relative intensities depending on the gas mixture. From the analysis of both the reaction products and efficiency and the type of intermediate species detected by OES, different plasma reactions and processes are proposed to describe the plasma chemistry of NO in each particular mixture of gases. The results obtained provide interesting insights about the plasma removal of NO in real gas exhausts.