低含量铁掺杂纳米TiO2薄膜的制备及其抗菌机理研究

采用溶胶凝胶-浸渍提拉法,制备了玻璃基底上生长的Fe/TiO₂薄膜.利用XRD、XPS、AFM等对样品进行表征,研究了铁掺杂对TiO₂薄膜晶体结构和表面形貌的影响,并研究了不同掺铁量TiO₂薄膜对大肠杆菌的抗菌性能.结果表明,铁掺杂TiO₂薄膜的抗菌性能均优于纯TiO₂薄膜,其中掺铁量为0.1%时薄膜的抗菌性能最佳,高达98%.     

基于无机纳米材料的抗菌抗病毒功能涂层和薄膜

COVID-19在全球的大流行对人类的健康生活和社会的正常运行都造成了严重的危害. 阻断致病微生物通过受污染表面与人类间接接触传播, 或者避免与其直接接触是保护我们免受伤害的主要方法. 目前的解决措施包括设计开发抗菌抗病毒表面涂层和研发由自清洁薄膜或织物制成的个人防护设备. 综述了近年来几种研究广泛的金属、金属氧化物、金属有机框架材料等用于抗菌抗病毒涂层或薄膜的工作, 对其作用机制和微生物灭活效果进行了总结讨论, 并且评估了其本身的毒性以及实际应用的局限性, 最后就抗菌抗病毒涂层和薄膜开发的挑战和新兴研究方向提出了未来展望.     

低银量掺杂TiO2纳米片薄膜的制备及其抗菌性能研究

采用溶胶凝胶和溶剂热两步法,在玻璃基底上垂直生长Ag-TiO₂纳米片薄膜.采用SEM、TEM、XRD、XPS等对样品进行表征,研究了不同前躯体浓度对Ag-TiO₂纳米片生长的影响,并检测了Ag-TiO₂纳米片薄膜的抗菌性能.结果表明,所获得的低银量掺杂改性的二氧化钛纳米片薄膜在紫外灯照射和黑暗条件下,对大肠杆菌和金黄色葡萄球菌均具有优异的抗菌性能.     

基于季铵盐改性SiO2空心球的抗菌/减反增透双功能薄膜的制备和研究

兼具减反增透和抗菌性能的双功能薄膜在医疗健康领域具有很重要的应用前景.然而，关于此类薄膜的研究尚且屈指可数.本工作选取最长烷基链为C₁₈的季铵盐为抗菌剂，通过化学键合方式改性酸催化SiO₂溶胶液并与空心球纳米粒子溶胶液复合.然后，采用浸涂法制备出具备抗菌和减反增透双功能的薄膜.通过调节上述两种溶胶液的混合比例，对薄膜的光学性能进行了优化.其中，涂覆最优薄膜的玻璃基底在可见光区域内（400~800 nm）展现出优异的透光性能（T_max=99.2%，T_ave=98.6%）.该方法操作简单，无需经过高温热处理，易于大面积制备，具有潜在的应用前景.     

Ag/AgNO3修饰钛酸盐纳米管薄膜的制备及性能

采用水热法合成了钛酸盐纳米管薄膜,通过光催化还原反应将Ag/AgNO3纳米粒子负载其上,制得Ag/AgNO3修饰钛酸盐纳米管薄膜,并对其形貌、结构和化学组成进行了表征.Ag/AgNO3修饰后钛酸盐纳米管薄膜的性能发生了明显变化,不仅展示出光致变色的性能,而且光催化活性得到显著提高,此外,纳米管表面产生出的活泼自由基协同具有强氧化能力的Ag+能有效抑制或杀灭细菌,使薄膜具有优异的抗菌性能.     

聚乳酸接枝丙烯酰胺制备抗菌材料

采用自由基接枝聚合法,以过氧化苯甲酰为引发剂,制备聚乳酸接枝丙烯酰胺共聚物;对接枝共聚物进行氯化,制备表面含卤胺基团的抗菌聚乳酸高分子材料.考察了丙烯酰胺含量、引发剂浓度、聚合温度、聚合时间等对接枝率的影响.采用核磁共振氢谱、红外光谱等对接枝聚合物的分子结构进行了表征;利用溶液浇铸法,制备抗菌聚乳酸薄膜,并对薄膜的抗菌性能等进行了研究.结果表明:实验获得的卤胺接枝聚乳酸对大肠杆菌抗菌性能明显.     

石墨烯基纳米材料在抗菌涂层中的研究进展

抗菌涂料广泛应用于医疗保健、食品保鲜和医院消毒等多个行业领域。石墨烯是目前最受欢迎的纳米材料之一,在抗菌方面细菌表现出低耐药性,同时对哺乳动物细胞有较小的细胞毒性。石墨烯从物理和化学两个层面协同发挥抑菌效果,物理方面其尖锐边缘与细菌细胞膜的直接接触从而对脂质分子进行破坏性提取,而化学方面通过氧化应激所产生的活性氧以及电荷转移破坏细菌细胞膜。此外,石墨烯用于作为分散和稳定各种纳米材料的载体,且得益于材料之间的协同作用,其复合材料具有较高的抗菌效率和良好的生物相容性,目前已在抗菌包装、伤口敷料和器械表面清洁等方面投入使用。本文首先概述了石墨烯的结构、安全性以及抗菌机理,对石墨烯复合涂层所取得的重要成果进行简要总结,最后综述了石墨烯材料在支架表面改性中的研究进展,展望了石墨烯抗菌涂层的未来发展趋势。     

镧掺杂纳米TiO2覆膜陶瓷的光催化自洁净和抗菌性能

采用溶胶-凝胶法制备了掺镧纳米TiO2薄膜,并用浸渍提拉法覆膜在陶瓷表面.最佳工艺条件为:覆膜层数为3,焙烧温度为500℃,掺镧量为La3 /TiO2=0.003(摩尔比).用XRD、SEM等方法研究了薄膜的结构与形貌.陶瓷覆膜镧掺杂纳米TiO,具有良好的亲水性能,抗菌率高达99%.     

阳离子抗菌聚合物

阳离子抗菌聚合物, 作为一种新型抗菌材料, 具有独特的抗菌机理和高效的抗菌活性, 并且能有效解决细菌耐药性问题, 引起了人们的广泛关注。阳离子抗菌聚合物具有有效的抗菌活性, 其抗菌活性受到亲疏水平衡、分子质量、烷基链长度和阴离子等因素的影响。抗菌活性是评价抗菌剂优劣的重要因素之一, 了解和掌握影响抗菌活性的因素, 对于优化或开发更安全、更高效的阳离子抗菌聚合物具有重大意义。本文总结了通过不同作用方式作用于细菌的多种抗菌策略, 依据影响阳离子抗菌聚合物抗菌活性的因素, 总结包括天然阳离子抗菌聚合物、季铵盐类聚合物、N-卤代胺类聚合物、膦盐和锍盐类聚合物、胍盐类聚合物和抗菌水凝胶的研究进展。最后, 对阳离子抗菌聚合物面临的挑战和未来发展方向进行了讨论。     

模拟天然抗菌多肽高分子抗菌药物的研究进展

由于传统抗生素类药物容易使细菌产生耐药性而成为超级细菌,新型的抗菌药物亟待开发。通过模拟天然抗菌多肽设计合成的高分子抗菌剂,具有很高的抗菌活性和生物选择性,而且由于其合成方法简单,结构易于控制,且可实现大规模工业生产,有望成为代替传统抗生素和抗菌多肽的新一代抗菌药物。本文介绍了天然抗菌多肽的抗菌机理与模拟天然抗菌多肽的...     

紫外光下纳米TiO2 薄膜亲水性机理的电化学研究

The nanometer films of TiO2 were prepared by sol-gel method on ITO（Indium-tin oxide,SnO2:In） substrate. The TiO2 film was the anatase phase with a particle size of 100 nm from the measurements of X-ray diffraction and AFM（Atomic-Force-Microscope）. Electrochemical characteristics of ITO/ TiO2 electrode under UV（ultraviolet）irradiation were investigated using the method of cyclic voltammetry. A new oxidative peak was observed at 0.035 V when the TiO2 electrode was irradiated by 253.7 nm UV light for a certain time. The peak current increased with the irradiation time. It was assumed that the new oxidative peak resulted from Ti3+,which was formed during the UV illumination. The changes of hydrophilicity of the TiO2 thin film on ITO under UV light were also observed. It was assumed that the changes of hydrophilicity of the films may be related with the formation of Ti3+ on the surface when the film was irradiated by UV light.     

TiO2光致亲水性及其在免处理版材中的应用研究

用溶胶-凝胶法制备了SiO₂和TiO₂薄膜,并涂覆于玻璃基片上,研究了TiO₂薄膜在紫外光照射下其超亲水性能的变化与光照时间的关系,分析了SiO₂薄膜对覆于其上的TiO₂薄膜的耐摩擦性能的影响.结果表明:TiO₂薄膜经紫外光照射后,疏水性急剧降低,显示亲水性能,与水的接触角可达到5°以下;当其覆膜于载玻片上后,具有良好的耐摩擦性和耐候性;TiO₂薄膜的超亲水性使其有望成为一种新型的环保可重复利用的印刷版材.     

Preparation of nitrogen-substituted TiO2 thin film photocatalysts by the radio frequency magnetron sputtering deposition method and their photocatalytic reactivity under visible light irradiation

Nitrogen-substituted TiO2 (N-TiO2) thin film photocatalysts have been prepared by a radio frequency magnetron sputtering (RF-MS) deposition method using a N2/Ar mixture sputtering gas. The effect of the concentration of substituted nitrogen on the characteristics of the N-TiO2 thin films was investigated by UV-vis absorption spectroscopy, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and scanning electron microscopy (SEM) analyses. The absorption band of the N-TiO2 thin film was found to shift smoothly to visible light regions up to 550 nm, its extent depending on the concentration of nitrogen substituted within the TiO2 lattice in a range of 2.0-16.5%. The N-TiO2 thin film photocatalyst with a nitrogen concentration of 6.0% exhibited the highest reactivity for the photocatalytic oxidation of 2-propanol diluted in water even under visible (lambda > or = 450 nm) or solar light irradiation. Moreover, N-TiO2 thin film photocatalysts prepared on conducting glass electrodes showed anodic photocurrents attributed to the photooxidation of water under visible light, its extent depending on wavelengths up to 550 nm. The absorbed photon to current conversion efficiencies reached 25.2% and 22.4% under UV (lambda = 360 nm) and visible light (lambda = 420 nm), respectively. UV-vis and photoelectrochemical investigations also confirmed that these thin films remain thermodynamically and mechanically stable even under heat treatment at 673 K. In addition, XPS and XRD studies revealed that a significantly high substitution of the lattice O atoms of the TiO2 with the N atoms plays a crucial role in the band gap narrowing of the TiO2 thin films, enabling them to absorb and operate under visible light irradiation as a highly reactive, effective photocatalyst.     

Fabrication and photocatalytic characterizations of ordered nanoporous X-doped (X = N, C, S, Ru, Te, and Si) TiO2/Al2O3 films on ITO/glass

Transparent, ordered nanoporous TiO2/Al2O3 composite films doped with metal elements (Ru, Si, and Te) and nonmetal elements (N, C, and S) were fabricated by successive anodization and sol-gel process directly on glass substrates covered with a tin-doped indium oxide (ITO) film. The doping of ruthenium, nitrogen, carbon, and sulfur in TiO2 exhibited an enhanced effect on the absorbance, while the doping of silicon and tellurium showed little effect. Particularly, the N- and Ru-doped TiO2/Al2O3 films on ITO/glass developed an enhanced absorption red shift of 580 nm (-N) and 500 nm (-Ru). The nanoporous TiO2/Al2O3 composite film exhibited the highest photocatalytic activity in decomposing acetaldehyde under ultraviolet-light irradiation, with a value of 13 times in initial reaction rate or 7.8 times in quantum yield higher than a commercially available TiO2 material, Degussa P25. The ultraviolet-light photocatalytic activities of nanoporous TiO2/Al2O3 films were enhanced by the doping of nitrogen, carbon, and sulfur but slightly weakened by the doping of ruthenium, silicon, and tellurium. Particularly, the nanoporous N-doped TiO2/Al2O3 films exhibited effective photocatalytic activity on ultraviolet light decomposition of a highly toxic dioxin, HpCDD, and gave the highest decomposition rate of approximately 95% (via 7 h of irradiation) for the specimen with a dopant content of 1.7 wt % nitrogen.     

贵金属掺杂Ti/TiO2电极的制备及其电催化性能研究

采用阳极氧化-阴极电沉积两步法: 先在钛基体上用阳极氧化法制备多孔TiO₂薄膜, 接着在这层多孔状薄膜上采用阴极电沉积方法掺杂Pt, Ir来制备Ti/TiO₂-Pt修饰电极和Ti/TiO₂-Ir修饰电极. 用XRD, SEM分析了掺杂前后的成分、相结构及表面形貌的变化, 结果表明: Pt优先沉积在TiO₂多孔中; 与Pt不同, Ir没有表现出在TiO₂孔中优先沉积的现象, 出现这种现象的原因是这两种贵金属的电沉积电位相对于n-TiO₂的平带电位不同. 使用SIMS分析了在Ti/TiO₂-(Pt/Ir)修饰电极中Ti, Pt, Ir的浓度分布, 大致算出TiO₂薄膜厚度为750 nm左右. 由极化曲线和阻抗谱结果得出: 掺杂Pt, Ir明显改善了Ti/TiO₂ 电极的电催化性能, 且随着Pt沉积时间的增长, 修饰电极在硫酸析氧反应中的电催化活性提高.     

(Ni-Mo)/TiO2纳米薄膜光催化降解刚果红的性能与机理

用恒电流复合电沉积方法制备(Ni-Mo)/TiO2薄膜,以扫描电子显微镜(SEM)、X射线衍射(XRD)、拉曼(Raman)光谱和紫外-可见漫反射光谱(UV-VisDRS)对薄膜的表面形貌、晶相结构和光谱特性进行了表征,以刚果红为模拟污染物对薄膜的光催化性能进行了测定,并讨论了刚果红溶液的pH值对薄膜光催化活性的影响.采用循环伏安技术和向溶液中加入活性物种捕获剂的方法对薄膜光催化降解机理进行了探索.结果表明:(Ni-Mo)/TiO2薄膜是由粒径为50-100nmTiO2纳米粒子相和纳米晶Ni-Mo固溶体相构成的复合薄膜.薄膜具有较高的光催化活性,卤钨灯照射80min后,复合薄膜光催化刚果红的降解率是多孔TiO2(DegussaP25)/ITO(氧化铟锡)纳米薄膜的2.43倍.(Ni-Mo)/TiO2薄膜光催化活性的提高主要归因于薄膜层中有效形成的(Ni-Mo)/TiO2异质结和良好的电子通道,以及Ni-Mo纳米晶合金对溶解氧和激发电子还原反应的催化作用.分别给出了在紫外和可见光下薄膜光催化降解刚果红的反应机理.     

掺杂Sb对纳米TiO2薄膜的超亲水性和微结构的影响

用溶胶-凝胶法将纳米TiO2:Sb薄膜沉积在玻璃基板上.研究了掺杂浓度对薄膜的光致超亲水性、薄膜结构和晶相转变的影响.结果表明,纯TiO2薄膜中， TiO2不仅以无定型态存在，而且还以板钛矿和锐钛矿的形式存在.掺杂Sb提高了TiO2由无定型向板钛矿和锐钛矿转变的速率.掺入适量的Sb后， TiO2薄膜表现出更好的光致超亲水性.由XRD谱可算出薄膜的晶粒大小为13.3～20.0 nm.     

溶胶-凝胶法制备金属铂高分散的二氧化钛薄膜

Uniform and crack free TiO 2 thin films with highly dispersed platinum were prepared from i PrOH TTIP DEA H 2O system containing H 2PtCl 6·6H 2O as metal source by sol gel method. The microstructure and morphology of the films were characterized by TEM and XRD respectively. It was found that the Pt particles dispersed in the films and had a homogeneous distribution in the shape of sphere with an average size of about 5 nm. This study also showed that the doping with few percent of Pt resulted in the formation of pure rutile phase at a temperature as low as 550 ℃, whereas the same pure phase was formed at the temperature higher than 650 ℃ in TiO 2 or Au/TiO 2 thin films.     

溶胶法制备的二氧化硅与二氧化钛复合薄膜的性能

在室温下, 采用溶胶法在玻璃基板上制备了厚度约为100 nm的均匀、透明的纳米SiO2-TiO2复合薄膜.研究了不同温度处理后薄膜的超亲水性、光催化能力等光致活性.通过XPS对薄膜表面及近表面元素的化学态的研究发现, Ti在表面及近表面不仅以Ti4＋形式存在, 也存在少量Ti3＋.紫外光照射后, 部分Ti4＋ 转变成了Ti3＋. XRD研究表明, 该薄膜中的TiO2主要以锐钛矿形式存在, 而且其晶粒大小为14～20 nm.用AFM研究了SiO2-TiO2薄膜的表面形貌及不同的温度处理对TiO2颗粒大小的影响.     

Preparation of nano-sized Pt metal particles by photo-assisted deposition (PAD) on transparent Ti-containing mesoporous silica thin film

We have investigated a novel technique for the preparation of nano-sized Pt metals on Ti-containing mesoporous silica (TMS) thin film by photo-assisted deposition (PAD). The transparent TMS thin film was prepared on a quartz plate through sol—gel/spin coating. XRD, UV-Vis and Ti K-edge XAFS measurements revealed the formation of isolated Ti oxide species with a tetrahedral-coordination geometry in the silica framework. Deposition of Pt metal precursor on TMS thin film under UV-light irradiation, followed by reduction with molecular hydrogen, afforded a transparent thin film (Pt/TMS). The formation of highly dispersed nano-sized Pt metals having narrow size distributions was determined by Pd L_III-edge XANES and TEM analysis. The TMS and Pt/TMS thin films have been demonstrated to exhibit a strong hydrophilic property, even before UV irradiation, compared to the common mesoporous silica and TiO₂ thin films. After UV-light irradiation, the contact angle of water droplet on the TMS and Pt/TMS thin films became extremely lower, indicating the appearance of the photo-induced super-hydrophilic property.