Dissociative electron capture of halocarbon caused by the internal electron transfer from water trimer anion

Dissociative electron capture dynamics of halocarbon absorbed on water cluster anion, caused by internal electron transfer from the water trimer anion to the halocarbon, have been investigated by means of the direct density functional theory (DFT)-molecular dynamics (MD) method. The CF(2)Cl(2) molecule and a water trimer anion e(-)(H(2)O)(3) were used as a halocarbon and a trapped electron, respectively. First, the structure of trapped electron state, expressed by e(-)(H(2)O)(3)-CF(2)Cl(2), was fully optimized. The excess electron was trapped by a dipole moment of water trimer. Next, initial geometries were randomly generated around the equilibrium point of the trapped electron state, and then trajectories were run. The direct DFT-MD calculations showed that the spin density distribution of excess electron is gradually changed from the water cluster (trapped electron state) to CF(2)Cl(2) as a function of time. Immediately, the Cl(-) ion was dissociated from CF(2)Cl(2)(-) adsorbed on the water cluster. The reaction was schematically expressed by e(-)(H(2)O)(3)-CF(2)Cl(2)-->[(H(2)O)(3)-->-CF(2)CL(2)](-) --> (H(2O)(3) + CF(2)CL + CI(-) (I) where [(H(2)O)(3)-CF(2)Cl(2)](-) indicates a transient intermediate state in which the excess electron is widely distributed on both the water cluster and CF(2)Cl(2). The mechanism of the electron capture of halocarbon from the trapped electron in water ice was discussed on the basis of the theoretical results. Also, the dynamics feature was compared with those of the direct electron capture reactions of CF(2)Cl(2) and CF(2)Cl(2)-(H(2)O)(3), i.e. e(-) + CF(2)Cl(2), and e(-) + CF(2)Cl(2)-(H(2)O)(3), investigated in our previous paper [Tachikawa and Abe, J. Chem. Phys., 2007, 126, 194310].     

Reaction dynamics following electron capture of chlorofluorocarbon adsorbed on water cluster: a direct density functional theory molecular dynamics study

The electron capture dynamics of halocarbon and its water complex have been investigated by means of the full dimensional direct density functional theory molecular dynamics method in order to shed light on the mechanism of electron capture of a halocarbon adsorbed on the ice surface. The CF(2)Cl(2) molecule and a cyclic water trimer (H(2)O)(3) were used as halocarbon and water cluster, respectively. The dynamics calculation of CF(2)Cl(2) showed that both C-Cl bonds are largely elongated after the electron capture, while one of the Cl atoms is dissociated from CF(2)Cl(2) (-) as a Cl(-) ion. Almost all total available energy was transferred into the internal modes of the parent CF(2)Cl radical on the product state, while the relative translational energy of Cl(-) was significantly low due to the elongation of two C-Cl bonds. In the case of a halocarbon-water cluster system, the geometry optimization of neutral complex CF(2)Cl(2)(H(2)O)(3) showed that one of the Cl atoms interacts with n orbital of water molecules of trimer and the other Cl atom existed as a dangling Cl atom. After the electron capture, only one C-Cl bond (dangling Cl atom) was rapidly elongated, whereas the other C-Cl bond is silent during the reaction. The dangling Cl atom was directly dissociated from CF(2)Cl(2) (-)(H(2)O)(3) as Cl(-). The fast Cl(-) ion was generated from CF(2)Cl(2) (-)(H(2)O)(3) on the water cluster. The mechanism of the electron capture of halocarbon on water ice was discussed on the basis of the theoretical results.     

Negative ion formation in electron-stimulated desorption of CF2Cl2 coadsorbed with polar NH3 on Ru(0001)

Photon-induced dissociation of CF2Cl2 (freon-12) in the stratosphere contributes substantially to atmospheric ozone depletion. We report recent results on dissociation and negative ion formation in electron-stimulated desorption (ESD) of CF2Cl2 on Ru(0001), when CF2Cl2 is coadsorbed with a polar molecule (NH3), for electron energies ranging from 50 to 300 eV. Two different time-of-flight methods are used in this investigation: (a) an ESD ion angular distribution detector with wide collection angle and (b) a quadrupole mass spectrometer with narrow collection angle and high mass resolution. Many negative ESD fragments are seen (F-, Cl-, FCl-, CF-, F2-, and Cl2-), whose intensities depend on the surface preparation. Using both detectors we observe a giant enhancement of Cl- and F- yields for ESD of CF2Cl2 coadsorbed with approximately 1 ML of NH3; this enhancement (>10(3) for Cl-) is specific to certain ions, and is attributed to an increased probability of dissociative electron attachment due to "trapped" low-energy secondary electrons, i.e., precursor states of the solvated electron in NH3. In further studies, the influence of polar NH3 spacer layers (1-10 ML) on ESD of top-layer CF2Cl2 is determined, and compared with thick films of condensed CF2Cl2. The magnitudes and energy dependences of the Cl- yields are different in these cases, due to several contributing factors.     

Interaction of water with ordered theta-Al(2)O(3) ultrathin films grown on NiAl(100)

The structure of an ordered, ultrathin theta-Al(2)O(3) film grown on a NiAl(100) single-crystal surface was studied by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and low-energy electron diffraction (LEED), and its interaction with water was investigated with temperature programmed desorption (TPD) and XPS. Our results indicate that H(2)O adsorption on the theta-Al(2)O(3)/NiAl(100) surface is predominantly molecular rather than dissociative. For theta(H)()2(O) < 1 ML (ML = monolayer), H(2)O molecules were found to populate Al(3+) cation sites to form isolated H(2)O species aligned in a row along the cation sites on the oxide surface with a repulsive interaction between them. For theta(H)()2(O) > 1 ML, three-dimensional ice multilayers were observed to form, which then desorb during TPD with approximate zero-order kinetics as expected. A small extent of H(2)O dissociation was observed to occur on the theta-Al(2)O(3)/NiAl(100) surface, which was attributed to the presence of a low concentration of oxygen atom vacancies. Titration of these defect sites with adsorbed H(2)O molecules revealed an estimated defect density of 0.05 ML for the theta-Al(2)O(3)/NiAl(100) system consistent with the ordered nature of the synthesized oxide film.     

Surface chemistry of CN bond formation from carbon and nitrogen atoms on Pt(111)

The mechanism of CN bond formation from CH3 and NH3 fragments adsorbed on Pt(111) was investigated with reflection absorption infrared spectroscopy (RAIRS), temperature-programmed desorption (TPD), and X-ray photoelectron spectroscopy (XPS). The surface chemistry of carbon-nitrogen coupling is of fundamental importance to catalytic processes such as the industrial-scale synthesis of HCN from CH4 and NH3 over Pt. Since neither CH4 nor NH3 thermally dissociate on Pt(111) under ultrahigh vacuum (UHV) conditions, the relevant surface intermediates were generated through the thermal decomposition of CH3I and the electron-induced dissociation of NH3. The presence of surface CN is detected with TPD through HCN desorption as well as with RAIRS through the appearance of the vibrational features characteristic of the aminocarbyne (CNH2) species, which is formed upon hydrogenation of surface CN at 300 K. The RAIRS results show that HCN desorption at approximately 500 K is kinetically limited by the formation of the CN bond at this temperature. High coverages of Cads suppress CN formation, but the results are not influenced by the coadsorbed I atoms. Cyanide formation is also observed from the reaction of adsorbed N atoms and carbon produced from the dissociation of ethylene.     

Photochemistry of ethyl chloride caged in amorphous solid water

Caging and photo-induced decomposition of ethyl chloride molecules (EC) within a layer of amorphous solid water (ASW) on top of clean and oxygen-covered Ru(001) under ultra-high vacuum (UHV) conditions are presented. The caged molecules were estimated to reside 1.5 +/- 0.2 nm above the solid surface, based on parent molecule thermal decomposition on the clean ruthenium. Dissociative electron attachment (DEA) of the caged molecules following 193 nm laser irradiation, result in initial fragmentation to ethyl radical and chloride anion. It was found that photoreactivity on top of the clean ruthenium surface (Ru) is twenty times faster than on the oxygen-covered surface (O/Ru), with DEA cross sections: sigma(Ru) = (3.8 +/- 1) x 10(-19) cm(2) and sigma(O/Ru) = (2.1 +/- 0.3) x 10(-20) cm(2). This difference is attributed to the higher work function of oxygen-covered ruthenium, leading to smaller electron attachment probability due to mismatch of the ruthenium photo-electron energy with the adsorbed EC excited electron affinity levels. EC molecules fragmented within the cage, result in post-irradiation TPD spectra that reveal primarily C(4)H(8), C(3)H(5) and C(3)H(3), without any oxygen-containing molecules. Unique stabilization of the photoproducts has been observed with the first layer of water molecules in direct contact with the substrate, desorbing near 180 K, a significantly higher temperature than the desorption of fully caged molecules. This study may contribute for understanding stratospheric photochemistry and processes in interstellar space.     

Atmospheric chemistry of CF3CH=CH2 and C4F9CH=CH2: products of the gas-phase reactions with Cl atoms and OH radicals

FTIR-smog chamber techniques were used to study the products of the Cl atom and OH radical initiated oxidation of CF3CH=CH2 in 700 Torr of N2/O2, diluent at 296 K. The Cl atom initiated oxidation of CF3CH=CH2 in 700 Torr of air in the absence of NOx gives CF3C(O)CH2Cl and CF3CHO in yields of 70+/-5% and 6.2+/-0.5%, respectively. Reaction with Cl atoms proceeds via addition to the >C=C< double bond (74+/-4% to the terminal and 26+/-4% to the central carbon atom) and leads to the formation of CF3CH(O)CH2Cl and CF3CHClCH2O radicals. Reaction with O2 and decomposition via C-C bond scission are competing loss mechanisms for CF3CH(O)CH2Cl radicals, kO2/kdiss=(3.8+/-1.8)x10(-18) cm3 molecule-1. The atmospheric fate of CF3CHClCH2O radicals is reaction with O2 to give CF3CHClCHO. The OH radical initiated oxidation of CxF2x+1CH=CH2 (x=1 and 4) in 700 Torr of air in the presence of NOx gives CxF2x+1CHO in a yield of 88+/-9%. Reaction with OH radicals proceeds via addition to the >C=C< double bond leading to the formation of CxF2x+1C(O)HCH2OH and CxF2x+1CHOHCH2O radicals. Decomposition via C-C bond scission is the sole fate of CxF2x+1CH(O)CH2OH and CxF2x+1CH(OH)CH2O radicals. As part of this work a rate constant of k(Cl+CF3C(O)CH2Cl)=(5.63+/-0.66)x10(-14) cm3 molecule-1 s-1 was determined. The results are discussed with respect to previous literature data and the possibility that the atmospheric oxidation of CxF2x+1CH=CH2 contributes to the observed burden of perfluorocarboxylic acids, CxF2x+1COOH, in remote locations.     

全氟及α,α-二氯多氟烷基亚磺酸盐的反应

全氟烷基亚磺酸钠与溴水反应,得到全氟烷基磺酰溴(RfSO2Br),(但在乙腈,乙酸等有机溶剂中与溴反应,则生成溴代全氟烷.在碘化钾水溶液中,全氟烷基亚磺酸钠与碘反应,生成碘代全氟烷.α,α-二氯多币烷基亚磺酸钠在类似条件下与溴水反应,生成1-溴-1,1-二氯多氟烷,与碘在磺化钾水溶液中反应,生成1-碘-1,1-二氯多氟烷.1-溴-1,1-二氯多烷及1-碘-1,1-二氯多氟烷易对烯键加成,也可与连二亚硫酸钠在温和条件下发生亚磺化脱溴及脱碘反应.α,α-二氯二氟乙基亚磺酸钠在强酸中比较稳定,与强碱,氧化剂或还原剂发生反应,得到相应的产物.     

Gas phase hyper-Rayleigh scattering measurements

Measurements of hyper-Rayleigh scattering intensities and polarization ratios are presented for nine small molecules in the gas phase [CH(4), CF(4), CCl(4), N(2)O, NH(3), D(2)O, SO(2), CF(2)Cl(2), and (CH(3))(2)CO]. In four cases [CH(4), CF(4), CCl(4), and N(2)O] all molecular hyperpolarizability tensor components can be determined from the measurements. The results of this experiment are compared with the results of previous ab initio calculations, finding discrepancies up to 60%. Including vibrational contributions decreases the discrepancies for CH(4) and CF(4) and increases them for CCl(4), D(2)O, and NH(3).     

Geminate charge recombination in liquid alkane with concentrated CCl4: effects of CCl4 radical anion and narrowing of initial distribution of Cl-

Dynamics of radical cations and electrons in an admixture of a linear saturated hydrocarbon (n-dodecane) and halocarbon (carbon tetrachloride, CCl(4)) were investigated by picosecond electron beam pulse radiolysis. The decay of thermalized electrons (e(th)(-)) observed in infrared transient photoabsorption were simply accelerated by the addition of CCl(4), giving a high rate constant of 2.3 × 10(11) mol(-1) dm(3) s(-1). The decrease of the initial yield of e(th)(-) was quantified by C(37) (50 mmol), which is linked to the reaction of epithermal electrons (e(-)) with CCl(4). In contrast, the n-dodecane radical cation (RH(2)(?+)) monitored in the near-infrared indicated a convex-type dependence of the decay rate on CCl(4) concentration, although the initial yield of RH(2)(?+) remained almost constant up to a much higher CCl(4) concentration. The decay of RH(2)(?+) was analyzed by Monte Carlo simulations of geminate ion recombination with e(th)(-), chlorine anion (Cl(-)) formed via dissociative electron attachment, and CCl(4) radical anion. The results showed a good agreement with the experiments by considering two assumptions: (1) CCl(4) radical anion formed via e(th)(-) attachment and (2) narrowing of the initial distribution of Cl(-). The decrease in the initial yield of RH(2)(?+) at high CCl(4) concentration was well explained by immediate decomposition of CCl(4)(?+) to CCl(3)(+) and hole transfer from CCl(4)(?+) to adjacent RH(2) without diffusive motion of the reactants. Time-dependent density functional theory supported the spectroscopic assignment of intermediate species in the n-dodecane/CCl(4) system. The present results would be of help in understanding the electron capture reaction in multicomponent systems such as a chemically amplified resist in lithography.     

Enhancements in dissociative electron attachment to CF4, chlorofluorocarbons and hydrochlorofluorocarbons adsorbed on H2O ice

We report that the absolute cross sections for dissociative attachment of approximately 0 eV electrons to chlorofluorocarbons (CFCs) and hydrochlorofluorocarbons (HCFCs) are strongly enhanced by the presence of H2O ice. The absolute cross sections for CFCl3, CHF2Cl, and CH3CF2Cl on water ice are measured to be approximately 8.9 x 10(-14), approximately 5.1 x 10(-15), and approximately 4.9 x 10(-15) cm2 at approximately 0 eV, respectively. The former value is about 1 order of magnitude higher than that in the gas phase, while the latter two are 3-4 orders higher. In contrast, the resonances at electron energies > or = 2.0 eV are strongly suppressed either for CFCs and HCFCs or for CF4 adsorbed on H2O ice. The cross-section enhancement is interpreted to be due to electron transfer from precursor states of the solvated electron in ice to an unfilled molecular orbital of CFCs or HCFCs followed by its dissociation. This study indicates that electron-induced dissociation is a significant process leading to CFC and HCFC fragmentation on ice surfaces.     

Low temperature H2O and NO2 coadsorption on theta-Al2O3/NiAl(100) ultrathin films

The coadsorption of H(2)O and NO(2) molecules on a well-ordered, ultrathin theta-Al(2)O(3)/NiAl(100) film surface was studied using temperature programmed desorption (TPD), infrared reflection absorption spectroscopy (IRAS), and X-ray photoelectron spectroscopy (XPS). For H(2)O and NO(2) monolayers adsorbed separately on the theta-Al(2)O(3)/NiAl(100) surface, adsorption energies were estimated to be 44.8 and 36.6 kJ/mol, respectively. Coadsorption systems prepared by sequential deposition of NO(2) and H(2)O revealed the existence of coverage and temperature-dependent adsorption regimes where H(2)O molecules and the surface NO(x) species (NO(2)/N(2)O(4)/NO(2)(-),NO(3)(-)) form segregated and/or mixed domains. Influence of the changes in the crystallinity of solid water (amorphous vs crystalline) on the coadsorption properties of the NO(2)/H(2)O/theta-Al(2)O(3)/NiAl(100) system is also discussed.     

Atmospheric chemistry of CF3CH2CH2OH: kinetics, mechanisms and products of Cl atom and OH radical initiated oxidation in the presence and absence of NOX

Relative rate techniques were used to study the kinetics of the reactions of Cl atoms and OH radicals with CF(3)CH(2)C(O)H and CF(3)CH(2)CH(2)OH in 700 Torr of N(2) or air diluent at 296 +/- 2 K. The rate constants determined were k(Cl+CF(3)CH(2)C(O)H) = (1.81 +/- 0.27) x 10(-11), k(OH+CF(3)CH(2)C(O)H) = (2.57 +/- 0.44) x 10(-12), k(Cl+CF(3)CH(2)CH(2)OH) = (1.59 +/- 0.20) x 10(-11), and k(OH+CF(3)CH(2)CH(2)OH) = (6.91 +/- 0.91) x 10(-13) cm(3) molecule(-1) s(-1). Product studies of the chlorine initiated oxidation of CF(3)CH(2)CH(2)OH in the absence of NO show the sole primary product to be CF(3)CH(2)C(O)H. Product studies of the chlorine initiated oxidation of CF(3)CH(2)CH(2)OH in the presence of NO show the primary products to be CF(3)CH(2)C(O)H (81%), HC(O)OH (10%), and CF(3)C(O)H. Product studies of the chlorine initiated oxidation of CF(3)CH(2)C(O)H in the absence of NO show the primary products to be CF(3)C(O)H (76%), CF(3)CH(2)C(O)OH (14%), and CF(3)CH(2)C(O)OOH (< or =10%). As part of this work, an upper limit of k(O(3)+CF(3)CH(2)CH(2)OH) < 2 x 10(-21) cm(3) molecule(-1) s(-1) was established. Results are discussed with respect to the atmospheric chemistry of fluorinated alcohols.     

Atmospheric chemistry of CF3OCF2CF2H and CF3OC(CF3)2H: reaction with Cl atoms and OH radicals, degradation mechanism, global warming potentials, and empirical relationship between k(OH) and k(Cl) for organic compounds

Using FTIR smog chamber techniques, k(Cl + CF3OCF2CF2H) = (2.70 +/- 0.52) x 10(-16), k(OH + CF3OCF2CF2H) = (2.26 +/- 0.18) x 10(-15), k(Cl + CF3OC(CF3)2H) = (1.58 +/- 0.27) x 10(-18) and k(OH + CF3OC(CF3)2H) = (3.26 +/- 0.95) x 10(-16) cm3 molecule(-1) s(-1) were measured. The atmospheric lifetimes of CF3OCF2CF2H and CF3OC(CF3)2H are estimated to be 27 and 216 years, respectively. Chlorine atom initiated oxidation of CF3OCF2CF2H in 700 Torr of air in the presence of NO(x) gives CF3OC(O)F in a molar yield of 36 +/- 5% and COF2 in a molar yield of 174 +/- 9%, whereas oxidation of CF3OC(CF3)2H gives CF3OC(O)CF3 and COF2 in molar yields that are indistinguishable from 100%. Quantitative infrared spectra were recorded and used to estimate global warming potentials of 3690 and 8230 (100 year time horizon, relative to CO2) for CF3OCF2CF2H and CF3OC(CF3)2H, respectively. All experiments were performed in 700 Torr of N2/O2 diluent at 296 +/- 2 K. An empirical relationship can be used to estimate the preexponential factor, which can be combined with k(298 K) to give the temperature dependence of reactions of OH radicals with organic compounds proceeding via H-atom abstraction: log(A/n) = (0.239 +/- 0.027) log(k(OH)/n) - (8.69 +/- 0.372), k(OH) is the rate constant at 298 K and n is the number of H atoms. The rates of H-atom abstraction by OH radicals and Cl atoms at 298 K from organic compounds are related by the expression log(k(OH)) = (0.412 +/- 0.049) log(k(Cl)) - (8.16 +/- 0.72). The utility of these expressions and the atmospheric chemistry of the title hydrofluoroethers are discussed.     

Thermal and ion-induced surface reactions of 1,1-difluoroethylene on Si(111)7 x 7 and vitreous SiO2

Thermal and ion-induced reactions of 1,1-difluoroethylene (1,1-C2H2F2 or iso-DFE) on Si(111)7 x 7 and vitreous SiO2 surfaces have been investigated by vibrational electron energy loss spectroscopy and thermal desorption spectrometry. Like ethylene, iso-DFE predominantly chemisorbs via a [2 + 2] cycloaddition mechanism onto the 7 x 7 surface as a di-sigma-bonded difluoroethane-1,2-diyl adstructure, which undergoes H abstraction and defluorination, producing hydrocarbon fragments and SiF(x) (x = 1-3) upon annealing to >700 K. Ion irradiation of Si(111)7 x 7 in iso-DFE at 50 eV impact energy appears to substantially enhance the production of hydrocarbon fragments and SiF(x)(), leading to stronger SiF4 desorption products over an extended temperature range (400-900 K). The observed SiC and SiF(x) produced on the 7 x 7 surface by ion irradiation in iso-DFE are found to be similar to those obtained by ion irradiation in the fluoromethane homologues, CF4 and CH2F2. The production of higher relative concentrations for the larger SiF(x) and C2-containing fragments is evidently favored on the 7 x 7 surface. On a vitreous SiO2 surface, ion irradiation in iso-DFE, unlike that in CF4 and CH2F2, appears to produce less SiF(x) than that on the 7 x 7 surface, which indicates that surface O does not interact strongly with the C2-containing fragments. The presence or absence of a C=C bond and the relative F-to-C ratio of the sputtering gas could therefore produce important effects on the resulting surface products obtained by low-energy ion irradiation.     

Coupling versus surface-etching reactions of alkyl halides on GaAs(100): I. CF3CH2I reactions

We report the rich surface chemistry exhibited by the reactions of 1,1,1-trifluoroethyl iodide (CF3CH2I) adsorbed onto gallium-rich GaAs(100)-(4 x 1), studied by temperature-programmed desorption (TPD) and low-energy electron diffraction (LEED) studies and X-ray photoelectron spectroscopy (XPS). CF3CH2I adsorbs molecularly at 150 K but dissociates, below room temperature, to form a chemisorbed monolayer of CF3CH2 and I species. Recombinative desorption of molecular CF3CH2I competes with the further reactions of the CF3CH2 and I chemisorbed species. The CF3CH2 species can either undergo beta-fluoride elimination to yield gaseous CF2=CH2 or it can undergo self-coupling to form the corresponding higher alkane, CF3CH2CH2CF3. A second coupling product, CF3CH2CH=CF2, is also evolved, and it is postulated that migratory insertion of the liberated CF2=CH2 into the surface-carbon bond of the chemisorbed CF3CH2 is responsible for its formation. The iodines, formed by C-I scission in the chemisorbed CF3CH2I, and the fluorines, derived from beta-fluoride elimination in CF3CH2, react with the surface gallium dimers, and Ga-As back-bonds to generate five etch products (GaF, AsF, GaI, AsI, and As2) that desorb in the temperature range of 420 to >600 K. XPS data reveal that the surface stoichiometry remains constant throughout the entire annealing temperature range because of the desorption of both gallium- and arsenic-containing etch products, which occur sequentially. In this article, plausible mechanisms by which all products form and the binding sites of these reactions in the (4 x 1) reconstruction are discussed. Factors that control the rate constants of etch product versus hydrocarbon product formation and in particular how they impact on the respective desorption temperatures will be discussed.     

Atmospheric chemistry of CH3CHF2 (HFC-152a): kinetics, mechanisms, and products of Cl atom- and OH radical-initiated oxidation in the presence and absence of NO(x)

Smog chamber/Fourier transform infrared (FTIR) and laser-induced fluorescence (LIF) spectroscopic techniques were used to study the atmospheric degradation of CH3CHF2. The kinetics and products of the Cl(2P(3/2)) (denoted Cl) atom- and the OH radical-initiated oxidation of CH3CHF2 in 700 Torr of air or N2; diluents at 295 +/- 2 K were studied using smog chamber/FTIR techniques. Relative rate methods were used to measure k(Cl + CH3CHF2) = (2.37 +/- 0.31) x 10(-13) and k(OH + CH3CHF2) = (3.08 +/- 0.62) x 10(-14) cm3 molecule(-1) s(-1). Reaction with Cl atoms gives CH3CF2 radicals in a yield of 99.2 +/- 0.1% and CH2CHF2 radicals in a yield of 0.8 +/- 0.1%. Reaction with OH radicals gives CH3CF2 radicals in a yield >75% and CH2CHF2 radicals in a yield <25%. Absolute rate data for the Cl reaction were measured using quantum-state selective LIF detection of Cl(2P(j)) atoms under pseudo-first-order conditions. The rate constant k(Cl + CH3CHF2) was determined to be (2.54 +/- 0.25) x 10(-13) cm3 molecule(-1) s(-1) by the LIF technique, in good agreement with the relative rate results. The removal rate of spin-orbit excited-state Cl(2P(1/2)) (denoted Cl) in collisions with CH3CHF2 was determined to be k(Cl + CH3CHF2) = (2.21 +/- 0.22) x 10(-10) cm3 molecule(-1) s(-1). The atmospheric photooxidation products were examined in the presence and absence of NO(x). In the absence of NO(x)(), the Cl atom-initiated oxidation of CH3CHF2 in air leads to formation of COF2 in a molar yield of 97 +/- 5%. In the presence of NO(x), the observed oxidation products include COF2 and CH3COF. As [NO] increases, the yield of COF2 decreases while the yield of CH3COF increases, reflecting a competition for CH3CF2O radicals. The simplest explanation for the observed dependence of the CH3COF yield on [NO(x)] is that the atmospheric degradation of CH3CF2H proceeds via OH radical attack to give CH3CF2 radicals which add O2 to give CH3CF2O2 radicals. Reaction of CH3CF2O2 radicals with NO gives a substantial fraction of chemically activated alkoxy radicals, [CH3CF2O]. In 1 atm of air, approximately 30% of the alkoxy radicals produced in the CH3CF2O2 + NO reaction possess sufficient internal excitation to undergo "prompt" (rate >10(10) s(-1)) decomposition to give CH3 radicals and COF2. The remaining approximately 70% become thermalized, CH3CF2O, and undergo decomposition more slowly at a rate of approximately 2 x 10(3) s(-1). At high concentrations (>50 mTorr), NO(x) is an efficient scavenger for CH3CF2O radicals leading to the formation of CH3COF and FNO.     

Syntheses, characterization, and dioxygen reactivities of Cu(I) complexes with cis,cis-1,3,5-triaminocyclohexane derivatives: a Cu(III)2O2 intermediate exhibiting higher C-H activation

Six Cu(I) complexes with cis,cis-1,3,5-triaminocyclohexane derivatives (R3CY, R = Et, iBu, and Bn), [Cu(MeCN)(Et3CY)]SbF6 (1), [Cu(MeCN)(iBu3CY)]SbF6 (2), [Cu(MeCN)(Bn3CY)]SbF6 (3), [Cu(CO)(Et3CY)]SbF6 (4), [Cu(CO)(iBu3CY)]SbF6 (5), and [Cu(CO)(Bn3CY)]SbF6 (6), were prepared to probe the ability of copper complexes to effectively catalyze oxygenation reactions. The complexes were characterized by elemental analysis, electrochemical and X-ray structure analyses, electronic absorption spectroscopy, IR spectroscopy, 1H NMR spectroscopy, and ESI mass spectrometry. The crystal structures of 1-3 and 6 and the CO stretching vibrations (nuCO) of 4-6 demonstrate that the ability of R3CY to donate electron density to the Cu(I) atom is stronger than that of the previously reported ligands, 1,4,7-triazacyclononane (R3TACN) and 1,4,7-triazacyclodecane (R3TACD). Reactions of complexes 1-3 with dioxygen in THF or CH2Cl2 at -105 to -80 degrees C yield bis(mu-oxo)dicopper(III) complexes 7-9 as intermediates as confirmed by electronic absorption spectroscopy and resonance Raman spectroscopy. The Cu-O stretching vibrations, nu(Cu-O) for 7 (16O2: 553, 581 cm-1and 18O2: 547 cm-1) and 8 (16O2: 571 cm-1 and 18O2: 544 cm-1), are observed in a lower energy region than previously reported for bis(micro-oxo) complexes. The decomposition rates of complexes 7-9 in THF at -90 degrees C are 2.78 x 10-4 for 7, 8.04 x 10-4 for 8, and 3.80 x 10-4 s-1 for 9. The decomposition rates of 7 and 8 in CH2Cl2 were 5.62 x 10-4 and 1.62 x 10-3 s-1, respectively, and the thermal stabilities of 7-9 in CH2Cl2 are lower than the values measured for the complexes in THF. The decomposition reactions obeyed first-order kinetics, and the H/D isotope experiments for 8 and 9 indicate that the N-dealkylation reaction is the rate-determining step in the decomposition processes. On the other hand, the decomposition reaction of 7 in THF results in the oxidation of THF (acting as an exogenous substrate) to give 2-hydroxy tetrahydrofuran and gamma-butyrolactone as oxidation products. Detailed investigation of the N-dealkylation reaction for 8 by kinetic experiments using N-H/D at -90 degrees C showed a kinetic isotope effect of 1.25, indicating that a weak electrostatic interaction between the N-H hydrogen and mu-oxo oxygen contributes to the major effect on the rate-determining step of N-dealkylation. X-ray crystal structures of the bis(micro-hydroxo)dicopper(II) complexes, [Cu2(OH)2(Et3CY)2](CF3SO3)2 (10), [Cu2(OH)2(iBu3CY)2](CF3SO3)2 (11), and [Cu2(OH)2(Bn3CY)2](ClO4)2 (12), which have independently been prepared as the final products of bis(micro-oxo)dicopper(III) intermediates, suggest that an effective interaction between N-H and mu-oxo in the Cu(III)2(micro-O)2 core may enhance the oxidation ability of the metal-oxo species.     

Electron-impact ionization of CCl4 and CCl2F2

Absolute partial and total cross sections for electron-impact ionization of CCl4 and CCl2F2 are reported for electron energies from threshold to 1000 eV. The product ions are mass analyzed using a time-of-flight mass spectrometer and detected with a position-sensitive detector whose output demonstrates that all product ion species are collected with equal efficiency irrespective of their initial kinetic energies. Data are presented for production of CCl3(+), CCl2(+), CCl+, C+, Cl2(+), and CCl3(2+) from CCl4; and for production of CCl(2)F+, CClF2(+), CClF(+), (CCl+ + CF2(+)), Cl+, CF+, F+, and C+ from CCl2F2. Data are also reported for formation of (CCl2(+),Cl+) and (CCl+, Cl+) ion pairs from CCl4. The total cross section for each target is obtained as the sum of the partial cross sections. The overall uncertainty in the absolute cross sections for most of the singly charged ions is +/- 5-7 %. The present partial cross sections for lighter fragment ions are found to be considerably greater than had been previously reported but the most recent total cross section measurements agree well with those reported here. Neither the binary-encounter-Bethe theory nor the Deutsch-Mark theory reproduces the experimental cross sections correctly for both targets.     

Adsorption and electron-induced polymerization of methyl methacrylate on Ru(1010)

The adsorption and electron irradiation of methyl methacrylate (MMA) on a Ru(1010) surface have been studied using x-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD), and low energy ion scattering. TPD analysis indicates that a monolayer of MMA chemisorbs and dissociates on the Ru(1010) surface. The reaction products observed upon heating include H(2), CO, CO(2), and a small amount of MMA. Physisorbed multilayers of MMA desorb at temperatures around 170 K. Electron irradiation of physisorbed MMA at 140 K leads to a modification of the MMA film: The XPS spectra show an increase in thermal stability of the film with retention of the MMA structure, and indicate that electron irradiation induces polymerization. An increase in the electron bombardment fluence induces a degradation of the formed polymerized species and leads to the accumulation of carbon on the Ru surface. These results are relevant to the accumulation of carbon on surfaces of Ru films that serve as capping layers on MoSi multilayer mirrors used in extreme ultraviolet lithography.