含1,3-方酸苯螺旋共轭分子的设计及其电子光谱和非线性光学性质的理论研究

以量子化学半经验方法PM3优化构型为基础，利用INDO／CI方法研究了嵌入1，3－方酸的苯螺旋共轭分子的电子光谱。同时利用INDO／CI－SOS程度计算了它们的二阶非线性光学系数βijk和βμ值，从而探索分子结构与电子光谱及非线性光学性质的关系。理论计算结果表明：在苯螺旋共轭分子中适当地嵌入方酸后，其二阶非线性光学系数增大，与苯螺旋共轭分子和1，3－方酸的比较表明，方酸环处于左端的体系有很好的二阶非线性光学性质，可能成为较好的光学材料。     

对称二苯乙烯衍生物非共振三阶非线性光学性质理论研究

采用PM3,INDO/CI理论方法,系统研究了对称二苯乙烯系列衍生物的几何构型及电子光谱,计算结果与实验值基本吻合。在此基础上用完全态求和公式计算了分子的非共振三阶非线性光学系数,并从微观上探讨了不同分子结构的电子离域作用对材料三阶非线性光学性质的影响。     

反式二苯乙烯系列衍生物双光子吸收截面的理论研究

采用PM3和INDO／CI理论方法,系统研究了对称取代反式二苯乙烯衍生物的结构和电子光谱。在正确的UV－Vis光谱基础上,预测了双光子吸收峰的位置。自编程序用SOS公式计算了三阶非线性光学系数及双光子吸收截面,并从微观上探讨了不同取代基对双光子吸收截面的影响。     

二苯乙烯衍生物和二噻吩并噻吩衍生物的双光子吸收截面的理论研究

用AMI和INDO/CI理论方法,系统研究了二苯乙烯衍生物和二噻吩衍生物的结构和电子光谱。在正确的UV-vis光谱基础上,预测了双光子吸收峰的位置。用完全态求和(SOS)公式计算了三阶非线性光学系数及双光子吸收截面,并从微观上探讨了不同骨架以及不同取代基对双光子吸收截面的影响。     

不同类型二苯乙烯衍生物双光子吸收截面的理论研究

用AM1和INDO/CI理论方法,系统研究不同类型二苯乙烯衍生物(D-π-D,A-π-A,D-π-A)的结构和电子光谱。在正确的UV-vis光谱基础上,预测了双光子吸收峰的位置,用SOS公式计算了三阶非线性光学系数及双光子吸收截面,并从微观上探讨了不同取代基对双光子吸收截面的影响。     

若干有机共轭分子三阶非线性光学系数和链长的关系

我们以INDO/SDCI方法为基础, 利用完全态求和公式, 计算了多烯烃和联苯类分子的三阶非线性光学系数γ(0,0,0,0)和γ(-ω,ω, -ω,ω)。研究了γ与共轭分子链长的关系及其与外场频率的关系, 认为在链不十分长时γ与链长的三次方成正比。γ的大小微观上与电子的离域作用有关。     

巴比妥酸葡萄糖基取代衍生物电子光谱和二阶非线性光学性质的理论研究

应用量子化学AM1半经验方法分别对巴比妥酸及硫代巴比妥酸的葡萄糖基系列取代衍生物B_1-5和T_1-5进行几何优化。基于优化后的稳定构型，利用INDO/CI方法计算其电子光谱。同时，根据完全态求和(SOS)公式计算其二阶非线性光学系数。结果显示，当葡萄糖基单元数增加时，无论是巴比妥酸衍生物还是硫代巴比妥酸衍生物，|β_μ| 均增大，尤其是硫代巴比妥酸衍生物增大更为显著，表明此种非共轭取代基同样可以改善材料的非线性光学性质。此外，随葡萄糖基链增长时，光谱的变化并不十分显著，且由于所有吸收带均在紫外光区内，因此推测所有体系均有望成为具有高度透明性的非线性光学侯选材料。     

给体-桥-受体型系列C~6~0吡咯/二茂铁的电子结构及 二阶非线性光学性质的理 论研究

用INDO/2和INDO/CI方法,计算了系列给体-桥-受体(D-B-A)型C~6~0吡咯/二茂铁(C~6~0PY/Fc)的结构和电子光谱,计算结果和实验结果一致,在正确的光谱基础上,用INDO/CI-SOS公式计算了该系列分子的二阶非线性光学系数β~i~j~k,β~μ。考察了分子电子结构对β~μ影响的微观本质。     

给体-桥-受体型系列C~6~0吡咯/二茂铁的电子结构及 二阶非线性光学性质的理 论研究

用INDO/2和INDO/CI方法,计算了系列给体-桥-受体(D-B-A)型C~6~0吡咯/二茂铁(C~6~0PY/Fc)的结构和电子光谱,计算结果和实验结果一致,在正确的光谱基础上,用INDO/CI-SOS公式计算了该系列分子的二阶非线性光学系数β~i~j~k,β~μ。考察了分子电子结构对β~μ影响的微观本质。     

若干有机分子的二阶非线性光学极化系数色散关系

在INDO/CI方法基础上, 用自己编制的计算二阶非线性极化系数β_(ijk)程序, 计算了苯胺、硝基苯、对硝基苯胺和4-硝基-4′-胺基二苯乙烯的β_(ijk), 并研究了其对外部激光场频率的依赖关系。结果表明, 分子内的电荷转移是产生非线性光学现象的根本原因, 而作为外因的激光场对二阶非线性光学系数的大小和方向也有直接的重要作用。当激光场频率与分子的共振频率接近时, 二阶非线性极化系数变得非常大, 在共振频率附近, β_(ijk)改变符号且Kleinman对称性被打破。     

方酸与某些偶氮化合物的反应

作为非苯系芳香性化合物和有机插烯二元酸,双功能性的方酸,可与许多亲核试剂反应并生成相应的双取代产物,通常都很难生成单取代产物。当它与芳环直接相连时会产生惊人的深色位移,这类化合物有诱人的应用前景。考虑到偶氮染料在染料工业中的作用和地位,我们试图在方酸衍生物中引入偶氮基,     

Polyesters. I. Rate of polyesterification of γ-arylitaconic acids with ethylene glycol

A kinetic study of the polyesterification reaction of γ-phenyl- γ-p-methoxyphenyl-, and γ-p-chlorophenylitaconic acids (1 mole) with ethylene glycol in the presence or in absence of p-toluenesulfonic acid as a catalyst has been carried out in order to show the effect of substituents on the rate and degree of polymerization. The reaction of 1 mole of the acid and an excess of ethylene glycol has also been studied. In all cases the reaction is found to follow the second-order rate equation. The mechanism of polyesterification has been discussed. In catalyzed polyesterification electron-withdrawing groups (CI) decrease the velocity of the reaction. The low values of ρ in both the auto-catalyzed and catalyzed reaction indicate that this polyesterification is slightly sensitive to the polar nature of the substituent.     

芳基异方酰胺与HMPA及一些羧酰胺的反应

研究了1,3-双芳基异方酰胺与六甲基磷酰三胺(HMPA)及其它羧酰胺的反应制得了15个既含芳胺基又含脂肪基的不对称方酰胺。该反应提供了制备既含芳胺基又含二甲胺基、甲胺基和乙胺基的不对称方酰胺的较为有效的方法。对反应机理作了初步讨论。     

1,3-二-(3,3-二甲基-2-甲烯假吲哚)方酸菁染料的合成及其晶体结构

合成了两个新型方酸菁染料3和5。在催化下,2,3,3-三甲基假吲哚不需N- 烷基化,可直接与方酸反应。反应过程中发生了明显的质子转移。结晶学数据表明,分子3的整体位于同一平面;溶剂苯规则地排在方酸四碳的周围, 后者酷似电子陷肼。染料5有良好的水溶性。     

Calculations on the spectra and nonlinear third-order optical susceptibility of c70

The equilibrium geometry and UV-visible spectra of C₇₀ were examined using semiempirical INDO /2 and INDO /CI methods. The results obtained are in good accord with experimental results. On the basis of correct electronic spectra, calculations of the nonlinear third-order optical susceptibility (γijkl) of C₇₀ were performed using the INDO /SDCI method combined with a sum-over-states expression. The calculated value for <γ> (-2 ω, ω, ω, O) is 0.882 × 10^?33 esu (ω = 1.91 μm), which is in good agreement with observation. © 1994 John Wiley & Sons, Inc.     

13N-NMR spectroscopy. XXXV. Sequence analysis of alternating and random copolyamides made up of aliphatic and aromatic ω-amino acids

Alternating copolyamides of various ω-amino acids were synthesized by base-catalyzed polycondensation of N-isothiocyanatoacyl ω-amino acids in solution. Derivatives of the following amino acids were used: glycine, β-alanine, γ-aminobutyric acid, δ-aminovaleric acid, ε-aminocaproic acid, D ,L -β-aminobutyric acid, trans-4-aminocyclohexane 1-carboxylic acid, 4-aminophenyl acetic acid, 3-aminobenzoic acid, 4-aminobenzoic acid, 3-amino-4-methyl benzoic acid, and 4-amino-3-methyl benzoic acid. The base-catalyzed polycondensation at lower temperatures gave purer products than the bulk condensation at 180–200°C. ¹³C-NMR and natural-abundance ¹⁵N-NMR spectra measured in trifluoroacetic acid demonstrate that in most cases undisturbed alternating sequences were obtained. Strong neighboring residue effects and long-range sequence effects were found in the ¹⁵N-NMR spectra, and structure/shift relationships are discussed. The sequences of copolyamides obtained by copolymerizations of lactams or β-amino acid N-carboxyanhydrides were investigated by both ¹⁵N-NMR and ¹³C-NMR spectroscopy. ¹³C-NMR spectroscopy was found to be more useful if the copolyamides consist of ω-amino acid units of different chain length. However, ¹⁵N-NMR spectroscopy is more suited if the monomer units differ exclusively by their substituents.     

若干有机非线性光学材料的分子设计及三阶非线性光学性质的理论研究

以ＩＮＤＯ／ＳＣＩ方法为基础,利用完全态求和（ＳＯＳ）公式,计算了若干有机非线性光学材料分子的三阶非线性光学系数γ（－ω; ω, －ω, ω）和γ（０; ０, ０, ０）,研究了γ与分子骨架、给电子取代基、噻吩环数目即：共轭分子链长的关系。设计了较大γ的新型非线性光学材料分子。     

N-芳基氮氧方酸的合成研究

N-芳基氮氧方酸(3-芳胺基-4-羟基-3-环丁烯二酮)是合成不对称方酸衍生物的关键中间体之一，开展了对其合成方法的研究，发现并实现了方酸与芳伯胺在水中的脱水反应，制得17个N-芳基氮氧方酸3a～3q，其中N-8'-喹啉基氮氧方酸(3q)具有热致变色性质，根据实验事实，提出了可能的反应历程。该合成方法产率较高，产物易于分离纯化，是制备N-芳基氮氧方酸简便有效的好方法。     

(苯氧苯胺基)方酸内鎓盐的合成

方酸是一种结构特殊的二元酸,它的主要反应是其衍生物化反应,生成插烯的二元羧酸的衍生物,其中1,3—二取代衍生物在农业、医药、光化学及染料等方面有极大的应用价值.鉴于此,我们研究了三类二苯醚胺与方酸的反应,合成路线如下:     

Effect of acetylene on the γ-radiation-induced polymerization of ethylene

The effects of acetylene on the γ-radiation-induced polymerization of ethylene were studied from the viewpoint of the gaseous products and polymer structure. The experiments were carried out under a pressure of 400 kg/cm²; the temperature was 30°C; the does rate was 1.1 × 10⁵ rad/hr; and the acetylene content was 0–20%. The solid polymer was obtained in the polymerization of ethylene containing 2.2% acetylene, while the monomer containing 19.7% acetylene gave a yellowish viscous oil. The polymer yield and molecular weight decreased remarkably with acetylene content. The main gaseous product was hydrogen, and trace amounts of butane, butene-1, butadiene-1,3, and benzene and its derivatives were also observed. The rate of formation of hydrogen was almost independent of acetylene content and there was no difference in acetylene contents before and after the irradiation was found. The infrared spectra of the polymers showed the presence of vinylidene, trans-vinylene, and terminal vinyl unsaturations, 1,4-disubstituted benzene, and carbonyl groups. The contents of trans-vinylene, terminal vinyl, and methyl groups increased with acetylene content, and that of vinylidene was independent of acetylene content. The monomer reactivity ratios of ethylene and acetylene were evaluated as 45.5 and 66.0, respectively. On the basis of the results, the effects of acetylene on the γ-radiation-induced polymerization of ethylene were discussed.