微电子光致抗蚀剂的发展及应用

光致抗蚀剂,又称光刻胶,是微电子工业中制作大规模和超大规模集成电路不可或缺的核心材料,因其在国民经济和国防建设中具有战略地位而备受研究者关注.本文梳理了光致抗蚀剂从早期的聚乙烯醇肉桂酸酯、环化橡胶-叠氮化合物、近紫外G线(436-nm)和I线(365-nm)酚醛树脂-重氮萘醌类光致抗蚀剂,到深紫外(248-nm和193-nm)、真空紫外(157-nm)光致抗蚀剂,再到极紫外(13.5-nm)、电子束、纳米压印、嵌段共聚物自组装、扫描探针等下一代光刻技术用光致抗蚀剂的发展脉络,综述了其研究进展.重点对深紫外化学增幅型光致抗蚀剂体系进行了总结,包括主体成膜树脂、光产酸剂以及溶解抑制剂、碱性化合物等添加剂,并介绍了下一代光刻技术用光致抗蚀剂的最新研究成果.最后对光致抗蚀剂未来的发展前景和方向进行了展望.     

一种适用于193nm光刻胶的硫盐光产酸剂的制备与性质

制备了一种阳离子含有萘基,阴离子分别为对 甲苯磺酸、甲磺酸及三氟甲磺酸的硫盐.它们有高的热解温度和在常用有机溶剂中较好的溶解性.测定了此类光产酸剂在水溶液及聚乙二醇固体膜层中的紫外吸收特性.结果表明,阴离子不含苯基时,在193nm处有很好的透明性.考察了其在低压汞灯照射下的光解性质,在254nm附近的吸收峰随光解进行迅速减弱.此类光产酸剂适用于氟化氩激光(193nm)等的化学增幅型光致抗蚀剂.     

硫鎓盐产酸剂的合成及其产酸效率

合成了6种适用于248 nm光致抗蚀剂的硫鎓盐产酸剂,其中吩噻(噁)体系的产酸剂为自行设计合成. 利用IR、H NMR、UV等测试技术进行了结构表征和紫外吸收测定,各化合物的最大紫外吸收在250～285 nm之间,吸收域较宽,适用性较强.同时,利用酸敏染料罗丹明B遇酸异构变色的特点,使用紫外!可见分光光度计定量检测了6种产酸剂在乙腈溶剂中的产酸效率,其中硫杂蒽酮系列的产酸剂产酸性能最好. 最后使用荧光追踪法研究了溶剂极性对产酸效率的影响,发现产酸剂的产酸性能同溶剂的选取密切相关,随着溶剂极性的减小,产酸效率随之降低. 对6种硫鎓盐的产酸效率检测结果可以为产酸剂进一步用于248 nm光致抗蚀剂配方提供详细的参考.     

连苯三酚缩二乙烯基苯树脂活性醚化物的合成与成像应用

通过乙烯基乙醚和连苯三酚缩二乙烯基苯树脂( PDVB resin)的羟基加成,合成了具有缩醛结构的活性醚化物,并对该活性醚化物的合成条件进行优化.这种具有缩醛结构的活性醚化物具有常温酸解和热解性能,作为阻溶促溶剂可用于常温化学增幅阳图感光成像和阳图热敏成像中.用于阳图热敏CTP感热成像配方中,使得版材具有高感度、高抗碱性、高稳定性;用于阳图CTcP感光成像配方中,使得该版材的综合成像性能优良;用于正性光致抗蚀剂成像配方中,使得该正性光致抗蚀剂具有高感度和高分辨率.     

新型硫鎓盐产酸剂的合成及其产酸效率研究

本文合成了六种适用于248nm光致抗蚀剂的产酸剂,其中吩噻口恶 体系的产酸剂由本研究室自主设计合成。六种产酸剂均通过IR,HNMR,UV等进行了结构表征,并利用酸敏染料遇酸异构变色的特点定量检测了六种产酸剂的产酸效率,同时使用荧光追踪法研究了溶剂极性对产酸效率的影响,优选出了硫杂蒽酮系列的产酸剂,为进一步用于248nm光致抗蚀剂提供参考。     

水溶性光致抗蚀剂研究进展

本文按传统光化学反应型和化学增幅型两种类型对近10年水溶性光致抗蚀剂的发展状况做了分类总结,并重点介绍了成像反应原理和各体系的优缺点.     

近红外二区活体成像技术及其应用研究进展

近红外二区（NIR Ⅱ,1000～1700 nm）生物成像作为近年来新生的光学成像技术,相对于传统的近红外一区（NIR I,750～900 nm）和可见光（Vis,400～750 nm）成像,由于其荧光波长更长,生物组织的自发荧光背景更低,光子散射值更低,其组织穿透深度更深,该技术更适合于活体原位成像.本文综述了近红外二区荧光成像技术的发展及其在活体成像方面的应用,总结了各项技术的特点,最后对该研究方向的发展前景进行了展望,指出通过化学材料、光电仪器和多模态技术等多方面的持续发展,有望推动近红外二区活体成像技术的临床转化.     

193nm化学放大光刻胶研究进展

193 nm光刻胶主要有化学/非化学放大、分子玻璃和无机-有机杂化等类型。目前,商业化193 nm光刻胶基本为化学放大型,主要成分包括聚合物树脂、光致产酸剂、添加剂(碱性添加剂、溶解抑制剂等)和溶剂等。本文从光刻胶的成分出发介绍193 nm化学放大胶的研究进展,概述目前应用及研究中出现的代表性193 nm化学放大胶,总结其优缺点及未来可能的发展方向。     

二次离子质谱-激光扫描共聚焦显微镜联用对单细胞显微成像-原理及应用

二次离子质谱(SIMS)分析主要用于半导体、地质等领域材料表面分析,随着科学仪器技术的发展,近年来,SIMS在生命科学领域中得到了越来越广泛的应用。SIMS可以实现对样品表面的质谱分析、化学成像以及深度剖析。三维SIMS成像分析的横向分辨率可达80~100 nm,纵向分辨率1~5 nm。但是,由于缺少特异性指示亚细胞结构的碎片离子,单细胞SIMS成像分析仍然面临着诸多挑战。激光扫描共聚焦显微成像(LSCM)作为一种单细胞成像技术已日趋成熟,可以对单细胞中的荧光分子或者对荧光标记的目标分子、细胞器成像,获得高分辨率亚细胞结构成像图。因而,LSCM在单细胞形貌分析上的优势和SIMS在单细胞化学成像方面的优势可以有效互补,其联合应用能显著提升单细胞分析的应用范围、深度和结果的准确性。本文重点介绍SIMS成像以及SIMS-LSCM联用成像在单细胞成像研究中的应用进展,在总结、评述该领域代表性工作的同时,对SIMS-LSCM联用成像在化学和生命科学研究,特别是在细胞生物学和药物发现领域的应用前景进行了展望。     

单分子定位超分辨显微成像有机荧光探针的研究进展

在生物医学领域,对纳米尺寸级别的微小生物目标进行精确定位研究具有非常重要的意义,而光学显微成像技术为此提供了强有力的工具。 光学显微成像技术受到光学衍射极限的限制,难以分辨尺寸在衍射极限(<200 nm)以下的生物结构,无法直接获取微小生物结构信息,阻碍了生物医学的进一步发展。 近年来,随着纳米分辨显微成像技术的出现,新型荧光探针的开发、成像系统与设备的不断发展及成像算法不断完善地深入结合,促进了光学衍射极限以下尺寸微观目标的研究。 基于单分子定位的超分辨荧光显微成像(SMLM)包括光激活定位成像(PALM)与随机光学重构超分辨成像(STORM),将有机荧光探针与超分辨光学显微成像技术紧密结合在一起,荧光探针的光物理性质直接决定着超分辨成像结果的好坏。 因此,设计不同性能的荧光探针可以实现超精细结构的不同超分辨成像,为研究其生物学功能提供了有力的工具。 本文着重围绕基于SMLM的原理、有机荧光探针的设计要求、用于SMLM的荧光探针种类及其生物应用等方面进行总结综述,指出了单分子定位成像上存在的不足,并对其发展方向进行了展望,希望为对超分辨成像研究感兴趣或初涉该领域的研究者提供成像理论与探针设计方面的帮助。     

193 nm resists and lithography

A review of recent efforts to develop photoresist materials and processes for 193 nm (ArF excimer laser) photolithography is reported. Three categories of resist processes are discussed: (1) conventional single layer, (2) bilayer and (3) surface-imaged resist processes. To date, materials have been developed for each process which exhibit resolution to less than 0.25 μm with sensitivities of less than 50 mJ/cm².     

Photokeratitis from 193 nm argon-fluoride laser radiation

The threshold for photokeratitis at 193 nm was obtained for the rabbit cornea using an ArF excimer laser. Because ablation occurs at a level below that for photokeratitis, it was necessary to expose the cornea to a lengthy series of low-energy exposures. It is concluded that the 193 nm photons have such a shallow penetration depth, being limited to the outermost epithelial cells, that classical photokeratitis occurs from the fluorescence emitted at the corneal epithelial absorption site. An intact tear film may help to protect the cornea from low-level, scattered 193 nm laser radiation.     

On the iron oxide neutral cluster distribution in the gas phase. I. Detection through 193 nm multiphoton ionization

Iron oxide (FemOn) neutral clusters are generated in the gas phase through laser ablation of the metal and reaction with various concentrations of O2 in He. The mixture of expansion gas and neutral FemOn cluster species is expanded through a supersonic nozzle into a vacuum system, in which the clusters are ionized by an ArF excimer laser at 193 nm, and the ions are detected and identified in a time-of-flight mass spectrometer. In this report, the experimental parameters that influence the observed cluster distributions, such as ablation laser power, expansion pressure, vacuum system pressure, and 193 nm ArF ionization laser power, are explored. In the second paper in this series, the effect of the ionization laser wavelength (355 nm, 193 nm, 118 nm) on the observed cluster ion distribution is explored. The cluster ion distribution observed employing 193 nm laser ionization, is sensitive to the neutral cluster distribution as evidenced by the change in the observed time-of-flight mass spectra with changes in laser power, growth conditions, and expansion conditions. The thermodynamically stable neutral clusters for saturated O2 growth conditions are suggested to be of the forms FemOm, FemO(m+1), and FemO(m+2); which one of these series of neutral clusters is most stable depends on the size of the cluster. For m < 10, FemOm is the most stable neutral cluster series, for 10 < or = m < or = 20, FemO(m+1) is the most stable neutral cluster series, and for 21 < or = m < = 30, FemO(m+2) is the most stable neutral cluster series. Some neutral cluster fragmentation is clearly present for 193 nm ionization due to multiphoton absorption in both the neutral and ionic cluster species.     

EVALUATION OF SKIN CANCER RISK RESULTING FROM LONG TERM OCCUPATIONAL EXPOSURE TO RADIATION FROM ULTRAVIOLET LASERS IN THE RANGE FROM 190 TO 400 nm

The relative risk of occupational exposure to radiation from UV lasers was estimated using a mathematical model based on both epidemiological data and animal experiments. Calculations were performed for the 193 nm ArF excimer laser cornea shaping, the 308 nm XeCl excimer laser for coronary angioplasty, and other UV lasers in a laboratory environment. The model included the effects of direct exposure and exposure to scattered radiation. The results show that for the two medical applications the increase in the relative risk is comparable to that of one additional day of sunbathing per year. For subjects exposed to UV lasers in a laboratory setting, the relative risk may increase to a value comparable to that of people with an outdoor profession.     

Studies of Space and Time Resolved Emission Measurements of an ArF Excimer Laser Ablated Plasma

Abstract

A laser ablated plasma created by an ArF excimer laser of wavelength of 193 nm, laser power of 150-200 mJ, repetition rate of 1 Hz, and zinc, copper, iron and nickel targets was studied. Quantitative emission studies are reported that are both space and time resolved. The space results of the laser ablated plasma suggest a confined plasma with a gaussian type distribution of atoms and ions. The time resolved studies show a maximum emission signal occurring at approximately 20 μs with a lifetime of less than 100 μs.     

基于大气压下介质阻挡放电抑制LA-ICP-MS分析中元素分馏效应研究

采用自制的大气压下介质阻挡放电装置串联在激光剥蚀池与ICP炬管之间, 对激光剥蚀产生的气溶胶进行预电离. 结果表明, 元素瞬时信号轮廓的平滑度得以改善, 元素分析信号精密度(RSD, n=3)可提高2.55％. 在ArF准分子激光(193 nm)和Nd∶YAG 固体激光(213 nm)两种不同波长的激光剥蚀系统中, 元素分馏因子均比常规模式下更接近于1, 表明采用介质阻挡放电对气溶胶预电离后元素分馏效应得以有效抑制. 相比两种不同波长的激光剥蚀系统, 介质阻挡放电对213 nm固体激光的元素分馏效应改善作用明显.     

Recent trends and developments in laser ablation-ICP-mass spectrometry

The increased interest in laser technology (e.g. for micro-machining, for medical applications, light shows, CD-players) is a tremendous driving force for the development of new laser types and optical set-ups. This directly influences their use in analytical chemistry. For direct analysis of the elemental composition of solids, mostly solid state lasers, such as Nd:YAG laser systems operating at 1064 nm (fundamental wavelength), 266 nm (frequency quadrupled) and even 213 nm (frequency quintupled) have been investigated in combination with all available inductively coupled plasma mass spectrometers. The trend towards shorter wavelengths (1064 nm - 157 nm) was initiated by access to high quality optical materials which led to the incorporation of UV gas lasers, such as excimer lasers (XeCl 308 nm, KrF 248 nm, ArF 193 nm, and F2 157 nm) into laser ablation set-ups. The flexibility in laser wavelengths, output energy, repetition rate, and spatial resolution allows qualitative and quantitative local and bulk elemental analysis as well as the determination of isotope ratios. However, the ablation process and the ablation behavior of various solid samples are different and no laser wavelength was found suitable for all types of solid samples. This article highlights some of the successfully applied systems in LA-ICP-MS. The current fields of applications are explained on selected examples using 266 nm and 193 nm laser ablation systems.     

ArF EXCIMER LASER-INDUCED BUBBLE FORMATION DURING IRRADIATION OF NaCl SOLUTIONS

Abstract During application of the 193 nm excimer laser to vitreoretinal surgery, very deep cutting of the retina of about 100 μm/pulse was detected at the energy fluence in the range of 0.25–0.35 J/cm²/pulse. At the surface of the ablating tip insoluble bubbles were observed during the irradiation. In this paper we study production of these bubbles in aqueous solutions of sodium chloride. The yield of gaseous photoproducts was measured as a function of NaCl concentration and energy fluence. At concentrations of 100 g/L powerful water vapor bubbles and shock waves were observed. A mechanism of soft tissue cutting by the 193 nm laser in highly absorbing liquid media is suggested that explains the features of vitreoretinal ablation with this system: (1) the high cutting depth when the tip touches the tissue and (2) the absence of cutting when the tip is not in contact with the tissue. The advantages of the ArF laser for microsurgery of internal organs are discussed.     

PHOTOCHEMISTRY OF DNA USING 193 nm EXCIMER LASER RADIATION

Photoproducts in double-stranded DNA induced by 193 nm radiation have been investigated. Double-stranded, supercoiled pBR322 DNA in buffered aqueous solution was exposed to varying fluences of 193 nm radiation from an ArF excimer laser. The quantum yields for formation of cyclobutylpyrimidine dimers, frank strand breaks and alkali labile sites were calculated from the conversion of supercoiled (Form I) DNA to relaxed (Form II) DNA after treatment with Micrococcus luteus dimer-specific endonuclease, no treatment, or treatment with alkali and heat, respectively. The quantum yields were 1.65 (+/- 0.03) X 10(-3) for pyrimidine dimers, 9.4 (+/- 3.2) X 10(-5) for frank strand breaks and 9.6 (+/- 3.6) X 10(-5) for alkali labile sites. The quantum yields for pyrimidine dimers and strand breaks and alkali labile sites were not affected by 10 nM mannitol. The relative quantum yields for these DNA photoproducts induced by 193 nm radiation differed markedly from those produced by 254 nm radiation.