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1.
Stimulated photoluminescence emission and trap states in Si/SiO2 interface formed by irradiation of laser 下载免费PDF全文
Stimulated photoluminescence (PL) emission has been observed from an oxide structure of silicon when optically excited by a radiation of 514nm laser. Sharp twin peaks at 694 and 692nm are dominated by stimulated emission, which can be demonstrated by its threshold behaviour and linear transition of emission intensity as a function of pump power. The oxide structure is formed by laser irradiation on silicon and its annealing treatment. A model for explaining the stimulated emission is proposed, in which the trap states of the interface between an oxide of silicon and porous nanocrystal play an important role. 相似文献
2.
The photoluminescence (PL) of nanocrystal present in porous silicon shifts from the near infrared to the ultraviolet depending on the size when the surface is passivated with Si-H bonds. After oxidation, the centre wavelength of PL band is pinned in a region of 700-750 nm and its intensity increases obviously. Calculation shows that trap electronic states appear in the band gap of a smaller nanocrystal when Si = O bonds or Si-O-Si bonds are formed. The changes in PL intensity and wavelength can be explained by both quantum confinement and trap states in an oxidation layer of nanocrystal. In the theoretical model, the most important factor in the enhancement and the pinning effects of PL emission is the relative position between the level of the trap states and the level of the photoexcitation in the silicon nanocrystal. 相似文献
3.
Hole-net structure silicon is fabricated by laser irradiation and annealing,on which a photoluminescence (PL) band in a the region of 650–750 nm is pinned and its intensity increases obviously after oxidation.It is found that the PL intensity changes with both laser irradiation time and annealing time.Calculations show that some localized states appear in the band gap of the smaller nanocrystal when Si=O bonds or Si–O–Si bonds are passivated on the surface.It is discovered that the density and the number of Si=O bonds or Si–O–Si bonds related to both the irradiation time and the annealing time obviously affect the generation of the localized gap states of hole-net silicon,by which the production of stimulated emission through controlling oxidation time can be explained. 相似文献
4.
Silicon nanoporous pillar array (Si-NPA) is a micron-nanometer hierarchical structure which might be used as functional substrates for constructing optoelectronic nanodevices. This makes understanding the photolumines- cence (PL) from Si-NPA important. We measure the PL of Si-NPA in the range of 11-300K. By analyzing the evolution of the peak energy and intensity with temperature, the ultraviolet, blue, orange and red PL bands from Si-NPA are attributed to the radiative recombination through the deep-levels in silicon oxide, oxygen-related defect states in silicon nanocrystallites (nc-Si), band-to-band transition within nc-Si, and surface/interface states of nc-Si or between nc-Si and SiOx, respectively. At least two non-radiative recombination processes, which are activated at different temperature ranges, are proposed for the PL intensity variation with temperature. These results might provide strong foundations for designing and constructing optoelectronic devices based on silicon nanostruetures. 相似文献
5.
A europium complex Eu (DBM)3 TPPO (Eu tris(benzoylmethide)-(triphenylphosphine oxide)) and silicon nanoparticles have been hybridized.The hybridization can evidently change the photoluminescence (PL) characteristics of the Eu complex in the following aspects:under an excitation of 390nm,the intensity of the PL peak at 611nm due to the ^5Du-^7F2 transition of the Eu^3 ions has been increased by 30%,and thc integrated PL intensity in the visible range has been increased by nearly 3 times;the PL excitation efficiency beyond 440nm has been improved cvidently;the peak in the PL excitation spectrum shifts from 408nm to 388nm,and the PL decay time decreases from 2.07 to 0.96μs,The experimental results indicatde that in the PL process,the photoexcited energy may transfer from the silicon nanoparticlcs to the Eu^3 ions. 相似文献
6.
Enhanced photoluminescence (PL) at room temperature from thermally annealed a-Si:H/SiO2 multilayers is observed through the step-by-step thermal post-treatment. The correlation between the PL and the crystallization process is studied using temperature-dependent PL, Raman, cross section high-resolution transmission electron microscopy (XHRTEM) and x-ray diffraction (XRD) techniques. An intensified PL band around 820 nm is discovered from the sample annealed near the crystallization onset temperature, which is composed of two peaks centred at 773 nm and 863 nm, respectively. It is found that the PL band centred at 863 nm is related to the pseudo nanocrystal (p-nc-Si) silicon, and the PL band centred at 773 nm is attributed to Si = O bonds stabilized in the p-nc-Si surface. 相似文献
7.
Measurement of Refractive Index for High Reflectance Materials with Terahertz Time Domain Reflection Spectroscopy 下载免费PDF全文
A method to measure the refractive index for high reflectance materials in the terahertz range with terahertz time domain reflection spectroscopy is proposed. In this method, the THz waveforms reflected by a silicon wafer and high reflectance sample are measured respectively. The refractive index of the silicon wafer, measured with the THz time domain transmission spectroscopy, is used as a reference in the THz time domain reflective spectroscopy. Therefore, the complex refractive index of the sample can be obtained by resorting to the known reflective index of the silicon and the Fresnel law. To improve the accuracy of the phase shift, the Kramers-Kronig transform is adopted. This method is also verified by the index of the silicon in THz reflection spectroscopy. The bulk metal plates have been taken as the sample, and the experimentally obtained metallic refractive indexes are compared with the simple Drude model. 相似文献
8.
Porous silicon (PS) light-emitting diode (LED) with an ITO/PS/p-Si/Al structure was fabricated by anodic oxidation method. Photoluminescence (PL) of the PS LED was measured with a peak at 593 nm, and electroluminescence (EL) was measured with a peak at 556 nm under the conditions of 7.5-V forward bias and 210-mA current intensity. The spectral width of EL was measured to be about 160 nm. 相似文献
9.
Porous silicon (PS) light-emitting diode (LED) with an ITO/PS/p-Si/Al structure was fabricated by anodic oxidation method. Photoluminescence (PL) of the PS LED was measured with a peak at 593 nm, and electroluminescence (EL) was measured with a peak at 556 nm under the conditions of 7.5-V forward bias and 210-mA current intensity. The spectral width of EL was measured to be about 160 nm. 相似文献
10.
Photoluminescence and electroluminescence properties of ZnO films on p-type silicon wafers 下载免费PDF全文
A simplified n-ZnO/p-Si heterojunction has been prepared by growing
n-type ZnO rods on p-type silicon wafer through the chemical vapour
deposition method. The reflectance spectrum of the sample shows an
independent absorption peak at 384 nm, which may be originated from
the bound states at the junction. In the photoluminescence spectrum a
new emission band is shown at 393 nm, besides the bandedge emission
at 380 nm. The electroluminescence spectrum of the n-ZnO/p-Si
heterojunction shows a stable yellow luminescence band centred at 560
nm,which can be attributed to the emission from trapped states.
Another kind of discrete ZnO rod has also been prepared on such
silicon wafer and is encapsulated with carbonated polystyrene for
electroluminescence detection. This composite structure shows a weak
ultraviolet electroluminescence band at 395 nm and a yellow
electroluminescence band. These data prove that surface modification
which blocks the transverse movement of carriers between neighbouring
nanorods plays important roles in the ultraviolet emission of ZnO
nanorods. These findings are vital for future display device design. 相似文献
11.
Huang Wei-qi Liu Shi-rong Qin Chao-jian Cai Shao-hong Xu Li Wu Ke-yue 《Frontiers of Physics in China》2007,2(1):72-75
Some kinds of low-dimensional nanostructures can be formed by the irradiation of laser on a pure silicon sample and SiGe alloy
sample. We have studied the photoluminescence (PL) of the hole-net structure of silicon and the porous structure of SiGe where
the PL intensity at 706 nm and 725 nm wavelength increases obviously. The effect of intensity-enhancing in the PL peaks cannot
be explained within the quantum confinement alone. We propose a mechanism on the increasing PL emission in the above structures,
in which the trap state of the interface between SiO2 and nanocrystal plays an important role.
相似文献
12.
将功率密度约为0.5 J·s-1·cm-2、脉冲宽度约为8 ns、束斑直径为0.045 mm、波长为1 064 nm的YAG激光束照射在硅样品表面打出小孔,在孔内的侧壁上形成较规则的网孔状结构;该结构有很强的光致荧光,其强度比该样品的瑞利散射强;发光峰中心约在700 nm处。在无氧化的环境里用激光加工出的硅样品几乎无发光,这证实了氧在光致荧光增强上起着重要作用。用冷等离子体波模型来解释孔侧壁网孔状结构形成的机理,并用量子受限-发光中心模型来解释纳米网孔壁结构的强荧光效应。当激光辐照时间为9 s时,孔洞侧壁上的网孔状结构较稳定,且有较强的光致荧光。 相似文献
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14.
采用超高真空化学气相淀积系统在SOI(绝缘体上硅)衬底上生长了Si0.82Ge0.18外延层,通过循环氧化/退火工艺,制备出Ge组分从0.24到1的绝缘体上锗硅(SGOI)材料.采用高分辨透射电镜、拉曼散射光谱和光致发光谱表征了其结构及光学性质,对氧化过程中SiGe层中的Ge组分和应变的演变进行了分析.最后制备出11 nm厚的绝缘体上Ge材料(GeOI),具有完整的晶格结构和平整的界面.室温下观测到绝缘体上Ge直接带跃迁光致发光,发光峰值位于1540 nm,发光
关键词:
GeOI
氧化
退火
光致发光谱 相似文献
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17.
Wei-Qi Huang Rong-Tao Zhang Feng Jin Shui-Jie Qin Shi-Rong Liu 《Optics Communications》2008,281(20):5229-5233
Stimulated emission has been observed from oxide structure of silicon when optically excited by 514 nm laser. The photoluminescence (PL) pulse has a Lorentzian shape with a full width at half maximum (FWHM) of 0.5-0.6 nm. The twin peaks at 694 nm and 692 nm are dominated by stimulated emission which can be demonstrated by its threshold behavior and transition from sub-threshold to linear evolution in light emission. The gain coefficient from the evolution of the peak-emission intensity as a function of the optically pumped sample length has been measured. The oxide structure was fabricated by laser irradiation and annealing treatment on silicon. A model for explaining the stimulated emission has been proposed in which the trap states of the interface between oxide of silicon and porous nanocrystal play an important role. 相似文献
18.
V. P. Martovitsky V. S. Krivobok 《Journal of Experimental and Theoretical Physics》2011,113(2):288-305
It is found that stressed luminescent samples of Si(001)/Si1 − x
Ge
x
/Si with a germanium concentration of up to 16% contain microcracks. In contrast to ordinary cracks, microcracks are characterized
by partial cracks of the substrate that are not perpendicular to the plane of the plate and are detected by specially designed
X-ray analysis techniques. In a 60-nm-thick layer of SiGe with a germanium concentration of 5%, individual microcracks arise
in samples near the edges of the same type, and the traces of these microcracks coincide with the ripple profiles of the corrugated
growth surface. As the germanium concentration increases, first, the number of microcracks near the edges of a sample increases,
while the corrugated growth relief nearly completely disappears, and then microcracks appear even in the central region of
the sample, thus leading to the vanishing of the curvature of the structure in this region without visible signs of plastic
relaxation. At the same time, even a thin (20 nm) layer of SiGe exhibits a layered structure, and diffuse scattering near
the peak of the SiGe layer increases, which points to the presence of fragments of the layer that are misoriented by ±0.015°;
the intensity of the diffuse scattering may amount to 0.5% of the layer intensity. A spatial analysis of the luminescence
of samples with microcracks shows that the emergence of microcracks hardly affects the peak position and the half-width of
the emission line of the SiGe layer. At the same time, the intensity of exciton emission from both the SiGe layer and the
bulk of silicon is significantly (several times) changed when passing to the regions with microcracks. All the phenomena observed
can be accounted for under the assumption that, between the stages of the loss of the plane crystallization front and the
development of plastic relaxation of misfit stresses, there exists an earlier unknown stage of growth in which the concentration
of nonequilibrium vacancies increases by four to five orders of magnitude and then the vacancies condensate into micropores. 相似文献
19.
The photoluminescence and reflectance of porous silicon (PS) with and without hydrocarbon (CHx) deposition fabricated by plasma enhanced chemical vapour deposition (PECVD) technique have been investigated. The PS samples were then, annealed at temperatures between 200 and 800 °C. The influence of thermal annealing on optical properties of the hydrocarbon layer/porous silicon/silicon structure (CHx/PS/Si) was studied by means of photoluminescence (PL) measurements, reflectivity and ellipsometry spectroscopy. The composition of the PS surface was monitored by transmission Fourier transform infrared (FTIR) spectroscopy. Photoluminescence and reflectance measurements were carried out before and after annealing on the carbonized samples for wavelengths between 250 and 1200 nm. A reduction of the reflectance in the ultraviolet region of the spectrum was observed for the hydrocarbon deposited polished silicon samples but an opposite behaviour was found in the case of the CHx/PS ones. From the comparison of the photoluminescence and reflectance spectra, it was found that most of the contribution of the PL in the porous silicon came from its upper interface. The PL and reflectance spectra were found to be opposite to one another. Increasing the annealing temperature reduced the PL intensity and an increase in the ultraviolet reflectance was observed. These observations, consistent with a surface dominated emission process, suggest that the surface state of the PS is the principal determinant of the PL spectrum and the PL efficiency. 相似文献