共查询到19条相似文献,搜索用时 78 毫秒
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超高数值孔径Schwarzschild投影光刻物镜的光学设计 总被引:4,自引:0,他引:4
针对45nm及以下节点光刻相关技术的研究需求,确定了实验型投影光刻物镜的结构型式及设计指标。依据像差理论在非同心小遮拦的Schwarzschild反射系统中添加折射补偿镜组来进一步减小系统的中心遮拦,扩大像方数值孔径。设计了一套小中心遮拦,数值孔径为1.20的Schwarzschild折反式投影光刻物镜。设计结果表明,该投影光刻物镜工作带宽为100pm,像方视场为50μm,线中心遮拦比为13%,光学分辨力为80nm时(6240lp/mm)的系统调制传递函数大于0.45,全视场最大畸变为6.5nm,满足了45nm深紫外(DUV)浸没光刻实验平台对投影光刻物镜的需求。 相似文献
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介绍了微电子专用关键设备0.7μmi线投影曝光系统光刻物镜的主要技术指标,及设计试制中解决的关键单元技术和试制结果。结果表明,数值孔径NA=0.42,光刻工作分辨力0.6μm,像场尺寸14.6mm×14.6mm,畸变<±0.1μm的5倍精缩投影光刻物镜已试制成功。物镜具有双远心和有温度气压控制补偿,在满足高精度成像的同时,又能同时满足暗场同轴对准的特点。 相似文献
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沈诗欢李艳秋姜家华刘岩刘克刘丽辉 《光学学报》2017,(8):280-287
10nm以下光刻技术牵引极紫外(EUV)光刻物镜向超高数值孔径(NA)、组合倍率设计形式发展,物镜系统的入射角和入射角范围因此急剧增大,传统规整膜和横向梯度膜难以满足该类物镜系统反射率及像质要求。为此,提出了横纵梯度膜组合法,用横向梯度膜提高反射率,用纵向梯度膜提高反射率均匀性,并补偿横向梯度膜引入的像差。应用该方法对一套NA为0.50的组合倍率EUV光刻物镜进行膜层设计,设计结果表明,在保证系统成像性能不变的情况下,平均每面反射镜的反射率大于60%,各反射镜的反射峰谷值均小于3.5%,满足光刻要求,验证了横纵梯度膜组合法的可行性。 相似文献
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针对投影光刻物镜苛刻的像质要求,将计算机辅助装调(CAA)技术引入投影光刻物镜的装调过程中,建立了相应的数学模型。选取33个视场Fringe Zernike多项式的4~37项,以及畸变作为校正对象,并选取19个结构参量作为补偿器。通过将CODE V的宏功能和Matlab结合,采集灵敏度矩阵和像质数据。提出用奇异值分解求加权最小二乘解的方法计算补偿量,通过权重因子实现对不同视场上不同Zernike项系数或畸变的改进。将补偿后光刻物镜的性能和理想光刻物镜对比,发现相比于设计镜头,装调后镜头的平均波前均方根(RMS)大约差0.004λ,平均畸变大约差1nm,该方法可以将系统波像差和畸变恢复到接近设计水平。 相似文献
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S. Bollanti P. Di Lazzaro F. Flora L. Mezi D. Murra A. Torre 《Applied physics. B, Lasers and optics》2006,85(4):603-610
The design criteria of a Schwarzschild-type optical system are reviewed in relation to its use as an imaging system in an extreme ultraviolet lithography setup. Both the conventional and the modified reductor imaging configurations are considered, and the respective performances, as far as the geometrical resolution in the image plane is concerned, are compared. In this connection, a formal relation defining the modified configuration is elaborated, refining a rather naïve definition presented in an earlier work. The dependence of the geometrical resolution on the image-space numerical aperture for a given magnification is investigated in detail for both configurations. So, the advantages of the modified configuration with respect to the conventional one are clearly evidenced. The results of a semi-analytical procedure are compared with those obtained from a numerical simulation performed by an optical design program. The Schwarzschild objective based system under implementation at the ENEA Frascati Center within the context of the Italian FIRB project for EUV lithography has been used as a model. Best-fit functions accounting for the behaviour of the system parameters vs. the numerical aperture are reported; they can be a useful guide for the design of Schwarzschild objective type optical systems. 相似文献
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P. A. Prokopovich D. N. Frolov V. N. Frolov E. S. Klement’ev A. I. Grunin O. A. Dikaya U. Yu. Koneva G. G. Lyahov D. D. Efimov D. A. Serebrennikov V. V. Molchanov E. A. Severin O. V. Toropova A. Yu. Goikhman 《Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques》2018,12(4):744-755
The possibility of creating a laboratory UV photolithography setup with the help of commercially available components, such as optical-mechanical positioners and UV (ultraviolet) objective lenses, is discussed. Existing technical solutions concerning the optical systems of optical lithography, which rely on object?image reduction, are considered. The main trends in the design of such systems based on lens optics are analyzed. The theoretical and practical aspects underlying the design of similar systems are examined taking into account the basic conditions of image obtainment: congruence to the initial object, ray-path telecentricity, and achievement of the required parameters by linear fields and resolution. 相似文献
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光学光刻是目前超大规模集成电路(VLSI)制备中主要的微米和亚微米的图形加工技术,这一技术将继续保持其主导地位成为90年代VLSI发展的关键。本文综述了近年来光学光刻工艺的发展,主要介绍了G线(436nm)、Ⅰ线(365nm)和准分子激光光刻的现状,并对实现高的光学光刻分辨率所必须解决的透镜设计、套准精度和像场面积等问题作了详细描述。最后展望了发展方向、 相似文献
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宽带折反射式紫外光刻物镜的设计 总被引:1,自引:1,他引:0
本文设计了一种新系列的紫外或远紫外激光光刻物镜,它与国内外已有的紫外物镜相比,在365nm以下的光谱区,具有更宽的光谱工作带宽和较高的数值孔径.以宽带准分子激光或短弧汞氙灯做光源,无需另加色散补偿光学元件,可以进行同轴对准. 相似文献
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Rung-Ywan Tsai Chung-Ta Cheng Chin-Tien Yang Shuen-Chen Chen Chun-Chieh Huang Shih-Wei Chen Wen-Haw Lu 《Optical Review》2013,20(2):185-188
The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup head and consisting of a 405-nm-wavelength blue laser and a 0.85-numerical-aperture objective lens. Si substrates were patterned with submicron column patterns of various periods and aspect ratios by blue laser lithography using a sputtered Ge-Sb-Sn-O layer as a resist. The reflectance of the patterned Si substrate decreased to 3% on average in the 300–1000 nm wavelength range, with a low sensitivity to the angle of incident light. Such patterned substrates showed potential for application in crystalline Si solar cells. 相似文献
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The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography. 相似文献
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光刻投影物镜中透镜的面形精度是影响光学系统成像质量的关键因素之一。为实现透镜面形精度均方根(RMS)值优于2nm的高精度指标,提出一种轴向多点挠性支撑、径向三点可调式定位的光学透镜支撑结构。基于自重变形对支撑结构进行优化设计,深入分析在此支撑结构下自重和热载荷对透镜面形影响。结果表明,重力引起的透镜上表面面形RMS值为0.186nm,下表面面形RMS值为0.15nm。热载荷引起的上表面面形RMS值为0.55nm,下表面面形RMS值为0.54nm。采用这种透镜的支撑结构,能够满足光刻投影物镜中透镜的高精度面形要求。 相似文献
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针对DMD数字光刻,利用ZEMAX光学设计软件,设计出了一套适用于型号 0.7XGA DMD的10片式光刻投影物镜。该物镜采用非对称性结构,前组为改进的三分离物镜,后组为匹兹伐物镜加平像场镜,分辨率为2 m,近轴放大倍率为-0.15,像方数值孔径NA为0.158,全视场波像差小于/20 ,畸变小于0.014%,焦深为20 m,通过各项评价可知系统已经达到了衍射极限。在对该镜头进行公差分析后,利用Monte Carlo方法,模拟组装加工了100组镜头,得到90%的镜头MTF>0.46,50%的镜头MTF>0.51,证明了这种非对称性结构加工和校装的可能性。 相似文献
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Kuang-Lung Huang Mei Chu Cheng-Huan Chen Yu-Chung Lin Min-Kai Lee Sung-Ho Liu 《Optical Review》2011,18(1):72-75
An enlarging lens, composed of a charge-coupled-device (CCD) lens and an f-Θ lens, has been designed for real time laser lithography
visual inspection purposes. The object of this design is to enlarge the image of the working specimens in real time, which
used to be done by an independent magnifying system after the lithography process. F-Θ lens has both roles in this design,
being a laser lithography lens and a specimen imaging lens. A beam splitter has been inserted between the f-Θ lens and the
CCD lens, which divides the UV laser beam and the visible beam to form a coaxial system. This design also reaches the image
requirements in both wavelength bands, that the value of MTF is nearly diffraction-limit in UV wavelength and greater than
0.45 at 40 c/mm in visible wavelength. 相似文献