氢稀释对FTS沉积a-Si:H薄膜结构特性的影响

采用对靶磁控反应溅射技术,以氢气作为反应气体在不同的氢稀释比条件下制备了氢化非晶硅薄膜.利用台阶仪、傅里叶红外透射光谱、Raman谱和紫外-可见光透射谱测量研究了不同氢稀释比对氢化非晶硅薄膜生长速率和结构特性的影响.分析结果发现,利用对靶磁控溅射技术能够实现低温快速沉积高质量氢化非晶硅薄膜的制备.随着氢稀释比不断增加,薄膜沉积速率呈现先减小后增大的趋势.傅里叶红外透射光谱表明,氢化非晶硅薄膜中氢含量先增大后变小.而Raman谱和紫外-可见光透射谱分析发现,氢稀释比的增加使氢化非晶硅薄膜有序度和光学带隙均先增大后减小.可见,此技术通过改变氢稀释比R能够实现氢化非晶硅薄膜结构的有效控制.     

γ射线辐照对类金刚石薄膜中氢含量的影响

用射频等离子体方法在玻璃基底上制备了类金刚石 (DLC)薄膜。采用拉曼光谱、可见紫外近红外光谱、红外光谱等手段对经γ射线 (其平均能量为 1 2 5MeV)辐照后的类金刚石薄膜中氢含量及其变化进行了分析。结果表明 ,随γ射线辐照剂量的增加 ,薄膜中SP3C H键数量明显减少 ,与此同时 ,薄膜中氢含量也随之减少。当辐照剂量达 1× 10 5Gy时 ,SP3C H键减少了约 5 0 %。利用光学带隙数据、完全抑制网络 (FCN)理论及相关计算得出膜中氢含量为 10 %～ 2 5 % ,且其含量随辐照剂量的增加而减少。随辐照剂量增加 ,类金刚石薄膜附着力增加及红外透过率的降低进一步验证了上述结论的正确性。     

氧分压对溅射制备氧化镓薄膜结构及光学带隙的影响

在不同氧分压η(η=O2/[Ar+O2])实验条件下,通过直流反应溅射制备了氧化镓薄膜,然后在真空环境下进行高温再结晶热处理.用紫外-可见分光光度计(UV-Vis)研究了氧分压η对光学带隙Eg的影响.X射线衍射(XRD)和共聚焦拉曼散射光谱(Raman Scattering)分析显示:经900℃高温热处理后,薄膜呈结晶β相氧化镓,且晶粒尺寸随着氧分压的逐渐增加而变大.室温下由UV-Vis测试薄膜透过率并利用Tauc公式计算得到样品的光学带隙Eg在4.68—4.85 eV之间,且随氧分压η的逐渐增加而变大.     

沉积压力对氢化非晶硅薄膜特性的影响

采用等离子增强化学气相沉积(PECVD)系统,以乙硅烷和氢气为气源,普通钠钙玻璃为衬底制备了氢化非晶硅(a-Si∶H)薄膜,研究了沉积压力对非晶硅薄膜的沉积速率、光学带隙以及结构因子的影响。采用台阶仪、紫外可见分光光度计、傅里叶变换红外光谱仪和扫描电子显微镜等手段分别表征了a-Si∶H薄膜的沉积速率,光学带隙、结构因子和表面形貌。结果表明： 随着沉积压力的增加,沉积速率呈现先上升后下降的趋势,光学带隙不断下降。当沉积压力小于210 Pa时,以SiH键存在的H原子较多,而以SiH₂或SiH₃等形式存在的H较少; 当沉积压力大于210 Pa时,以SiH₂,(SiH₂)_n或SiH₃等形式存在的H较多。通过结构因子的计算,发现沉积压力在110～210 Pa的范围内沉积的薄膜质量较好。     

氢稀释对多晶硅薄膜结构特性和光学特性的影响

以SiCl₄和H₂为气源，用等离子体增强化学气相沉积技术，在250℃的低温下，研究氢稀释度对多晶硅薄膜结构特性的影响.实验结果表明，对于以SiCl₄和H₂组成的反应源气体，氢对薄膜生长特性的影响有异于SiH₄/H₂，在一定功率下，薄膜的晶化率随氢稀释度的减小而增加，在一定的氢稀释度下薄膜晶化度达到最大值85％；随着氢稀释度的继续减小，薄膜晶化度迅速下降，并逐渐向非晶态结构转变.随氢稀释度的减小，薄膜的光学带隙由 1.5eV减小至约1.2eV，而后增大至1.8eV.沉积速率则随氢稀释度的减小先增加后减小，在无氢条件下，无薄膜形成.在最佳氢稀释度条件下，Cl基是促进晶化度提高，晶粒长大的一个主要因素. 关键词： 多晶硅薄膜 微结构 氢稀释 4')" href="#">SiCl₄     

氮分压对氮化铜薄膜结构及光学带隙的影响

在不同的氮分压r(r=N₂/［N₂+Ar］)和射频功率P下，使用反应射频磁控溅射法，在玻璃基片上制备了氮化铜薄膜样品.用台阶仪测得了薄膜的厚度，用原子力显微镜、X射线衍射仪、紫外-可见光谱仪对薄膜的表面形貌、结构及光学性质进行了表征分析.结果表明，薄膜的沉积速率随P和r的增加而增大.薄膜表面致密均匀，晶粒尺寸为30nm左右.随着r的增加，薄膜颗粒增大，且薄膜由(111)晶面转向(100)晶面择优生长.薄膜的光学带隙E_g在1.47—1.82eV之间，随r的增加而增大. 关键词： 氮化铜薄膜 反应射频磁控溅射 晶体结构 光学带隙     

沉积参数对碳氮化硅薄膜化学结构及光学性能的影响

利用微波电子回旋共振（MW ECR）等离子体增强非平衡磁控溅射法制备了碳氮化硅（SiCN）薄膜。研究结果表明：硅靶溅射功率和氮气流量对薄膜化学结构、光学、力学等性能有很大影响。傅里叶变换红外光谱（FT IR）和X射线光电子能谱（XPS）表征显示，随着硅靶溅射功率由150W增加到350W，薄膜中C Si N键含量由14.3%增加到43.6％; 氮气流量的增大（2～15sccm）易于形成更多的sp2C＝N键和sp1C≡N键。在改变硅靶溅射功率和氮气流量的条件下，薄膜光学带隙最大值分别达到2.1eV和2.8eV。     

退火及超声处理对ZnO薄膜结构和发光特性的影响

 利用对向靶射频磁控溅射系统在Si（100）衬底上制备了ZnO薄膜,并对其进行了退火和超声处理。采用XRD,AFM和光致发光谱对其结构、表面形貌和性能进行了分析。结果表明：沉积态ZnO薄膜（002）择优取向稍差,尺寸较小,表面粗糙度较大。随退火温度的升高,颗粒粒径增大,样品的取向性和结晶度都明显变好,应力状态由压应力转变为张应力,粗糙度降低。超声处理缓解了薄膜中的张应力,晶粒尺寸更趋增大;用波长为280 nm的激发光激发薄膜时,沉积态薄膜无发光峰存在;随着退火温度升高,出现了一个378 nm的紫外峰和一个398 nm的紫峰;紫外峰峰值强度随退火温度升高不断增强,而紫峰的峰位随退火温度升高基本不发生变化,峰值强度增强;700 ℃退火后的薄膜经超声处理后,发光谱中出现了峰值波长为519 nm的绿色发光带。     

退火及超声处理对ZnO薄膜结构和发光特性的影响

利用对向靶射频磁控溅射系统在Si（100）衬底上制备了ZnO薄膜,并对其进行了退火和超声处理。采用XRD,AFM和光致发光谱对其结构、表面形貌和性能进行了分析。结果表明：沉积态ZnO薄膜（002）择优取向稍差,尺寸较小,表面粗糙度较大。随退火温度的升高,颗粒粒径增大,样品的取向性和结晶度都明显变好,应力状态由压应力转变为张应力,粗糙度降低。超声处理缓解了薄膜中的张应力,晶粒尺寸更趋增大;用波长为280 nm的激发光激发薄膜时,沉积态薄膜无发光峰存在;随着退火温度升高,出现了一个378 nm的紫外峰和一个398 nm的紫峰;紫外峰峰值强度随退火温度升高不断增强,而紫峰的峰位随退火温度升高基本不发生变化,峰值强度增强;700 ℃退火后的薄膜经超声处理后,发光谱中出现了峰值波长为519 nm的绿色发光带。     

Structural, optical and electrical properties of amorphous silicon thin films prepared by sputtering with different targets

Amorphous silicon (a-Si) films were prepared by sputtering method with polycrystalline and monocrystalline silicon targets. Structural, optical and electrical properties of the a-Si films have been systematically studied. The deposition power is from 100 to 200 W. Compared with the a-Si films deposited by using monocrystalline silicon target, the a-Si films prepared with polycrystalline silicon target exhibit better growth property, similar optical band gap, and own the highest mobility of 1.658 cm²/Vs, which make a good match with the optimal window of optical band gap for a-Si solar cells. The results indicated that the polycrystalline silicon target is superior to the monocrystalline silicon target when used to prepare a-Si films as the intrinsic layer in a-Si solar cells.     

Formation of Ge35In8S57 amorphous films for optical applications

Thin films of In-doped Ge-S in the form of Ge₃₅In₈S₅₇ with different film thickness were deposited using an evaporation method. The X-ray diffraction studies demonstrate that the as-prepared films are amorphous in nature for these films. Some optical constants were calculated at a thickness of 150, 300, 450 and 900?nm and annealing temperature of 373, 413, 437 and 513?K. Our optical observations show that the mechanism of the optical transition obeys the indirect transition. It was found that the energy gap, E_g, decreases from 2.44 to 2.20?eV with expanding the thickness of the film from 150 to 900?nm. On the other hand, it was found that E_g increases with annealing temperature from 373 to 513?K. The increment in the band gap can be attributed to the gradual annealing out of the unsaturated bonds delivering a decreasing the density of localized states in the band structure. Using the single oscillator model, the dispersion of the refractive index is described. The dispersion constants of these films were calculated with different both thickness and annealing temperatures. Additionally, both of nonlinear susceptibility, χ⁽³⁾ and nonlinear refractive index, n₂ were calculated.     

Effect of cadmium addition on the optical constants of thermally evaporated amorphous Se–S–Cd thin films

Se₇₅S_25−xCd_x is a promising ternary material, which has received considerable attention due to its applications in the fabrication of various solid state devices. These have distinct advantages, large packing density, mass replication, fast data rate, high signal-to-noise ratio and high immunity to defects. Measurements of optical constants (absorption coefficient, refractive index, extinction coefficient, real and imaginary part of the dielectric constant) have been made on Se₇₅S_25−xCd_x (where x = 0, 2, 4, 6 and 8) thin films of thickness 3000 Å as a function of photon energy in the wave length range 400–1000 nm. It has been found that the optical band gap and extinction coefficient increases while the value refractive index decreases on incorporation of cadmium in Se–S system. The results are interpreted in terms of the change in concentration of localized states due to the shift in Fermi level. Due to the large absorption coefficient and compositional dependence of reflectance, these materials may be suitable for optical disk material.     

Optical band gap and optical constants in a-Se80Te20−xPbx thin films

The optical constants (absorption coefficient, refractive index, extention coefficient, real and imaginary part of dielectric constant) have been studied for a-Se₈₀Te_20−xPb_x (where x = 0, 2, 6, 10) thin films as a function of photon energy in the wave length range (500–1000 nm). It has been found that the optical band gap increases while the refractive index and the extinction coefficient (k) decreases on incorporation of lead in Se–Te system. The value of absorption coefficient (α) and the extinction coefficient (k) increases, while the value of refractive index (n) decreases with incident photon energy. The results are interpreted in terms of the change in concentration of localized states due to the shift in fermi level.     

Optical band gap of Si nanoclusters

We discuss the nature of the optical transitions in porous silicon and in Si nanoclusters in the light of recent theoretical calculations. The accuracy of the different techniques used to calculate the band gap of Si nanoclusters is analyzed. We calculate the electronic structure of crystallites in the Si-III (BC8) crystalline phase which is known to have a direct gap and we examine the effect of quantum confinement on clusters of SiGe alloy and amorphous silicon. The comparison with the experiments for all the systems suggests the possibility of different channels for the radiative recombination.     

Compositional dependence of the optical properties of the amorphous GexTe1−x system

Optical absorption at room temperature of vacuum evaporated Ge_xTe_1−x (0.125?x?0.225) amorphous thin films has been studied as a function of composition. It was found that the optical absorption is due to a direct transition. The real and imaginary parts of the dielectric constant were determined. The single-oscillator energy (E_o) and the energy dispersion parameter (E_d) have been calculated and discussed in terms of the Wemple and Di-Domenico model. The relationship between the optical gap, the average heat of atomization and the coordination numbers has been determined. The optical properties of the amorphous thin films do not change monotonically with increasing Ge content. The observed behavior of the optical properties in the range of compositions studied are explained on the basis of the Bond Constraint Theory (BCT) and rigidity theory, which provide a powerful framework for understanding the structure and properties of amorphous materials. The non-monotonic variation of the optical properties indicates that a transition from floppy to rigid occurs in the Ge_xTe_1−x films.     

Spectral features of Ge50−ySbxTe50−x+y alloys where 0x15 and 0y30 in thin film state

Optical spectral features of Ge_50−ySb_xTe_50−x+y alloys where 0x15 and 0y30 in the thin film state were measured. The transmittance and reflectance have been measured at normal incidence at room temperature in the spectral range 190–2500 nm for all compositions with different thicknesses. Refractive index and extinction coefficient have been evaluated in the above spectral range. Band tail width and the band edge parameter were almost constant for all samples with different compositions. Absorption band spectrum on the basis of the imaginary parts of the dielectric constant, ε₂, was applied in evaluating the optical band gap.     

Optical harmonic generation in amorphous silicon nitride microcavities

Second harmonic (SH) and third harmonic (TH) generation in amorphous silicon nitride microcavity are experimentally investigated. The transmitted SH and TH signals are measured in the 0.9-1.4 μm spectral range, showing enhanced nonlinear conversion efficiency corresponding to resonant wavelength and optical band edges. The efficiencies of the SH and TH generation processes are found to be enhanced by about two and one orders of magnitude, respectively, in comparison with the case of reference amorphous silicon nitride sample. The SH spectra can be reasonably interpreted as due to surface/interface harmonic generation, while the TH signal is related to bulk isotropic third-order polarization. The results obtained for the TH signal are discussed in terms of the linear optical properties of amorphous silicon nitride thin films.     

Energy band and band-gap properties of deformed single-walled silicon nanotubes

The fantastic physical properties of single-walled silicon nanotubes (SWSiNTs) under mechanical strain make them promising materials for fabricating nanoscale electronic devices or transducers. Here we investigate the energy band and band-gap properties of the SWSiNTs calculated from the tight-binding model approximation. The results show that the band-gap properties are very sensitive to the deformation degree and the helicity of the SWSiNTs. The results can be employed to guide the design of nanoelectronic devices based on silicon nanotubes.