室温下Ga1-xHoxN (x=0.0 and 0.05)稀磁半导体薄膜磁性

采用热蒸镀技术和后续氨退火制备了Ho掺杂GaN稀磁半导体薄膜. X射线衍射分析表明,所有的峰属于六角纤锌矿结构. 利用扫描电子显微镜和能量色散谱分别进行了表面形貌和成分分析. 用振动样品磁强计在室温测定了Ga_1-xHo_xN(x=0.0,0.05)的室温铁磁性. 磁性测量结果表明,未掺杂薄膜GaN具有抗磁性行为,而Ho掺杂Ga_0.95Ho_0.05N的薄膜表现出铁磁行为.     

MOCVD生长AlGaN薄膜的X光电子能谱

用X光电子能谱和X射线衍射谱方法分析了MOCVD生长的AlGaN薄膜的实际表面形态和晶体结构基于XPS测量结果,通过分析计算,发现实际表面除GaN外存在Ga₂O₃和Al₂O₃及其它与O有关的络合物构成的混合氧化物覆盖层,估计覆盖层厚度约1.2nmXRD结果显示生长的AlGaN薄膜为以GaN(0002)取向为主的多晶结构。     

Cu掺杂Ga2O3薄膜的光学性能

采用射频磁控溅射和N₂气氛退火处理制备了多晶Ga₂O₃薄膜和Cu掺杂Ga₂O₃薄膜.用X射线衍射仪、紫外-可见分光光度计、荧光光谱仪对Ga₂O₃薄膜和Cu掺杂Ga₂O₃薄膜的结构和光学性能进行了表征.结果表明,Cu掺杂后Ga₂O₃薄膜的结晶质量变差,透过率明显降低,吸收率增加,光学带隙减小.本征Ga₂O₃薄膜在紫外、蓝光和绿光出现了发光带,Cu掺杂后紫外和蓝光发射增强,且在475 nm 处出现了一个新的发光峰.     

V2Ga5的晶体结构

本文利用单晶与粉末衍射方法测定了V₂Ga₅的晶体结构。V₂Ga₅属四方晶系,其单相区约为VGa₂—V₂Ga₅。在18℃的点阵常数是a=8.9540?,c=2.6892?,每个晶胞含有二个化合式量,空间羣为D_4h⁵—P4/mbm。V原子与Ga原子分别占据在4(h)与8(i),2(d)的等效位置上。参数为:x相似文献   

GaN薄膜的蓝光和红光发射机理研究

由于生长工艺的不完善，非掺杂GaN薄膜中通常存在未知的杂质和缺陷，产生与这些未知杂质和缺陷能级相关的发光。报道了非掺杂GaN薄膜的692nm红色发光．并研究了非掺杂GaN薄膜的蓝、红色发光的发射机理；利用作者提出的吸收归一化光致发光激发光谱，直接测量出了非掺杂GaN薄膜的蓝、红色发光的初始态能级，确定蓝色发光为施主-价带跃迁复合，而红色发光为施主-受主跃迁复合；给出了黄、蓝、红光的发射模型。所取得的结果对于确定未知杂质和缺陷的种类具有重要的参考价值。     

射频等离子体辅助MBE生长GaN及Mg掺杂的光致发光

采用射频等离子体辅助分子束外延(RF plasma-assisted MBE)系统生长非故意掺杂GaN和p型GaN,并且通过室温和低温光致发光(PL)谱测试研究了材料的发光特性及与杂质态的关系,对于GaN外延层出现的黄带发光进行分析。结果表明,富Ga条件下生长的GaN材料特性要优于富N生长的材料;非故意掺杂的富Ga样品中出现的黄带发光(YL)与GaN中生成能最低的氮空位(V_N)缺陷有关;不同的Mg掺杂浓度对样品的PL特性有较大的影响;结合Hall效应测量结果,认为在Mg重掺杂的样品中出现的黄带发光,与GaN的自补偿效应以及重掺杂导致的晶体质量下降有关。     

GaInP材料生长及其性质研究

用常压MOCVD在半绝缘GaAs衬底上生长了Ga_xIn_1-xP(x=0.476～0.52)外延层,对外延层进行了X光双晶衍射、Hall和光致发光(PL)测试.77K下电子迁移率达3300cm²/V.s(浓度为1.4×10¹⁶cm^-3).载流子浓度随生长温度升高,随Ⅴ/Ⅲ比的增大而降低,并提出P空位(V_p)是自由载流子的一个重要来源,17KPL谱中,Ga_0.5In_0.5P(Tg=650℃,Ⅴ/Ⅲ=70)的峰能为1.828eV,半峰宽为19meV.另外,在1.849eV处还有一较弱的峰,GaInP峰能和其计算的带隙最大相差113meV,这可能与GaInP中杂质或缺陷以及其中存在有序结构有关.     

He+辐照对Ga0.94Mn0.06As薄膜铁磁性的改善

离子辐照半导体可以很好的改善半导体材料的磁学性质.用He⁺ 辐照Ga_0.94Mn_0.06As薄膜,可以较方便的调制Ga_0.94Mn_0.06As 薄膜中产生铁磁性载体的浓度.由于空穴居间而导致Ga_0.94Mn_0.06As薄膜的铁磁性, 可以通过He⁺的辐照来得到改善,其结果是Ga_0.94Mn_0.06As薄膜的矫顽力可以增加3倍多. 当He⁺辐照流强增加时, 居里温度和沿着样品面外磁化难轴方向的饱和磁场都减小了. 被辐照的Ga_0.94Mn_0.06As薄膜的电学性质和结构特征显示, He⁺辐照Ga_0.94Mn_0.06As薄膜可以有控制地改善它的铁磁性, 其结果源于He⁺辐照Ga_0.94Mn_0.06As薄膜所诱导产生电缺陷对空穴的补偿, 而不是He⁺辐照改变了Ga_0.94Mn_0.06As薄膜的结构.     

光时分复用(OTDM)系统中基于电吸收调制器(EAM)的短脉冲光源及解复用器的设计考虑

研究了电吸收调制器(EAM)的衰减随外加反向电压增加而指数增加的情形下,短脉冲光源的脉冲输出和解复用器的开关窗口对EAM的消光效率、反向DC偏置电压以及正弦RF驱动信号的幅度等参量的依赖关系.在基于EAM的短脉冲光源中,输出脉冲的消光比等于EAM消光效率η与正弦驱动电压峰峰值V_pp的乘积,输出光脉冲的消光比和脉宽均与EAM的反向偏置电压无关,但输出脉冲的峰值功率与η、V_pp和V_b都有关系.在基于EAM的解复用器中,为了使解复用器的开关窗口近似为矩形,可利用EAM的削波效应,使V_pp/2>V_b.在EAM的消光效率η已知时,通过仔细设计反向DC偏置电压V_b和正弦驱动电压的峰峰值V_pp,达到OTDM解复用器所需要的开关窗口形状、宽度和消光比.     

蓝宝石衬底SnO2:Sb薄膜的制备及结构和光致发光性质

用射频磁控溅射法在蓝宝石(0001)衬底上制备出锑掺杂的氧化锡(SnO₂:Sb)薄膜.对制备薄膜的结构和发光性质进行了研究.制备样品为多晶薄膜，具有纯SnO₂的四方金红石结构.室温条件下对样品进行光致发光测量，在334 nm附近观测到紫外发射峰，并对SnO₂:Sb的光致发光机制进行了研究.     

Comparative study of different properties of GaN films grown on(0001) sapphire using high and low temperature AlN interlayers

Comparative study of high and low temperature AlN interlayers and their roles in the properties of GaN epilayers prepared by means of metal organic chemical vapour deposition on (0001) plane sapphire substrates is carried out by high resolution x-ray diffraction, photoluminescence and Raman spectroscopy. It is found that the crystalline quality of GaN epilayers is improved significantly by using the high temperature AlN interlayers, which prevent the threading dislocations from extending, especially for the edge type dislocation. The analysis results based on photoluminescence and Raman measurements demonstrate that there exist more compressive stress in GaN epilayers with high temperature AlN interlayers. The band edge emission energy increases from 3.423~eV to 3.438~eV and the frequency of Raman shift of $E_{2 }$(TO) moves from 571.3~cm$^{ - 1}$ to 572.9~cm$^{ - 1}$ when the temperature of AlN interlayers increases from 700~$^{\circ}$C to 1050~$^{\circ}$C. It is believed that the temperature of AlN interlayers effectively determines the size, the density and the coalescence rate of the islands, and the high temperature AlN interlayers provide large size and low density islands for GaN epilayer growth and the threading dislocations are bent and interactive easily. Due to the threading dislocation reduction in GaN epilayers with high temperature AlN interlayers, the approaches of strain relaxation reduce drastically, and thus the compressive stress in GaN epilayers with high temperature AlN interlayers is high compared with that in GaN epilayers with low temperature AlN interlayers.     

Intrinsic relationship between photoluminescence and electrical characteristics in modulation Fe-doped AlGaN/GaN HEMTs

The photoluminescence(PL) and electrical properties of Al GaN/GaN high electron mobility transistors(HEMTs) with different Fe doping concentrations in the GaN buffer layers were studied. It was found that, at low Fe doping concentrations,the introduction of Fe atoms can result in a downward shift of the Fermi level in the GaN buffer layer, since the Fe atoms substitute Ga and introduce an Fe_(Ga)~(3+/2+) acceptor level. This results in a decrease in the yellow luminescence(YL) emission intensity accompanied by the appearance of an infrared(IR) emission, and a decrease in the off-state buffer leakage current(BLC). However, a further increase in the Fe doping concentration will conversely result in the upward shift of the Fermi level due to the incorporation of O donors under the large flow rate of the Fe source. This results in an increased YL emission intensity accompanied by a decrease in the IR emission intensity, and an increase in the BLC. The intrinsic relationship between the PL and BLC characteristics is expected to provide a simple and effective method to understand the variation of the electrical characteristic in the modulation Fe-doped HEMTs by optical measurements.     

The influence of AlN/GaN superlattice intermediate layer on the properties of GaN grown on Si（111） substrates

AlN/GaN superlattice buffer is inserted between GaN epitaxiai layer and Si substrate before epitaxiai growth of GaN layer. High-quality and crack-free GaN epitaxiai layers can be obtained by inserting AlN/GaN superlattice buffer layer. The influence of AlN/GaN superlattice buffer layer on the properties of GaN films are investigated in this paper. One of the important roles of the superlattice is to release tensile strain between Si substrate and epilayer. Raman spectra show a substantial decrease of in-plane tensile strain in GaN layers by using AlN/GaN superlattice buffer layer. Moreover, TEM cross-sectional images show that the densities of both screw and edge dislocations are significantly reduced. The GaN films grown on Si with the superlattice buffer also have better surface morphology and optical properties.     

氮化蓝宝石衬底上GaN薄膜的微结构与光学性质

用透射电子显微镜(TEM),X射线衍射(XRD)和光荧光谱(PL)等测量手段研究了GaN薄膜的微结构和光学性质。样品是用光辐射加热MOCVD在蓝宝石衬底上制备的。随着衬底氮化时间的增加,扩展缺陷的密度显著增加。在位错密度增加一个数量级时,XRD摇摆曲线半宽度(FWHM)由11″增加到15″,PL谱的黄光发射从几乎可忽略增加到带边发射强度的100倍。结合生长条件,我们对黄光与微结构的关系作了讨论。     

Characteristics of GaN epilayer grown on Al2O3 with AlN buffer layer by molecular beam epitaxy

Double crystal rocking curve (DCRC), atomic force microscopy (AFM), scanning electron microscopy (SEM), and photoluminescence (PL) measurements on GaN epilayers grown with various thicknesses (3.4, 8.5, 17, 34, and 51 nm) of the AlN buffer layer were carried out to investigate the surface, the structural, and the optical properties of the GaN epilayers. The results of the DCRC, AFM, SEM, and PL measurements showed that the GaN epilayer grown on a 3.4 nm AlN buffer layer had the best quality. These results indicate that GaN active layers grown on 3.4 nm AlN buffer layers hold promise for potential applications in optoelectronic devices.     

Effect of double AlN buffer layer on the qualities of GaN films grown by radio-frequency molecular beam epitaxy

This paper reports that the GaN thin films with Ga-polarity and high quality were grown by radio-frequency molecular beam epitaxy on sapphire （0001） substrate with a double A1N buffer layer. The buffer layer consists of a high-temperature （HT） A1N layer and a low-temperature （LT） A1N layer grown at 800℃ and 600℃, respectively. It is demonstrated that the HT-A1N layer can result in the growth of GaN epilayer in Ga-polarity and the LT-A1N layer is helpful for the improvement of the epilayer quality. It is observed that the carrier mobility of the GaN epilayer increases from 458 to 858cm^2/V.s at room temperature when the thickness of LT-A1N layer varies from 0 to 20nm. The full width at half maximum of x-ray rocking curves also demonstrates a substantial improvement in the quality of GaN epilavers by the utilization of LT-A1N layer.     

Step-controlled strain relaxation in the vicinal surface epitaxy of nitrides

On-axis and vicinal GaN/AlN/6H-SiC structures grown under identical conditions have been studied by x-ray diffraction and transmission electron microscopy to demonstrate the distinctive features of vicinal surface epitaxy (VSE) of nitrides on SiC. In VSE, the epilayers are tilted from the substrate due to the out-of-plane lattice mismatch (Nagai tilts), and the in-plane mismatch strains are more relaxed. The majority of misfit dislocations (MDs) at the vicinal AlN/6H-SiC interface are found to be unpaired partial MDs that are geometrically necessary to correct the stacking sequences from 6H to 2H. This mechanism indicates that it is possible to develop "step-controlled-epitaxy" strategies to control strain relaxation by adjusting the substrate offcut angles.     

AlN/蓝宝石模板上生长的GaN研究

研究了在分子束外延制备的AlN/蓝宝石模板上采用金属有机物化学气相外延生长的非故意掺杂GaN的材料性质.采用X射线衍射(XRD)、透射电镜(TEM)和原子力显微镜研究了AlN模板的晶体质量和表面相貌对GaN的影响.结果表明,当AlN的表面粗糙度较小时,尽管AlN模板的位错密度较高((102)面XRD ω扫描半高全宽900—1500 arcsec),但生长得到的GaN依然具有和在蓝宝石衬底上采用"二步法"生长的GaN可比拟的晶体质量((002)面XRD ω扫描半高全宽200—30 关键词： 氮化镓 氮化铝 金属有机物化学气相外延     

Si基GaN的微结构表征

采用快速辐射加热/低压-金属有机化学气相淀积(RTP/LP-MOCVD)方法分别以AlN和阳极氧化铝为缓冲层材料在Si衬底上外延生长GaN薄膜,通过X射线衍射谱(XRD)、光荧光谱(PL)、拉曼散射谱(RamanScattering)等手段对它们的微结构进行了表征和分析,结果指出AlN是优良的缓冲层材料。     

初始化生长条件对a-GaN中应变的影响

利用高分辨X射线衍射(HRXRD)与拉曼散射光谱(Raman scattering spectra)研究了氮化处理与低温AlN缓冲层对低压金属有机化学气相沉积(LP-MOCVD)在r面蓝宝石衬底上外延的a面GaN薄膜中的残余应变的影响。实验结果表明:与氮化处理后生长的a-GaN相比,使用低温AlN缓冲层后生长的a-GaN具有较小的摇摆曲线的半高宽和较低的残余应变,而且其结构各向异性和残余应变各向异性也均有一定程度的降低。因此,与氮化处理相比,低温AlN缓冲层更有利于a-GaN的生长。