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1.
张静  付秀华  潘永刚 《光子学报》2014,41(3):303-306
为满足卫星激光通信中超高速数据传输的特殊要求,采用电子束和离子辅助沉积技术,制备了532 nm、632 nm和1 064 nm波长处高反射,808 nm和1 550 nm处高透射的多波段滤光膜.选取了H4和SiO2作为高低折射率材料,通过对膜系设计曲线的不断优化,减少了灵敏层的个数,得到了相对易于制备的膜系结构;采用电子束加热蒸发方法并加以离子辅助沉积系统制备薄膜, 采用光控与晶控同时监控的方法控制膜厚;通过不断调整工艺,提高了薄膜的抗激光损伤能力,减小了膜厚控制误差,提高了透射波段的透过率及反射波段的反射率,最终得到了光谱性能较好的滤光膜.该薄膜能够承受雨淋、盐雾、高低温等环境测试,满足使用要求.  相似文献   

2.
采用离子束溅射制备了Al F3、Gd F3单层膜及193 nm减反和高反膜系,分别使用分光光度计、原子力显微镜和应力仪研究了薄膜的光学特性、微观结构以及残余应力。在优选的沉积参数下制备出消光系数分别为1.1×10~(-4)和3.0×10~(-4)的低损耗AlF_3和GdF_3薄膜,对应的折射率分别为1.43和1.67,193 nm减反膜系的透过率为99.6%,剩余反射几乎为零,而高反膜系的反射率为99.2%,透过率为0.1%。应力测量结果表明,AlF_3薄膜表现为张应力而GdF_3薄膜具有压应力,与沉积条件相关的低生长应力是AlF_3和GdF_3薄膜残余应力较小的主要原因,采用这两种材料制备的减反及高反膜系应力均低于50 MPa。针对平面和曲率半径为240 mm的凸面元件,通过设计修正挡板,250 mm口径膜厚均匀性均优于97%。为亚纳米精度的平面元件镀制193 nm减反膜系,镀膜后RMS由0.177 nm变为0.219 nm。  相似文献   

3.
针对大口径光学元件溅射沉积膜厚不均匀的问题,采用离子束溅射平坦化层来改善光学元件表面粗糙度.利用膜厚检测仪测出光学元件沉积面上的中心区域以及各边缘区域的膜厚值,计算离子束在光学元件中心与边缘驻留时间比,并通过MATLAB拟合驻留时间分布规律,根据所得的数据进行逐级修正.实验结果表明,当驻留时间比优化为-26.6%时,可以实现在直径300~600mm大口径的光学元件上均匀镀膜,以熔石英表面上镀硅膜为例,溅射沉积6h,表面膜厚为212.4±0.3nm,薄膜均匀性达到0.4%.  相似文献   

4.
常温下,采用磁控溅射技术成功地在Ge基底上制备了类金刚石膜,并研究了溅射功率、碳氢气体与氩气流量比、溅射频率、基底负偏压等工艺参数对类金刚石膜沉积速率的影响和薄膜的光学性能。结果表明:溅射功率、溅射频率、碳氢气体与氩气流量比对沉积速率有显著的影响。沉积速率随着溅射功率的增大而增大,随着溅射频率的减小而增大。随着碳氢气体与氩气流量比、基底负偏压的增大沉积速率先增大后降低。制备的类金刚石膜具有较宽的光谱透明区,Ge基底单面沉积的类金刚石膜其峰值透过率最高达到63.99%。  相似文献   

5.
徐晓峰  邢怀中  杜西亮  范滨 《光子学报》2007,36(9):1691-1693
利用非均匀膜系理论对宽角度入射减偏振、减反射薄膜进行优化设计,分析了在宽角度入射的情况下,偏振光产生透过率不同的原因,选取了Na3AlF6、Ta2O5和Al2O3三种不同折射率材料,采用BK7作为基底,模拟设计了光谱区在500~560 nm波段、入射角为0~70°之间的多层减偏振、减反射薄膜,设计结果表明,薄膜的透过率得到大幅度提高.  相似文献   

6.
介绍了利用傅里叶变化法设计多波段渐变减反膜的原理和方法,研究了采用该方法设计多波段减反膜时Q函数的优选流程,给出了最优Q函数。设计优化得到了在350~5000nm波段范围平均透过率大于90%的多层渐变减反膜系结构,并采用等离子体增强化学气相沉积(PECVD)技术完成了样片的制备。实验结果表明,镀制的样片在350~5000nm波段范围的平均透过率为90.55%,满足光谱特性的要求。  相似文献   

7.
利用“电子束蒸发沉积薄膜生长技术+离子束溅射沉积薄膜生长技术”、“HfO2/SiO2+Al2O3/SiO2+M-SiO2”复合光学膜系设计技术、400°C4h高温处理技术, 研制的SR-FEL宽带腔镜光学膜系在355nm中心波长的绝对光学反射率测量值为R(355nm)=99.45%, 反射光谱带宽测量值为Δλ(R≥99.00%)=75nm; 研制的355nm/248nm双带腔镜光学膜系, 在355nm中心波长, 其绝对光学反射率测量值为R(355nm)=99.69%, 反射光谱带宽测量值为Δλ(R≥99.00%)=59nm; 在248nm中心波长, R(248nm)=98.21%, 绝对光学反射率光谱带宽测量值Δλ(R≥99.00)=9mm, Δλ(R≥98.00%)=33nm.  相似文献   

8.
 采用溶胶-凝胶法用旋转镀膜工艺在K9玻璃基片上制备出了SiO2和有机硅单层减反膜以及有机硅-SiO2双层减反膜。考察了旋转速度对SiO2和有机硅单层膜的中心透射波长、膜层折射率等基本光学性质的影响,实验确定了双层膜的涂敷工艺。透射光谱测量表明,采用本文工艺条件制备的有机硅 SiO2双层膜在430~800nm范围内透射率达99%以上。  相似文献   

9.
本文采用离子束溅射方法制备GdF_3薄膜,并研究其沉积速率分布特征。首先,采用膜厚仪测量得出GdF_3薄膜在行星盘平面的二维沉积速率分布图,通过拟合模型得到二维沉积速率分布公式。其次,分析了束流束压及靶材角度对沉积速率分布特征的影响。最后,以二维沉积速率分布公式为基础,通过计算机编程设计均匀性挡板,并进行膜厚均匀性实验验证。结果表明,沉积速率在水平方向上满足ECS函数分布,在竖直方向上满足标准Gauss分布,拟合公式残差为2.05×10~(-6)。改变离子源的束流和束压,沉积速率分布特征保持不变。而随着靶材角度的增大,Gauss分布的半峰宽值ω逐渐增大,峰值位置x_c逐渐增大,在θ=292°时,GdF_3薄膜的沉积速率最大。通过挡板修调实验,可将270 mm口径平面元件的膜厚均匀性调整为97.9%。  相似文献   

10.
徐晓峰  张凤山  范滨 《光学学报》2004,24(9):173-1176
阐述了利用非均匀膜系理论设计宽角度多层减反射薄膜的方法 ,从理论上分析了在宽角度的情况下 ,偏振光产生透过率不同的原因 ,选取了Ta2 O5和SiO2 两种材料作为折射率材料 ,选取BK7作为基底材料模拟设计了光谱区在 6 0 0~ 70 0nm波段、入射角为 0°~ 80°之间的宽角度多层减反射薄膜 ,探索出了一条新型膜系设计的途径 ,其优化结果是较为理想的。这一研究方法如能在太阳能、光纤通信、航天、激光等领域应用 ,将大大地提高光能的利用率 ,具有重要的应用价值。  相似文献   

11.
张俊超  方明  晋云霞  贺洪波 《中国物理 B》2012,21(1):14202-014202
We suggest a design method of graded-refractive-index (GRIN) antireflection (AR) coating for s-polarized or p-polarized light at off-normal incidence. The spectrum characteristic of the designed antireflection coating with a quintic effective refractive-index profile for a given state of polarization has been discussed. In addition, the genetic algorithm was used to optimize the refractive index profile of the GRIN antireflection for reducing the mean reflectance of s- and p-polarizations. The average reflectance loss was reduced to only 0.04% by applying optimized GRIN AR coatings onto BK7 glass over the wavelength range from 400 to 800 nm at the incident angle of θ0 =70°.  相似文献   

12.
袁贺  孙长征  徐建明  武庆  熊兵  罗毅 《物理学报》2010,59(10):7239-7244
针对光电子器件端面抗反镀膜的要求,研究了基于等离子体增强化学气相沉积(PECVD)技术的多层抗反膜的设计和制作.首先,对影响SiNx折射率的因素进行了实验研究,确定了具有大折射率差的SiO2/SiNx材料的PECVD沉积条件.根据理论计算分析,设计了四层SiO2/SiNx抗反膜结构,能够在70 nm的波长范围内实现低于10-4的反射率  相似文献   

13.
Thin films with a low refractive index play an important role in optics, optoelectronics, and microelectronics. In this study, we present nanostructured porous SiO2 films fabricated by using a glancing angle deposition technique. These nanostructured porous SiO2 films deposited at an angle of 85° show very low refractive indices of 1.08 at 633 nm. As an application, a four-layer antireflection coating for visible wavelength is designed and fabricated using SiO2 material only. The normal incidence reflectance of the antireflection coating averaged between 400 and 800 nm is about 0.04%. The microstructure and the surface morphology are also investigated by using a scanning electron microscope.  相似文献   

14.
三硼酸锂晶体上1064 nm,532 nm,355 nm三倍频增透膜的设计   总被引:1,自引:0,他引:1  
采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017%、0.0002%和0.0013%。根据误差分析,薄膜制备时沉积速率精度控制在 5.5%时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20%、0.84%和1.89%。当材料折射率的变化控制在 3%时,1064 nm处的剩余反射率增大为0.20%,532 nm和355 nm处分别达0.88%和0.24%。与薄膜物理厚度相比,膜层折射率对剩余反射率的影响大。对膜系敏感层的分析表明,在1064 nm和355 nm波长,从入射介质向基底过渡的第二层膜的厚度变化对剩余反射率的影响最大,其次是第一膜层。在532 nm波长,第一和第三膜层是该膜系的敏感层。同时发现,由于薄膜材料的色散,1064 nm5、32 nm和355 nm波长的剩余反射率分别增加至0.15%、0.31%和1.52%。  相似文献   

15.
TiO2 thin films of different thickness were prepared by the Electron Beam Evaporation (EBE) method on crystal silicon. A variable angle spectroscopic ellipsometer (VASE) was used to determine the optical constants and thickness of the investigated films in the spectral range from 300 to 800 nm at incident angles of 60°, 70°, and 75°, respectively. The whole spectra have been fitted by Forouhi–Bloomer (FB) model, whose best-fit parameters reveal that both electron lifetime and band gap of TiO2 thin film have positive correlation to the film thickness. The refractive indices of TiO2 thin film increase monotonically with an increase in film thickness in the investigated spectral range. The refractive index spectra of TiO2 thin films have maxima at around 320 nm and the maxima exhibit a marginally blue-shift from 327.9 to 310.0 nm with an increase in film thickness. The evolution of structural disorder in the TiO2 thin film growth can be used to explain these phenomena.  相似文献   

16.
Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity(the degree of inhomogeneous is between -0.2 and 0.2) is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.  相似文献   

17.
朱燕艳  方泽波  刘永生 《中国物理 B》2010,19(9):97807-097807
This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.  相似文献   

18.
用低压反应离子镀(RLVIP)的方法在Ge基底上制备了Ge1-xCx单层非均匀增透薄膜。随着沉积速率在0.05~0.4nm/s之间的变化,其折射率在2.31~3.42之间可变。实验结果表明,镀制的Ge1-xCx单层非均匀增透保护薄膜均为无定形结构,并实现了从2000~8000nm的宽波段增透。当沉积速率为0.1nm/s时,单面平均透过率从68.6%提高到了80.9%,比单面未镀膜时提高了17.9%。通过对薄膜的稳定性和牢固度进行测试表明,制备的Ge1-xCx单层非均匀增透薄膜具有良好的性能。  相似文献   

19.
Nanoporous ZnO/SiO2 bilayer coatings were prepared on the surface of glass substrates via sol-gel dip-coating process. The structural, morphological and optical properties of the coatings were characterized. The refractive indices of ZnO layer and SiO2 layer are 1.34 and 1.21 at 550 nm, respectively. The transmittance and reflectance spectra of the coatings were investigated and the broadband antireflection performance of the bilayer structure was determined over the solar spectrum. The solar transmittances in the range of 300-1200 nm and 1200-2500 nm are increased by 6.5% and 6.2%, respectively. The improvement of transmittance is attributed to the destructive interference of light reflected from interfaces between the different refractive-index layers with an optimized thickness. Such antireflection coatings of ZnO/SiO2 provide a promising route for solar energy applications.  相似文献   

20.
The solar spectrum covers a broad wavelength range, which requires that antireflection coating (ARC) is effective over a relatively wide wavelength range for more incident light coming into the cell. In this paper, we present two methods to measure the composite reflection of SiO2/ZnS double-layer ARC in the wavelength ranges of 300-870 nm (dual-junction) and 300-1850 nm (triple-junction), under the solar spectrum AM0. In order to give sufficient consideration to the ARC coupled with the window layer and the dispersion effect of the refractive index of each layer, we use multi-dimensional matrix data for reliable simulation. A comparison between the results obtained from the weighted-average reflectance (WAR) method commonly used and that from the effective-average reflectance (EAR) method introduced here shows that the optimized ARC through minimizing the effective-average reflectance is convenient and available.  相似文献   

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