共查询到18条相似文献,搜索用时 140 毫秒
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激光直写邻近疗效应的校正 总被引:3,自引:0,他引:3
邻近效应是限制光刻系统分辨力的一个重要因素,它也限制了激光直写在亚微米和亚半微微米光刻中的应用,分析了激光直写邻近效应产生的原因,指出它和电子束直写及投影光刻的区别,提出了一种简便有效的邻近校正方法,实验表明,通过光学邻近校正(OPC),利用微米级激光直写系统,制作出0.6μm的实用光刻线条。 相似文献
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为了研究波长在255.3nm的铜蒸气激光倍频在亚微米光刻中的可行性,设计了带宽为1nm的1:1折反射式投影光刻物镜和一个带散射板的光管式均匀照相系统,获得了0.6μm的光刻分辨率。此结果表明,铜激光倍频光可作为亚微米光刻的照明光源。 相似文献
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高能电子束对抗蚀剂曝光的Monte Carlo模拟 总被引:1,自引:0,他引:1
利用分段散射模型, 借助Monte Carlo方法模拟了具有高斯分布特征的
高能入射电子束(50keV≤E0≤100keV)在抗蚀剂中的
散射过程, 分别得到了不同曝光条件下的电子背散射系数和能量沉积分布,
模拟结果与实验结果很好地符合. 在这一能量段, 当电子束能量越高、抗蚀剂
越薄、基片材料的原子序数越低时, 邻近效应越弱. 本文的模拟结果不仅能为高能电子束光刻工艺优化曝光条件、降低邻近效应提供理论指导, 而且能为进一步的邻近效应的校正提供更精确的数据. 相似文献
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Rung-Ywan Tsai Chung-Ta Cheng Chin-Tien Yang Shuen-Chen Chen Chun-Chieh Huang Shih-Wei Chen Wen-Haw Lu 《Optical Review》2013,20(2):185-188
The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup head and consisting of a 405-nm-wavelength blue laser and a 0.85-numerical-aperture objective lens. Si substrates were patterned with submicron column patterns of various periods and aspect ratios by blue laser lithography using a sputtered Ge-Sb-Sn-O layer as a resist. The reflectance of the patterned Si substrate decreased to 3% on average in the 300–1000 nm wavelength range, with a low sensitivity to the angle of incident light. Such patterned substrates showed potential for application in crystalline Si solar cells. 相似文献
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A valid method for measuring the large-aperture convex surface by using a curved diffractive optical element (DOE) and a Zygo interferometer is demonstrated experimentally. In this method, the direct use of source and high-resolution CCD camera of Zygo interferometer represents a major advance in the areas of adjustment. The DOE, fabricated by combining laser direct writing and lithography, results in higher accuracy, efficiency and lower cost for testing aspheric compared with other types of DOE employed. We have fabricated one optical test system and measured a 110-mm-diameter convex surface of errors 44.3 nm rms and 311 nm P–V. 相似文献
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