YAG晶体中Cr4+和Yb3+的光谱和荧光特性研究

报道了（Ｃｒ＾４＋,Ｙｂ＾３＋）：ＹＡＧ晶体的吸收光谱和荧光光谱特性。在室温下,（Ｃｒ＾４＋,Ｙｂ＾３＋）：ＹＡＧ晶体在９３７ｎｍ和９６８ｎｍ处存在两个吸收带,能与ＩｎＧａＡｓ激光二级管有效耦合：而且在１０３０ｎｍ处有一Ｃｒ＾４＋吸收峰,可以实现对Ｙｂ＾３＋的自调Ｑ激光输出。（Ｃｒ＾＋,Ｙｂ＾３＋）：ＹＡＧ 荧光光谱与Ｙｂ＾３＋：ＹＡＧ晶体一样,发光中心也是位于１０２９ｎｍ,但其强度比Ｙｂ＾３＋：     

YAG晶体中Ce^3＋对Er^3＋的敏化作用

通过求解（Ｃｅ，Ｅｒ）：ＹＡＧ和Ｅｒ：ＹＡＧ的能级跃迁速率方程，讨论了Ｃｅ＾３＋对Ｅｒ＾３＋离子的敏化作用。表明掺Ｃｅ＾３＋可增强Ｅｒ＾３＋离子１．６６μｍ波长的激光强度，但仅改变了１．６６μｍ波长激光粒子数反转，即Ｎ２（＾４Ｉ１２／２）〉Ｎ１（＾４Ｉ１５／２）与Ｅｒ＾３＋离子浓度的关系。     

稀土铒离子注入多孔硅的发光

稀土离子Ｅｒ注入多孔硅中．在３５０ｋｅＶ能量，１×１０（１２）～１×１０（１５）／ｃｍ２剂量范围内，注入后的多孔硅仍保持明亮的可见光发射．退火后，在近红外区测到１．５４μｍ附近Ｅｒ（３＋）的特征发射．其发射强度比硅单晶对照样品明显增强，实验表明这增强作用来源于多孔硅的表面发光层．电化学制备过程中在表面层中带入的Ｏ、Ｃ、Ｆ等多种杂质可能是Ｅｒ（３＋）发光增强的原因．     

氟化铟基玻璃中Er^3＋离子光谱性质的研究

测定了掺Ｅｒ＾３＋氟化铟基玻璃的吸收光谱，激发光谱和荧光光谱，计算了该玻璃的强度参数Ω（ｔ＝２，４，６），给出了Ｅｒ＾３＋离子的发光特性的计算结果，并与掺Ｅｒ＾３＋的氟锆酸盐玻璃做比较，解释了基质玻璃对Ｅｒ＾３＋离子发光特性的影响。     

Eu3+:Y2SiO5晶体透射光谱和荧光谱研究

在室温条件下,对Ｅｕ＾３＋：Ｙ２ＳｉＯ５晶体的透射光谱和４５７．９ｎｍＡｒ＾＋激光激发荧光谱进行测量和研究。这些光谱表明,Ｅｕ＾３＋离子在Ｙ２ＳｉＯ５晶体中占据两种最低对称性Ｃ１格位。利用透射光谱和荧光谱对Ｅｕ＾３＋离子的最低激发态＾５Ｄ０的两种格位光谱进行了成功分离。实验发现,在＾５Ｄ０态两种格位谱的谱宽只有０．１ｎｍ左右,其峰间隔约为０．１８ｎｍ。另外,文中还测量了Ｅｕ＾３＋离子的基态＾７ＦＪ     

800nm激发下AlF3基氟化物玻璃中高掺杂Er3+的上转换光谱性质

在８００ｎｍ激光二极管激发下,研究高掺杂Ｅｒ＾３＋（摩尔比大于３％）的ＡｌＦ３基（ＡＹＦ、ＡＺＦ）玻璃的红外－可见上转换发光性质。在ＡＹＦ玻璃中,５５０ｎｍ绿光上转换最佳Ｅｒ＾３＋掺杂摩尔比为６％,而在ＡＺＦ玻璃中为１２％。随着Ｅｒ＾３＋掺杂量的增加,红光与绿光上转换发光强度比（Ｉｒ／Ｉｓ）增加。这被认为与两个Ｅｒ＾３＋离子（一个在４Ｉ０／２态、另一个在＾４Ｓ３／２）的交叉弛豫过程有关。同时由于此     

A3M2GeO12石榴石体系中Cr^3＋离子的宽带发射光谱

首次报道在Ａ３Ｍ２Ｇｅ３Ｏ１２：Ｃｒ（Ａ＝Ｃｄ＾２＋,Ｍ＝Ａｌ＾３＋,Ｇａ＾３＋,Ｓｃ＾３＋）锗酸盐石榴石体系中,Ｃｒ＾３＋离子室温下的红－近红外宽发射带光谱性质。随位于八面体格位上的Ａｌ＾３＋→Ｇａ＾３＋→Ｓｃ＾３＋和十二面体格位上的Ｃｄ＾２＋→Ｃａ＾２＋组成顺序变化,室温下,Ｃｒ＾３＋离子的＾４Ｔ２→＾４Ａ２能级跃迁的Ｒ－ＮＩＲ宽发射带,发射峰及光谱的长波和短波边逐渐向低能长波边移动。     

敏化离子Ce~(3 )对Er~(3 )∶YAG的1.6μm波长激光性能的影响

测定了Ｃｅ３＋,Ｅｒ３＋∶ＹＡＧ中Ｃｅ３＋离子的吸收截面．用从能级跃迁速率方程和激光传输方程推出的表达式计算了１６μｍ波长激光的阈值能量（功率）和斜率效率．表明在Ｃｅ３＋,Ｅｒ３＋∶ＹＡＧ中,Ｃｅ３＋对Ｅｒ３＋离子的激光性能影响与激活离子Ｅｒ３＋的浓度、晶棒大小有关．短晶棒或浓度低的晶体加入Ｃｅ３＋可降低Ｅｒ３＋的激光阈值,增加斜率效率．而长晶棒、或Ｅｒ３＋浓度高的晶体加入Ｃｅ３＋反而增加激光阈值,减小斜率效率．     

LiNbO3晶体中Cr^3＋的占位及其EPR参量的研究

在中间场图像中，建立了ｄ＾３（Ｃ＾＊３Ｖ）电子组态的能量矩阵；利用叠加模型与自旋哈密顿理论，将ＬｉＮｂＯ３：Ｃｒ＾３＋的晶体结构与其ＥＰＲ参量定量地联系了起来，用该理论对ＬｉＮｂＯ３：Ｃｒ＾３＋晶体的ＥＰＲ参量及其光谱进行了计算，结果与观测基本一致。研究表明，在ＬｉＮｂＯ３中是Ｃｒ＾３＋取代了Ｎｂ＾５＋，而不是Ｌｉ＾＋。     

MAl2O4：Eu^2＋,RE^3＋,长余辉发光性质的研究

研究鳞石英结构碱土铝酸盐ＭＡｌ２Ｏ４：Ｅｕ＾２＋,ＲＥ＾＋（Ｍ＝Ｍｇ,Ｃａ,Ｓｒ,Ｂａ：ＲＥ＝Ｙ,Ｌａ,Ｃｅ,Ｐｒ,Ｎｄ,Ｓｍ,Ｇｄ,Ｔｂ,Ｄｙ,Ｈｏ,Ｅｒ,Ｔｂ,Ｄｙ,Ｈｏ,Ｅｒ,Ｔｍ,Ｙｍ,Ｙｂ,Ｌｕ）的荧光及长余辉发光性质。其发光由Ｅｕ＾２＋的４ｆ－５ｄ跃迁产生。ＲＥ＾３＋作为辅助激离子,提供合适的陷阱能级。即使用ＲＥ＾３＋的特性波长激发,在ＭＡｌ２Ｏ４：Ｅｕ＾３＋的发光中也观察不到ＲＥ＾３     

The Influence of Immersion of Porous Silicon in Aqueous Solutions of Fe(NO<Subscript>3</Subscript>)<Subscript>3</Subscript> on Photoluminescence during Long Storage

The interaction of porous silicon (PS) with aqueous solutions of Fe(NO₃)₃ with different molar (M) concentrations causes introduction of iron ions into silicon pores (PS–Fe), formation of adsorbed iron coatings with different thicknesses, and an increase in the stability of PS layers, which is important for development of device structures based of PS. To treat PS layers with solutions by the immersion method, it is necessary to determine how this affects the spectral composition and intensity of photoluminescence (PL), as well as the kinetics of PL changes during long storage under atmospheric conditions. Upon treatment of freshly prepared PS by immersion into in a Fe(NO₃)₃ aqueous solution, it was found that, after short-term storage (up to 5 days) of the PS samples, the PL intensity increases by 7.5 and 3–3.6 times at low (0.2 M) and high (0.7–0.8 M) concentrations of Fe(NO₃)₃, respectively, compared to the PL intensity of an untreated PS layer. After long-term storage (4 months), the PL intensity of PS–Fe samples with concentrations of 0.1–0.2 and 0.7–0.8 M was observed to considerably increase (by 8–18 times) with unchanged position of the PL peak with respect to untreated PS. However, at the Fe(NO₃)₃ concentration of 0.3 М, the PL intensity decreases and the PL peak shifts to the blue, which is explained by incomplete coverage of the PS surface by an adsorbed iron layer. The kinetics of PL spectra during long-term storage is analyzed, and a model is proposed to explain the PL intensity and spectral composition.     

Influence of alkali metallization (Li, Na and K) on photoluminescence properties of porous silicon

We present results for alkali metallization effects on photoluminescence (PL) properties of porous silicon (PS). The metallization of PS was realized by immersion plating in solutions containing 3 mM LiNO₃, KNO₃ and NaNO₃ metal salts. The surface bond configuration of PS was monitored by Fourier transmission infrared spectroscopy (FTIR) and it was found that the PS surface was oxidized after metallization. Surface properties of PS were investigated by field emission scanning electron microscopy (FE-SEM) and it was found that the PS surface was covered by alkali metals for short immersion times. The PL intensity increased for critical immersion times and PL spectrum shifted to high energy region with the metallization. The experimental results suggest a possibility that the metallization provides a relatively easy way to achieve an increase in the PL intensity and oxidation of the PS surface.     

发光不衰减的多孔硅

用一种新的方法制备出了具有不同衰减的光致发光特性的多孔硅。如此制备的多孔硅新鲜样品,其发光峰位强度比普通多孔硅高２￣２．５倍,将样品在室温下暴露于空气中,其发光强度在前４个月中单调增加,然后达到饱和。在随后的８个月中,没有观察到发光衰减,发光峰位也没有发生变化,这种发光稳定性被归因子于多孔硅表面所形成的稳定的Ｆｅ－Ｓｉ键。文章探讨了发光不衰减、峰位不蓝移的机理,并为多孔硅发光的量子限域模型提供了强     

Photoluminescence enhancement and stabilisation of porous silicon passivated by iron

Iron is incorporated in porous silicon (PS) by impregnation method using Fe(NO₃)₃ aqueous solution. The presence of iron in PS matrix is shown from energy-dispersive X-ray (EDX) analysis and Fourier transform infrared (FTIR) measurements. The optical properties of PS and PS-doped iron are studied by photoluminescence (PL). The iron deposited in PS quenched the silicon dangling bonds then increased the PL intensity. The PL peak intensity of impregnated PS is seven times stronger than that in normal PS. Upon exposing iron-PS sample to ambient air, there is no significant change in peak position but the PL intensity increases during the first 3 weeks and then stabilises. The stability is attributed to passivation of the Si nanocrystallites by iron.     

制备多孔硅的一种新方法

自从Canham观察到多孔硅(PS)的可见光致发光后,由于其可望成为可与Ⅲ—Ⅴ族半导体材料相媲美的新型光电子材料而引起了科学界极大的兴趣.目前,制备多孔硅一般都采用电化学腐蚀方法.     

多孔硅的微结构与发光特性研究

利用原子力显微镜（AFM）和光致荧光（PL）光谱对一系列直流腐蚀和脉冲腐蚀的多孔硅的微结构及发光特性进行了对比研究．表面和侧面的AFM结果表明，多孔硅表面呈“小山”状，有许多小的、突出的硅颗粒．在相同的腐蚀条件（等效）下，脉冲腐蚀的样品表面Si颗粒更加尖锐、突出，侧面的线状结构更明显，多孔硅层更厚．对应的PL谱，脉冲腐蚀的样品发光更强．量子限制效应的理论可以比较成功地解释这个结果 关键词：     

Structure and photoluminescence properties of ZnS films grown on porous Si substrates

ZnS films were deposited on porous silicon (PS) substrates with different porosities. With the increase of PS substrate porosity, the XRD diffraction peak intensity decreases and the surface morphology of the ZnS films becomes rougher. Voids appear in the films, due to the increased roughness of PS structure. The photoluminescence (PL) spectra of the samples before and after deposition of ZnS were measured to study the effect of substrate porosity on the luminescence properties of ZnS/PS composites. As-prepared PS substrates emit strong red light. The red PL peak of PS after deposition of ZnS shows an obvious blueshift. As PS substrate porosity increases, the trend of blueshift increases. A green emission at about 550 nm was also observed when the porosity of PS increased, which is ascribed to the defect-center luminescence of ZnS. The effect of annealing time on the structural and luminescence properties of ZnS/PS composites were also studied. With the increase of annealing time, the XRD diffraction peak intensity and the self-activated luminescence intensity of ZnS increase, and, the surface morphology of the ZnS films becomes smooth and compact. However, the red emission intensity of PS decreases, which was associated with a redshift. White light emission was obtained by combining the luminescence of ZnS with the luminescence of PS.     

Zn2+掺杂对GdTaO4:Eu3+荧光粉结构和发光性能的影响

采用高温固相反应法制备了掺杂不同浓度Zn2 的GdTaO4:Eu0.1荧光粉,研究了Zn2 掺杂对GdTaO4:Eu3 的结晶性能,晶粒形貌和光致发光特性的影响.以X射线衍射(XRD)、扫描电子显微镜(SEM)、激发-发射谱、衰减时间谱等方法对其性能进行了表征.结果表明,Zn2 掺杂可显著提高GdTaO4:Eu3 的光致发光强度,当掺杂浓度x=0.01时,光强被提高至2.7倍,可归因于的Zn2 进入了GdTaO4:Eu3 基质晶格,产生了一定浓度的氧空位以达到电荷平衡,并导致发光中心Eu3 的晶格场发生畸变;当x=0.13时,光强提高至3.2倍,且其衰减时间被缩短至40%,可归因于Zn2 的助熔剂效果;但当x＞0.13时,ZnO和GdTa7O19杂相的出现将导致发光强度减弱和衰减时间延长.另外,初步探索表明,Li2CO3和.KCl的共掺杂能进一步提高G.dTaO4:Eu0.1,Zn0.13的发光强度.     

Electrical and optical characteristics of porous silicon impregnated with LaF3 by a novel chemical bath technique

The structural, electrical and optical characteristics of porous silicon (PS) due to the impregnation of LaF₃ into PS by a novel chemical-bath deposition (CBD) technique have been investigated in this article. Without removing the PS from the anodization chamber the impregnation with LaF₃ has been done by reacting LaCl₃ with HF in the same chamber at room temperature. The impregnation of LaF₃ was confirmed by the SEM on the cross-section of the LaF₃/PS/Si system and EDX. The modification of PS surface by LaF₃ had direct influence on the electrical and optical properties of PS. Electrical properties of Ag/LaF₃/PS/p-Si/Ag structures were studied through the current-voltage (I-V) and capacitance-voltage (C-V) characteristics. Formation of metal-insulator-semiconductor (MIS) diode was evident whose forward current increased with annealing. A diode factor of about 2.4 has been obtained for the annealed heterostructure indicating a high density of trap states. The C⁻²-V curves of all samples showed negative flat band voltage of around −2 V confirming a large number of fixed positive charges in the LaF₃. The photoluminescence (PL) intensity of the LaF₃-impregnated PS showed aging for the as-deposited samples, but when annealed PS structure recovered the PL intensity. Experimental results show that the optimized chemical bath passivation process for the LaF₃ on porous silicon could enable the porous silicon to be an important material for photonic application.     

The role of surface oxidation on luminescence degradation of porous silicon

This study reports a comparative analysis on time dependent degradation of photoluminescence (PL) spectra of porous silicon (PS) during dark-aging (DA) and photo-aging (PA). Fourier Transform Infrared (FTIR) spectroscopy studies have been performed to get an insight on possible chemical changes in the PS surface. It has been found that SiH_x bonds decrease progressively while SiO_x bonds increase. FTIR and PL measurements revealed presence of blue shifts in the PL spectra during the aging stages (PA and DA). While the PL intensity of dark aged PS shows a decrease during the first 3 weeks and an increase afterwards, the PL intensity decreases continuously for photo-aged PS. The change in the PL spectra has been investigated by overlapping of two different PL bands which are reflective of oxidation of PS surface and size of Si naonocrystallites. A possible bond configuration model about the oxidation of PS surface has also been proposed. The results are interpreted in terms of quantum size effects in PS and the influence of the surface composition.