高能Xe离子辐照引起的注碳a:SiO2中新结构的形成

先用120keV的碳离子注入非晶二氧化硅a:SiO2薄膜，再用能量为1754MeV的Xe离子辐照。注碳量为5．0×10^16—8．6×10^17ion／cm^2，Xe离子辐照剂量为1．0×10^11和5．0×10^11ion／cm^2。辐照后的样品中形成的新结构用显微傅立叶变换红外光谱仪进行测试分析。结果表明，Xe离子辐照引起了注碳a:SiO2中Si—C，C—C，Si—O—C键以及CO和CO2分子的形成与演化。在注碳量较高时，Xe离子辐照在样品中产生了大量的Si—C键。与注入未辐照和辐照的低注碳量样品比较，增强的Si—C键的形成，预示着辐照可引起注碳a:SiO2样品中的SiC结构相变。Amorphous silicon-dioxide （a:SiO2） films were firstly implanted at room temperature （RT） with 120 keV C-ions to doses ranging from 5.0 × 10^16 to 8.6 × 10^17 ion/cm^2, and then the C-doped a:SiO2 films were irradiated at RT with 1 754 MeV Xe ions to 1.0 × 10^11 and 5.0 × 10^11 ion/cm^2, respectively. The information of new tex- ture formation in the C-doped SiO2 films after high-energy Xe ion irradiation was investigated using micro-FTIR measurements. The obtained results showed that Si--C, C--C, Si--O--C bonds as well as CO and CO2 molecules were formed in the C-doped a-SiO2 films after Xe ion irradiation. Furthermore, Xe-ion irradiation induced a plenteous formation of Si--C bonds in the high dose C-ion implanted a:SiO2 films. Compared with the C-implanted sampies without Xe-ion irradiation and the low dose C-implanted samples with Xe-ion irraddiation, the enhanced and plenty of Si--C bond formation implied that the phase of SiC structures may be produced by Xe-ion irradiation in the high dose C-ion implanted a:SiO2 films.     

离子注入/辐照引起Al2O3单晶的改性研究

600K温度下用110keV的He^＋，Ne^＋，Ar^＋离子注入及320K温度下用230MeV的^208Pb^27＋辐照Al2O3单晶样品，研究了离子注入和辐照对Al2O3单晶样品结构和光学特性的影响。从测得的光致发光谱可以清楚地看到，所有样品在波长为375，413和450nm处出现了强的发光峰。且所有5×10^16ion／cm^2注入样品的发光峰均最强。经过高能Pb辐照后的样品，在390nm处出现了新的发光峰。透射电镜分析发现在注入氖样品100nm入射深度以内形成了高浓度的小空洞（1-2nm），在Ne沉积区域有少量大空洞形成。傅立叶变换红外光谱分析发现，波数在460-510cm^-1间的振动吸收带经过离子辐照后展宽，随着辐照量的增大，该振动吸收强度显著减弱。1000—1300cm^-1对应Al-O-Al桥氧伸缩振动模式的吸收带，辐照后向高波数方向移动。对离子注入和辐照对Al2O3单晶样品结构损伤机理进行了初步探讨。Single crystal sapphire （Al2O3 ） samples were implanted at 600 K by He, Ne and Ar ions with energy of 110 keV to doses ranging from 5 × 10^16 to 2× 10^17 ion/cm^2 or irradiated at 320 K by ^208Pb^27＋ ion with energy of 1.1 MeV/u to the fluences ranging from 1 × 10^12 to 5 × 10^14 ion/cm^2. The modification of structure and optical properties induced by ion implantation or irradiation were analyzed by using photoluminescence（PL） and Fourier transformation infrared spectrum（FIR） spectra and transmission electron microscopy（ TEM ） measurements. The PL measurements showed that absorption peaks located at 375,413 and 450 nm appeared in all the implanted or irradiated samples, the PL intensities reached up to the maximum for the 5 × 10^16 ion/cm^2 implanted samples. After Pb-ion irradiation, a new peak located at 390 nm formed. TEM analyses showed that small size voids,（ 1--2 nm） with high density were formed in the region from the surface till to about 100 nm in depth and also large size Nebubble formed in the Ne-doped region. From the obtained FTIR spectra, it was found that Pb-ion irradiation induced broadening of the absorption band in 460-510 cm^-1 and position shift of the absorption band in 1 000- 1 300 cm^- 1 towards to high wavenumber. The possible damage mechanism in single crystal sapphire induced by energetic ion implantation or irradiation was briefly discussed.     

Study on the interaction of intense femtosecond laser pulses with nanometre-sized hydrogen clusters

The interaction of intense femtosecond laser pulses with hydrogen clusters has been experimentally studied. The hydrogen clusters were produced from expansion of high-pressure hydrogen gas （backed up to 8×10^6Pa） into vacuum through a conical nozzle cryogenically cooled by liquid nitrogen. The average size of hydrogen clusters was estimated by Rayleigh scattering measurement and the maximum proton energy of up to 4.2keV has been obtained from the Coulomb explosion of hydrogen clusters under 2 × 10^16W/cm^2 laser irradiation. Dependence of the maximum proton energy on cluster size and laser intensity was investigated, indicating the correlation between the laser intensity and the cluster size. The maximum proton energy is found to be directly proportional to the laser intensity, which is consistent with the theoretical prediction.     

聚变堆候选金属材料的惰性气体离子辐照损伤的研究

综述了有关核聚变反应堆材料的辐照损伤问题的研究，主要包括国产316L奥氏体不锈钢中氦的扩散与氦泡形核生长的研究、316L及低活化FeCrMn合金的高能Ar离子辐照缺陷与空洞肿胀的研究、近期开展的低活化马氏体钢和氧化物颗粒弥散强化合金的高能Ne离子辐照损伤和效应的研究成果。This paper gives a review of our recent studies on the irradiation damage induced by energetic inert-gasions in metallic materials candidate to fusion reactors. The work includes the study of helium diffusion and helium bubble formation in 316L stainless steels, the study of void formation and swelling in the low-activation Fe-Cr-Mn alloy irradiated with high-energy Ar ions, the study of irradiation damage in some low-activation Fe-based steels and ODS alloys by high-energy Ne ions.     

Fe/Nb多层膜中离子辐照效应研究(英文)

〗采用磁控溅射技术在Si衬底上沉积Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/Nb(4 nm)\]2/ \[Fe(4 nm)/Nb(4 nm)\]4多层膜。 用2 MeV的 Xe离子在室温下辐照多层膜。采用俄歇深度剖析、X射线衍射和振动样品磁强计分析辐照引起的多层膜元素分布、 结构及磁性变化。AES深度剖析谱显示当辐照注量达到1.0×1014 ions/cm2时, 多层膜界面两侧元素开始混合; 当辐照注量达到2.0×1016ions/cm2时, 多层膜层状结构消失, Fe层与Nb层几乎完全混合。XRD谱显示, 当辐照注量达到1.0×1014ions/cm2时, Nb的衍射峰和Fe的各衍射峰的峰位相对于标准卡片向小角方向偏移, 这说明辐照引起Nb基和Fe基FeNb固溶体相的形成;当辐照注量大于1.0×1015 ions/cm2时, 辐照引起非晶相的出现。 VSM测试显示,多层膜的磁性随着结构的变化而变化。 在此实验基础上, 对离子辐照引起界面混合现象的机理进行了探讨。The behavior of the metallic multilayers of Si/\[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/ Nb(4 nm)\]2/\[Fe(4 nm)/Nb(4 nm)\]4 under 2 MeV Xe ion irradiation has been investigated by depth profile analysis of Auger electron spectroscopy,X ray diffraction and vibrating sample magnetometer. The obtained experimental results show that the inter mixing between Fe and Nb layers occurs in the 1.0×1014 ions/cm2 irradiated multilayer sample which results in the formation of Nb based and Fe based FeNb solid solution. For the samples irradiated to fluence larger than 1.0×1014 ions/cm2, amorphisation is observed, and moreover, the layered structure of the multilayer samples is broken up completely for the samples under 1.0×1016 or 2.0×1016 ions/cm2 irradiation. Vibrating sample magnetometer measurement also reveals that the magnetization of the samples changes with the evolution of the structure of multilayers. Possible mechanism of the modification in Fe/Nb multilayers induced by Xe ion irradiation is briefly discussed.     

Effect of vacancy defect clusters on the optical property of the aluminium filter used for the space solar telescope

We investigate the microstructures of the pure aluminium foil and filter used on the space solar telescope, irradiated by photons with different doses. The vacancy defect clusters induced by proton irradiation in both samples are characterized by transmission electron microscopy, and the density and the size distribution of vacancy defect clusters are determined. Their transmittances are measured before and after irradiating the samples by protons with energy E = 100 keV and dose = 6 × 10 11 /mm 2 . Our experimental results show that the density and the size of vacancy defect clusters increase with the increase of irradiation doses in the irradiated pure aluminium foils. As irradiation dose increases, vacancies incline to form larger defect clusters. In the irradiated filter, a large number of banded void defects are observed at the agglomerate boundary, which results in the degradation of the optical and mechanical performances of the filter after proton irradiation.     

碳化硅中惰性气体离子辐照引起缺陷的研究

综述了有关碳化硅材料中惰性气体离子引起辐照缺陷研究的进展。包括借助多种方法对氦离子辐照的碳化硅中氦泡集团形成的剂量阈值的实验研究，基于过冷固体假设对氦泡阈值的理论解释，不同剂量氦泡的两种形态及其机理的研究，以及重惰性气体离子（Ne，Xe）辐照下缺陷演化的特点。This paper gives a review of our recent studies on the defect production in silicon carbide induced by energetic inert-gas-ion irradiation. The work includes the study of the dose threshold for helium bubble formation by combining TEM, RBS-channeling and PAS, the theoretical analysis of the dose threshold for bubble formation based on the Frozen-Matrix assumption, two types of bubble arrangement at different dose regions and the study of damage um-ion production behavior in the case of irradiation with heavier inert-gas-ions （ Ne, Xe） as a comparison to heliirradiation.     

A CVD diamond film detector for pulsed proton detection

A chemical vapour deposition （CVD） diamond film detector was prepared and the main characteristics for pulsed proton detection were studied at Beijing Tandem Accelerator. The result shows that the charge collection efficiency of the detector increases with increasing electric field intensity and reaches to 9.44% at 5 V/μm with the charge collection distance of 15.9 μm. The relationship between the sensitivity of the detector and proton energy is consistent with the Monte Carlo （MC） simulation result. Its plasma time for a pulse with 4.85×10^5 protons is 1l.2ns. The dose threshold for onset of damage under 9MeV proton irradiation in the detector is about 10^13 cm^-2. All of the results show that a CVD diamond detector has fast time response and high radiation hardness, and can be used in pulsed proton detection.     

快重离子辐照金红石型TiO2的肿胀效应及化学蚀刻行为研究

二氧化钛（Titatium Dioxide,简称TiO₂）晶体在中能重离子辐照时表面会出现肿胀效应, 肿胀高度与入射离子的电子能损和辐照注量有关。 辐照后的TiO₂在一定条件下能够被氢氟酸溶液化学蚀刻,化学蚀刻的电子能损阈值为8.2keV/nm,未辐照TiO₂呈现几乎零蚀刻率。要达到饱和蚀刻深度,辐照离子的注量必须大于或等于1×1013ions/cm2。采用离子辐照的潜径迹理论分析研究了辐照损伤及对化学蚀刻的影响, 快重离子辐照结合化学蚀刻是制备TiO₂微结构的有效方法。 There appears volume swelling on the surface of the irradiated rutile TiO₂ crystal and the volume swelling is affected by the ion fluence and the electronic stopping power. To induce adequate irradiation damage for the chemical etching, the irradiation parameters must fulfill some requirement. There is minimum electronic stopping power for the chemical etching of the irradiated region in TiO₂ crystal, which is about 8. 2 keV/nm. If the ion fluence is below 1×1013ions/cm2, the saturated etching depth of the irradiated region in TiO₂crystal cannot be reached. The irradiation damage based on latent track formation frame and the theoretical linkage to the etching technique is investigated. It is hopeful to fabricate micro and nano scale structurce in rutile TiO₂ crystal by using the ion irradiation and chemical etching technique.      

Structural Deformation of CO22+ in Intense Femtosecond Laser Fields

The angular distributions of CO^＋ from the dissociation of CO2^2＋ and CO2^＋ in intense femtosecond laser fields （45 fs, about 5 × 10^15 W/cm^2） are studied at a laser wavelength of 800nm based on the time-of-flight mass spectra of CO^＋ fragment ions. The experimental results show that structural deformation occurs in the charge state of CO2^2＋ and the CO^＋ maintains linear geometrical structure.     

掺Er^3＋离子Sr3Y2（BO3）4晶体光谱性能的研究

研究了提拉法生长的掺Er^3＋的Sr3Y2（BO3）4晶体的吸收光谱和荧光光谱。应用J—O理论分析并计算了光谱参数,得到唯象参数Ω2、Ω4和Ω6分别为11．90×10^-20cm^2、3．44×10^-20cm^2和1．92×10^-20cm^2。在Er^3＋：Sr3Y2（BO3）4晶体中,Er^3＋在1533nm波长的发射截面为1．00×10^-20cm^2,^4I13／2→^I15／2能级跃迁的荧光寿命和辐射寿命分别为0．58ms和4．10ms,良好的光谱性能表明Er^3＋：Sr3Y2（BO3）4晶体可能成为潜在的1．55μm波段的一种激光材料。     

18 MeV质子辐照对TiNi形状记忆合金R相变的影响

研究了用HZ B串列加速器的18MeV质子辐照对TiNi形状记忆合金R相变的影响,辐照在奥氏体母相状态下进行。示差扫描量热法(DSC)表明,辐照后R相变开始温度TsR和逆马氏体相变结束温度TfA随辐照注量的增加而降低。当注量为1.53×1014/cm2时,TsR和TfA分别下降6K和13K,辐照未引起R相变结束温度TfR和逆马氏体相变开始温度TsA的变化。表明辐照后母相(奥氏体相)稳定。透射电镜(TEM)分析表明辐照后没有引起合金可观察的微观组织变化。辐照对R相变开始温度TsR和逆马氏体相变结束温度Af的影响可能是由于质子辐照后产生了孤立的缺陷团,形成了局部应力场,引起晶格有序度的下降所造成的。     

质子注入掺镱磷酸盐玻璃平面光波导的近红外特性

在能量为(0.5+0.55)MeV和剂量为(1.0+2.0)×10^16 ions/cm^2的条件下,通过氢离子注入制备了掺Yb^3+磷酸盐玻璃波导,并研究了该波导在近红外波段的特性.棱镜耦合法测量的离子注入波导的导模的有效折射率与反射计算法计算的有效折射率基本吻合.通过模拟辐照引起的空位分布,探讨了离子注入平面波导的形成理论.利用FD-BPM对波导中的传播模式进行了模拟,结果表明高能量的氢离子注入掺Yb 3+磷酸盐玻璃能够制备出近红外波导结构.     

Coherent pion production in neutrino and antineutrino interactions on nuclei of heavy freon molecules

Studying the coherent diffractive production of pions in neutrino and antineutrino scattering off the nuclei of freon molecules we have observed for the first time in one experiment all three states of the isospin triplet of the axial part of the weak charged and neutral currents. For the corresponding cross sections we derive $$\begin{array}{*{20}c} {\sigma _{coh}^v (\pi ^ + ) = (106 \pm 16) \cdot 10^{ - 40} {{cm^2 } \mathord{\left/ {\vphantom {{cm^2 } {\left\langle {nucl.} \right\rangle }}} \right. \kern-\nulldelimiterspace} {\left\langle {nucl.} \right\rangle }}} \\ {\sigma _{coh}^{\bar v} (\pi ^ - ) = (113 \pm 35) \cdot 10^{ - 40} {{cm^2 } \mathord{\left/ {\vphantom {{cm^2 } {\left\langle {nucl.} \right\rangle }}} \right. \kern-\nulldelimiterspace} {\left\langle {nucl.} \right\rangle }}and} \\ {\sigma _{coh}^v (\pi ^0 ) = (52 \pm 19) \cdot 10^{ - 40} {{cm^2 } \mathord{\left/ {\vphantom {{cm^2 } {\left\langle {nucl.} \right\rangle }}} \right. \kern-\nulldelimiterspace} {\left\langle {nucl.} \right\rangle }}} \\ \end{array} $$ . Comparing our data with theoretical predictions based on the standard model of weak interactions we find reasonable agreement. Independently from any model of coherent pion production we determine the isovector axial vector coupling constant to be |β|=0.99±0.20.     

Nuclear quadrupole moments of radioactive83Rb,84Rb and86Rb

Excited atomic² P _3/2-states of radioactive Rb isotopes have been investigated by level crossing and optical double resonance spectroscopy. The measured hyperfine structure constants yielded the nuclear moments $$\begin{gathered} \mu _I (^{84} Rb) = - 1.296(11)\mu _K Q(^{83} Rb) = + 0.27(5) \cdot 10^{ - 24} cm^2 \hfill \\ Q(^{84} Rb) = + 0.005(13) \cdot 10^{ - 24} cm^2 \hfill \\ Q(^{86} Rb) = + 0.20(3) \cdot 10^{ - 24} cm^2 \hfill \\ \end{gathered} $$ and the hyperfine anomaly₈₄Δ₈₅=+1.7(1.0) · 10^?2. The quadrupole moments of⁸³Rb to⁸⁷Rb can be explained with the unified model of vibrations.     

基于超薄Al2O3栅绝缘层的低工作电压IGZO薄膜晶体管及其在共源极放大器中的应用

随着薄膜晶体管(Thin-film transistor,TFT)在各类新兴电子产品中得到广泛应用,作为各类电子设备的关键组件,其工作电压和稳定性面临着巨大挑战。为了满足未来高度集成化、功能复杂的应用场合,实现其低工作电压和高稳定性就变得异常重要。我们在150 mm×150 mm大面积玻璃基底上,采用磁控溅射非晶铟镓锌氧化物(amorphous indium-gallium-zinc-oxide,a-IGZO)作为有源层,以原子层沉积(ALD)Al2O3为栅绝缘层,制备了底栅顶接触型a-IGZO TFT,并研究了50,40,30,20 nm超薄Al2O3栅绝缘层对TFT器件的影响。其中,20 nm超薄Al2O3栅绝缘层TFT具有最优综合性能:1 V的低工作电压、接近0 V的阈值电压和仅为65.21 mV/dec的亚阈值摆幅,还具有15.52 cm^2/(V·s)的高载流子迁移率以及5.85×10^7的高开关比。同时,器件还表现出优异的稳定性:栅极±5 V偏压1 h阈值电压波动最小仅为0.09 V以及优良的150 mm×150 mm大面积分布均一性。实现了TFT器件的低工作电压和高稳定性。最后,以该TFT器件为基础设计了共源极放大器,得到14 dB的放大增益。     

Neutral strange particle exclusive production in charged current high-energy antineutrino interactions

The cross section of the quasi-elastic reactions \(\bar v_\mu p \to \mu ^ + \Lambda (\Sigma ^0 )\) in the energy range 5–100 GeV is determined from Fermilab 15′ bubble chamber antineutrino data. TheQ ² analysis of quasi-elastic Λ events yieldsM _A=1.0±0.3 GeV/c² for the axial mass value. With zero µΛ K ⁰ events observed, the 90% confidence level upper limit \(\sigma (\bar v_\mu p \to \mu ^ + \Lambda {\rm K}^0 )< 2.0 \cdot 10^{ - 40} cm^2 \) is obtained. At the same time, we found that the cross section of reaction \(\bar v_\mu p \to \mu ^ + \Lambda {\rm K}^0 + m\pi ^0 \) is equal to \(\left( {3.9\begin{array}{*{20}c} { + 1.6} \\ { - 1.3} \\ \end{array} } \right) \cdot 10^{ - 40} cm^2 \) .