共查询到20条相似文献,搜索用时 78 毫秒
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在量子力学的微扰理论框架下,利用微扰法求解得到了1+2维强非局域非线性介质——铅玻璃中二阶微扰修正的"类拉盖尔高斯型"涡旋孤子的近似解析解。从非局域非线性薛定谔方程(NNLSE)出发,以铅玻璃中的真实折射率与Snyder-Mitchell(SM)模型中描述的抛物线型折射率的差值为微扰,以SM模型中的拉盖尔高斯孤子解为基态解,求得了铅玻璃材料中二阶微扰修正的"类拉盖尔高斯型"涡旋孤子的解析解。拓扑荷值分别为1、2、3、4的微扰修正的"类拉盖尔高斯型"光孤子比未加微扰的拉盖尔高斯型光孤子更稳定,非常接近孤子真解的传输行为。 相似文献
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《Physica A》1995,220(3-4):585-598
An antiferromagnetic equivalent-neighbour Heisenberg interaction Hi between impurity spins is added to the reduced s-d Hamiltonian Hr previously introduced by simplifying the Kondo s-d exchange Hamiltonian HK. Asymptotic mean-field theory is developed for Hr + Hi, in the presence and absence of external magnetic field, and applied to (La1−xCex)Al2 alloys. Specific heat ci(T) and zero-field susceptibility χi(0,T) curves for (La1−xCex)Al2 are depicted. The coupling constants of Hr + Hi and conduction bandwidth are adjusted so that Tc temperatures for x = 0.2, 0.1 are equal to the experimental values. ci(T) exhibits a jump at Tc and is decreasing for T < Tc. χi(0,T) has a first order pole at Tc which corresponds to the maximum of experimental susceptibility and χi(0,0) > 0. These results improve those obtained earlier on the grounds of Hr theory. 相似文献
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We study the discrete Painlevé equations associated to the affine Weyl group which can be obtained by the implementation of a special limits of -associated equations. This study is motivated by the existence of two -associated discrete both having a double ternary dependence in their coefficients and which have not been related before. We show here that two equations correspond to two different limits of a -associated discrete Painlevé equation. Applying the same limiting procedures to other -associated equations we obtained several -related equations most of which have not been previously derived. 相似文献
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研究了反向衬底偏压VB下纳米N沟道金属氧化物半导体场效应晶体管中栅调制界面产生(GMG)电流IGMG特性, 发现IGMG曲线的上升沿与下降沿随着|VB|的增大向右漂移. 基于实验和理论模型分析, 得出了VB与这种漂移之间的物理作用机制, 漂移现象的产生归因于衬底偏压VB 调节了表面电势φs在栅电压VG 中的占有比重: |VB|增大时相同VG下φs会变小, φs 的变化继而引发上升沿产生率因子gr减小以及下降沿产生率因子gf增大. 进一步发现IGMG 上升沿与下降沿的最大跨导GMR, GMF 在对数坐标系下与VB成线性关系, 并且随着|VB|增加而增大. 由于漏电压VD在IGMG 上升沿与下降沿中的作用不同, 三种VD下GMR-VB曲线重合而GMF-VB曲线则产生差异. 增大VD 会增强gf 随VG的变化, 因此使得给定VB 下的GMF变大. 同时这却导致了更大VD下GMF-VB 曲线变化的趋势减缓, 随着VD从0.2 V变为0.6 V, 曲线的斜率s从0.09减小到0.03.
关键词:
产生电流
表面势
衬底偏压
N沟道金属氧化物半导体场效应晶体管 相似文献
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本文提出了予测稠苯芳杂环及其烷基链上质子化学位移的计算方法。
将稠苯芳杂环化合物用凯库勒式表示,计算式为为需考虑的苯环内的乙烯基效应。σmi,ci为各苯环的环流效应。σ1,Hc为各芳杂环的屏蔽效应,对杂环上质子它就是该单独芳杂环上相应质子的δ值,对苯环上质子要将它分解为各结构因素的效应,即:σ1,He=(1/2)d-1δx=y(或σz)+σc-c·σm,H.
σx-y与σz为杂原子或其基团的屏蔽效应,σc=c为存在于芳杂环中的乙烯基的效应,σm,Hc为芳杂环的环流效应,d为对不同质子所考虑的键数。有取代基时需考虑取代基的效应。计算环上烷基质子的公式为:δ=σp,CH3+ασc,CH3+βσt,CH3+σl,G
σl,G为稠苯芳杂环基的某级效应。 相似文献
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